JPWO2023166552A5 - - Google Patents

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Publication number
JPWO2023166552A5
JPWO2023166552A5 JP2022541302A JP2022541302A JPWO2023166552A5 JP WO2023166552 A5 JPWO2023166552 A5 JP WO2023166552A5 JP 2022541302 A JP2022541302 A JP 2022541302A JP 2022541302 A JP2022541302 A JP 2022541302A JP WO2023166552 A5 JPWO2023166552 A5 JP WO2023166552A5
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JP
Japan
Prior art keywords
ether compound
group
plating solution
compound
sulfonio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022541302A
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English (en)
Japanese (ja)
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JP7162162B1 (ja
JPWO2023166552A1 (https=
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Publication date
Application filed filed Critical
Priority claimed from PCT/JP2022/008580 external-priority patent/WO2023166552A1/ja
Application granted granted Critical
Publication of JP7162162B1 publication Critical patent/JP7162162B1/ja
Publication of JPWO2023166552A1 publication Critical patent/JPWO2023166552A1/ja
Publication of JPWO2023166552A5 publication Critical patent/JPWO2023166552A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2022541302A 2022-03-01 2022-03-01 スルホニオ基含有エーテル化合物を含むめっき液 Active JP7162162B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/008580 WO2023166552A1 (ja) 2022-03-01 2022-03-01 スルホニオ基含有エーテル化合物を含むめっき液

Publications (3)

Publication Number Publication Date
JP7162162B1 JP7162162B1 (ja) 2022-10-27
JPWO2023166552A1 JPWO2023166552A1 (https=) 2023-09-07
JPWO2023166552A5 true JPWO2023166552A5 (https=) 2024-02-06

Family

ID=83804246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022541302A Active JP7162162B1 (ja) 2022-03-01 2022-03-01 スルホニオ基含有エーテル化合物を含むめっき液

Country Status (7)

Country Link
US (1) US20250179676A1 (https=)
EP (1) EP4488421A4 (https=)
JP (1) JP7162162B1 (https=)
KR (1) KR20240155294A (https=)
CN (1) CN118922586A (https=)
TW (1) TWI835422B (https=)
WO (1) WO2023166552A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119352117A (zh) * 2024-12-23 2025-01-24 西安智同航空科技有限公司 一种航空紧固件表面镀银的方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3000799A (en) * 1960-02-10 1961-09-19 Harshaw Chem Corp Nickel plating solutions
US4388450A (en) * 1981-03-13 1983-06-14 General Electric Company Aromatic polyvinyl ethers and heat curable molding compositions obtained therefrom
JP2003105584A (ja) 2001-07-26 2003-04-09 Electroplating Eng Of Japan Co 微細配線埋め込み用銅メッキ液及びそれを用いた銅メッキ方法
US6676823B1 (en) * 2002-03-18 2004-01-13 Taskem, Inc. High speed acid copper plating
US20050070701A1 (en) * 2003-09-29 2005-03-31 Hochstetler Spencer Erich Detection of living cells in polymers or pigments
JP5227524B2 (ja) * 2007-03-20 2013-07-03 関東電化工業株式会社 S−n結合を含むスルホニウムカチオンを有するイオン液体およびその製造方法
US7887693B2 (en) * 2007-06-22 2011-02-15 Maria Nikolova Acid copper electroplating bath composition
CN102906078B (zh) 2010-04-30 2015-12-16 株式会社杰希优 新型化合物及其利用
KR20140010398A (ko) * 2011-02-23 2014-01-24 바스프 에스이 술포늄 술페이트, 그의 제조법 및 용도
JP6607106B2 (ja) * 2015-03-26 2019-11-20 三菱マテリアル株式会社 スルホニウム塩を用いためっき液

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