JPWO2023152595A5 - - Google Patents
Info
- Publication number
- JPWO2023152595A5 JPWO2023152595A5 JP2023579876A JP2023579876A JPWO2023152595A5 JP WO2023152595 A5 JPWO2023152595 A5 JP WO2023152595A5 JP 2023579876 A JP2023579876 A JP 2023579876A JP 2023579876 A JP2023579876 A JP 2023579876A JP WO2023152595 A5 JPWO2023152595 A5 JP WO2023152595A5
- Authority
- JP
- Japan
- Prior art keywords
- insulator
- conductor
- opening
- disposed
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022019463 | 2022-02-10 | ||
| PCT/IB2023/050761 WO2023152595A1 (ja) | 2022-02-10 | 2023-01-30 | 記憶装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023152595A1 JPWO2023152595A1 (https=) | 2023-08-17 |
| JPWO2023152595A5 true JPWO2023152595A5 (https=) | 2025-11-05 |
Family
ID=87563756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023579876A Pending JPWO2023152595A1 (https=) | 2022-02-10 | 2023-01-30 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20250159935A1 (https=) |
| JP (1) | JPWO2023152595A1 (https=) |
| TW (1) | TW202335185A (https=) |
| WO (1) | WO2023152595A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20250098187A1 (en) * | 2023-09-18 | 2025-03-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor memory cell structure including a hydrogen absorption layer |
| TWI895023B (zh) * | 2024-06-24 | 2025-08-21 | 聯華電子股份有限公司 | 半導體結構及其製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6607681B2 (ja) * | 2014-03-07 | 2019-11-20 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP6545976B2 (ja) * | 2014-03-07 | 2019-07-17 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| US11997846B2 (en) * | 2018-07-06 | 2024-05-28 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor device |
| US12283632B2 (en) * | 2019-05-10 | 2025-04-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor device |
| JP7459079B2 (ja) * | 2019-05-23 | 2024-04-01 | 株式会社半導体エネルギー研究所 | 半導体装置 |
-
2023
- 2023-01-30 WO PCT/IB2023/050761 patent/WO2023152595A1/ja not_active Ceased
- 2023-01-30 JP JP2023579876A patent/JPWO2023152595A1/ja active Pending
- 2023-01-30 US US18/835,109 patent/US20250159935A1/en active Pending
- 2023-02-02 TW TW112103680A patent/TW202335185A/zh unknown
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