JPWO2023132063A1 - - Google Patents

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Publication number
JPWO2023132063A1
JPWO2023132063A1 JP2023572319A JP2023572319A JPWO2023132063A1 JP WO2023132063 A1 JPWO2023132063 A1 JP WO2023132063A1 JP 2023572319 A JP2023572319 A JP 2023572319A JP 2023572319 A JP2023572319 A JP 2023572319A JP WO2023132063 A1 JPWO2023132063 A1 JP WO2023132063A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2023572319A
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Japanese (ja)
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JP7666652B2 (ja
JPWO2023132063A5 (https=
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Publication of JPWO2023132063A1 publication Critical patent/JPWO2023132063A1/ja
Publication of JPWO2023132063A5 publication Critical patent/JPWO2023132063A5/ja
Application granted granted Critical
Publication of JP7666652B2 publication Critical patent/JP7666652B2/ja
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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/80Constructional details
    • H10N60/81Containers; Mountings
    • H10N60/815Containers; Mountings for Josephson-effect devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N69/00Integrated devices, or assemblies of multiple devices, comprising at least one superconducting element covered by group H10N60/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261Processes for packaging MEMS devices
    • B81C1/00269Bonding of solid lids or wafers to the substrate
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06NCOMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N10/00Quantum computing, i.e. information processing based on quantum-mechanical phenomena
    • G06N10/40Physical realisations or architectures of quantum processors or components for manipulating qubits, e.g. qubit coupling or qubit control
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0912Manufacture or treatment of Josephson-effect devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0109Bonding an individual cap on the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0172Seals
    • B81C2203/019Seals characterised by the material or arrangement of seals between parts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/20Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63Vias, e.g. via plugs
    • H10W70/635Through-vias

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Analysis (AREA)
  • Computing Systems (AREA)
  • Evolutionary Computation (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computational Mathematics (AREA)
  • Mathematical Optimization (AREA)
  • Pure & Applied Mathematics (AREA)
  • Data Mining & Analysis (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Software Systems (AREA)
  • Artificial Intelligence (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Semiconductor Memories (AREA)
JP2023572319A 2022-01-07 2022-01-07 量子演算装置及び量子演算装置の製造方法 Active JP7666652B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/000384 WO2023132063A1 (ja) 2022-01-07 2022-01-07 量子演算装置及び量子演算装置の製造方法

Publications (3)

Publication Number Publication Date
JPWO2023132063A1 true JPWO2023132063A1 (https=) 2023-07-13
JPWO2023132063A5 JPWO2023132063A5 (https=) 2024-07-10
JP7666652B2 JP7666652B2 (ja) 2025-04-22

Family

ID=87073584

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023572319A Active JP7666652B2 (ja) 2022-01-07 2022-01-07 量子演算装置及び量子演算装置の製造方法

Country Status (4)

Country Link
US (1) US20260082822A1 (https=)
EP (1) EP4475176B1 (https=)
JP (1) JP7666652B2 (https=)
WO (1) WO2023132063A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025046715A1 (ja) * 2023-08-28 2025-03-06 富士通株式会社 量子ビットデバイス及び量子ビットデバイスの製造方法
JP2025112080A (ja) * 2024-01-18 2025-07-31 富士通株式会社 量子ビットデバイスの製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04338683A (ja) * 1991-05-16 1992-11-25 Fujitsu Ltd 超伝導集積回路素子とその実装方法
JPH11177157A (ja) * 1997-12-08 1999-07-02 Agency Of Ind Science & Technol 超電導集積回路構造及びその製造方法
US20180013052A1 (en) * 2015-07-23 2018-01-11 Massachusetts Institute Of Technology Qubit and Coupler Circuit Structures and Coupling Techniques
JP2019532505A (ja) * 2016-09-13 2019-11-07 グーグル エルエルシー 積層量子デバイス内の損失の低減
JP2021072351A (ja) * 2019-10-30 2021-05-06 日本電気株式会社 超伝導回路装置、スペーサ、及び超伝導回路装置の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6528875B1 (en) * 2001-04-20 2003-03-04 Amkor Technology, Inc. Vacuum sealed package for semiconductor chip
US9836699B1 (en) * 2015-04-27 2017-12-05 Rigetti & Co. Microwave integrated quantum circuits with interposer
JP6974470B2 (ja) 2016-09-14 2021-12-01 グーグル エルエルシーGoogle LLC ローカル真空キャビティーを使用して量子デバイスの中の散逸および周波数ノイズを低減させること
CN110431568B (zh) 2017-03-13 2024-03-08 谷歌有限责任公司 在堆叠的量子计算装置中的集成电路元件

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04338683A (ja) * 1991-05-16 1992-11-25 Fujitsu Ltd 超伝導集積回路素子とその実装方法
JPH11177157A (ja) * 1997-12-08 1999-07-02 Agency Of Ind Science & Technol 超電導集積回路構造及びその製造方法
US20180013052A1 (en) * 2015-07-23 2018-01-11 Massachusetts Institute Of Technology Qubit and Coupler Circuit Structures and Coupling Techniques
JP2019532505A (ja) * 2016-09-13 2019-11-07 グーグル エルエルシー 積層量子デバイス内の損失の低減
JP2021072351A (ja) * 2019-10-30 2021-05-06 日本電気株式会社 超伝導回路装置、スペーサ、及び超伝導回路装置の製造方法

Also Published As

Publication number Publication date
EP4475176A1 (en) 2024-12-11
WO2023132063A1 (ja) 2023-07-13
JP7666652B2 (ja) 2025-04-22
US20260082822A1 (en) 2026-03-19
EP4475176B1 (en) 2026-04-29
EP4475176A4 (en) 2025-10-29

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