JPWO2023048062A1 - - Google Patents
Info
- Publication number
- JPWO2023048062A1 JPWO2023048062A1 JP2022557106A JP2022557106A JPWO2023048062A1 JP WO2023048062 A1 JPWO2023048062 A1 JP WO2023048062A1 JP 2022557106 A JP2022557106 A JP 2022557106A JP 2022557106 A JP2022557106 A JP 2022557106A JP WO2023048062 A1 JPWO2023048062 A1 JP WO2023048062A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
- C08K5/19—Quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/52—Phosphorus bound to oxygen only
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silicon Polymers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2024004281A JP2024027180A (ja) | 2021-09-24 | 2024-01-16 | 硬化膜形成用シロキサン樹脂組成物、硬化膜およびポリシロキサンの製造方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021155227 | 2021-09-24 | ||
JP2021155227 | 2021-09-24 | ||
PCT/JP2022/034553 WO2023048062A1 (ja) | 2021-09-24 | 2022-09-15 | 硬化膜形成用シロキサン樹脂組成物、硬化膜およびポリシロキサンの製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2024004281A Division JP2024027180A (ja) | 2021-09-24 | 2024-01-16 | 硬化膜形成用シロキサン樹脂組成物、硬化膜およびポリシロキサンの製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JPWO2023048062A1 true JPWO2023048062A1 (ja) | 2023-03-30 |
JPWO2023048062A5 JPWO2023048062A5 (ja) | 2023-09-20 |
JP7428269B2 JP7428269B2 (ja) | 2024-02-06 |
Family
ID=85720689
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022557106A Active JP7428269B2 (ja) | 2021-09-24 | 2022-09-15 | 硬化膜形成用シロキサン樹脂組成物および硬化膜 |
JP2024004281A Pending JP2024027180A (ja) | 2021-09-24 | 2024-01-16 | 硬化膜形成用シロキサン樹脂組成物、硬化膜およびポリシロキサンの製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2024004281A Pending JP2024027180A (ja) | 2021-09-24 | 2024-01-16 | 硬化膜形成用シロキサン樹脂組成物、硬化膜およびポリシロキサンの製造方法 |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP7428269B2 (ja) |
KR (1) | KR20240065082A (ja) |
CN (1) | CN117858927A (ja) |
TW (1) | TW202313789A (ja) |
WO (1) | WO2023048062A1 (ja) |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000212376A (ja) | 1999-01-21 | 2000-08-02 | Nof Corp | 生体適合性重合体/シリカゲルハイブリッド体およびその製造方法 |
JP3797468B2 (ja) | 2000-08-24 | 2006-07-19 | Basfコーティングスジャパン株式会社 | 耐汚染性塗料組成物、塗装仕上げ方法及び塗装物品 |
JP2002069442A (ja) | 2000-09-01 | 2002-03-08 | Showa Denko Kk | シリカ被膜発光体粒子 |
JP2002129103A (ja) | 2000-10-23 | 2002-05-09 | Jsr Corp | 膜形成用組成物および絶縁膜形成用材料 |
KR100910542B1 (ko) | 2007-05-04 | 2009-08-05 | 제일모직주식회사 | 반도체 미세 갭 필용 화합물 및 이를 이용한 반도체 미세갭 필용 조성물 |
KR100901759B1 (ko) | 2007-09-12 | 2009-06-11 | 제일모직주식회사 | 레지스트 하층막용 하드마스크 조성물, 이를 이용한반도체 집적회로 디바이스의 제조방법 및 반도체 집적회로디바이스 |
JP5704076B2 (ja) | 2010-01-26 | 2015-04-22 | 日立化成株式会社 | (メタ)アクリロイル基含有ポリシロキサン樹脂の製造方法及び該方法により得られた(メタ)アクリロイル基含有ポリシロキサン樹脂を用いた調光フィルム |
JP5255612B2 (ja) | 2010-09-24 | 2013-08-07 | 株式会社神戸製鋼所 | プレコートアルミニウム板およびその製造方法 |
FI126130B (en) | 2015-03-20 | 2016-07-15 | Inkron Oy | Siloxane monomers with high refractive index, polymerization thereof and their use |
WO2019124514A1 (ja) | 2017-12-20 | 2019-06-27 | 日産化学株式会社 | 光硬化性シリコン含有被覆膜形成組成物 |
-
2022
- 2022-09-15 WO PCT/JP2022/034553 patent/WO2023048062A1/ja active Application Filing
- 2022-09-15 JP JP2022557106A patent/JP7428269B2/ja active Active
- 2022-09-15 KR KR1020247008751A patent/KR20240065082A/ko unknown
- 2022-09-15 CN CN202280057280.2A patent/CN117858927A/zh active Pending
- 2022-09-20 TW TW111135537A patent/TW202313789A/zh unknown
-
2024
- 2024-01-16 JP JP2024004281A patent/JP2024027180A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2024027180A (ja) | 2024-02-29 |
KR20240065082A (ko) | 2024-05-14 |
JP7428269B2 (ja) | 2024-02-06 |
TW202313789A (zh) | 2023-04-01 |
WO2023048062A1 (ja) | 2023-03-30 |
CN117858927A (zh) | 2024-04-09 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230901 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230901 |
|
A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20230901 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231121 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231205 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20231226 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240108 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 7428269 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |