JPWO2023047227A5 - - Google Patents
Info
- Publication number
- JPWO2023047227A5 JPWO2023047227A5 JP2023549159A JP2023549159A JPWO2023047227A5 JP WO2023047227 A5 JPWO2023047227 A5 JP WO2023047227A5 JP 2023549159 A JP2023549159 A JP 2023549159A JP 2023549159 A JP2023549159 A JP 2023549159A JP WO2023047227 A5 JPWO2023047227 A5 JP WO2023047227A5
- Authority
- JP
- Japan
- Prior art keywords
- insulator
- conductor
- oxide
- region
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021153623 | 2021-09-21 | ||
| JP2021182108 | 2021-11-08 | ||
| JP2022049107 | 2022-03-24 | ||
| PCT/IB2022/058438 WO2023047227A1 (ja) | 2021-09-21 | 2022-09-08 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023047227A1 JPWO2023047227A1 (https=) | 2023-03-30 |
| JPWO2023047227A5 true JPWO2023047227A5 (https=) | 2025-09-11 |
Family
ID=85719196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023549159A Pending JPWO2023047227A1 (https=) | 2021-09-21 | 2022-09-08 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240379866A1 (https=) |
| JP (1) | JPWO2023047227A1 (https=) |
| KR (1) | KR20240067242A (https=) |
| TW (1) | TW202339171A (https=) |
| WO (1) | WO2023047227A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12581747B2 (en) * | 2022-06-20 | 2026-03-17 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of semiconductor device |
| WO2025257706A1 (ja) * | 2024-06-14 | 2025-12-18 | 株式会社半導体エネルギー研究所 | 半導体装置、及び半導体装置の作製方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6004865A (en) * | 1993-09-06 | 1999-12-21 | Hitachi, Ltd. | Method of fabricating multi-layered structure having single crystalline semiconductor film formed on insulator |
| JP5136327B2 (ja) * | 2008-09-25 | 2013-02-06 | 凸版印刷株式会社 | 防眩フィルム及びその製造方法並びに透過型液晶ディスプレイ |
| KR101473684B1 (ko) | 2009-12-25 | 2014-12-18 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| KR101809105B1 (ko) | 2010-08-06 | 2017-12-14 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 집적 회로 |
| US8969867B2 (en) * | 2012-01-18 | 2015-03-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| TWI608616B (zh) * | 2012-11-15 | 2017-12-11 | 半導體能源研究所股份有限公司 | 半導體裝置 |
| KR102740089B1 (ko) * | 2018-03-06 | 2024-12-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 적층체 및 반도체 장치 |
-
2022
- 2022-09-06 TW TW111133748A patent/TW202339171A/zh unknown
- 2022-09-08 KR KR1020247011431A patent/KR20240067242A/ko active Pending
- 2022-09-08 WO PCT/IB2022/058438 patent/WO2023047227A1/ja not_active Ceased
- 2022-09-08 US US18/691,097 patent/US20240379866A1/en active Pending
- 2022-09-08 JP JP2023549159A patent/JPWO2023047227A1/ja active Pending
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