JPWO2023037949A1 - - Google Patents
Info
- Publication number
- JPWO2023037949A1 JPWO2023037949A1 JP2023546908A JP2023546908A JPWO2023037949A1 JP WO2023037949 A1 JPWO2023037949 A1 JP WO2023037949A1 JP 2023546908 A JP2023546908 A JP 2023546908A JP 2023546908 A JP2023546908 A JP 2023546908A JP WO2023037949 A1 JPWO2023037949 A1 JP WO2023037949A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
- H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
- H10P76/2041—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021148885 | 2021-09-13 | ||
| PCT/JP2022/032852 WO2023037949A1 (ja) | 2021-09-13 | 2022-08-31 | レジスト下層膜形成組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023037949A1 true JPWO2023037949A1 (https=) | 2023-03-16 |
Family
ID=85506686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023546908A Pending JPWO2023037949A1 (https=) | 2021-09-13 | 2022-08-31 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240377748A1 (https=) |
| JP (1) | JPWO2023037949A1 (https=) |
| KR (1) | KR20240056584A (https=) |
| CN (1) | CN118215887A (https=) |
| TW (1) | TW202328817A (https=) |
| WO (1) | WO2023037949A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2022075339A1 (https=) * | 2020-10-07 | 2022-04-14 | ||
| KR20240101079A (ko) * | 2022-12-23 | 2024-07-02 | 삼성전자주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005526270A (ja) * | 2002-02-11 | 2005-09-02 | ブルーワー サイエンス アイ エヌ シー． | ハロゲン化反射防止膜 |
| WO2006003850A1 (ja) * | 2004-07-02 | 2006-01-12 | Nissan Chemical Industries, Ltd. | ハロゲン原子を有するナフタレン環を含むリソグラフィー用下層膜形成組成物 |
| WO2018012253A1 (ja) * | 2016-07-15 | 2018-01-18 | 日産化学工業株式会社 | ヒダントイン環を有する化合物を含むレジスト下層膜形成組成物 |
| WO2020111068A1 (ja) * | 2018-11-29 | 2020-06-04 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びレジストパターン形成方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060003850A (ko) | 2005-12-27 | 2006-01-11 | 한국유지관리 주식회사 | 미세조정이 가능한 어댑터 타입의 광섬유격자 센서용고정구 |
| KR102194951B1 (ko) | 2019-03-18 | 2020-12-24 | 한국세라믹기술원 | 내플라즈마 세라믹의 가속수명 시험방법 |
-
2022
- 2022-08-31 JP JP2023546908A patent/JPWO2023037949A1/ja active Pending
- 2022-08-31 WO PCT/JP2022/032852 patent/WO2023037949A1/ja not_active Ceased
- 2022-08-31 KR KR1020247011587A patent/KR20240056584A/ko active Pending
- 2022-08-31 CN CN202280074666.4A patent/CN118215887A/zh active Pending
- 2022-08-31 US US18/691,185 patent/US20240377748A1/en active Pending
- 2022-09-06 TW TW111133660A patent/TW202328817A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005526270A (ja) * | 2002-02-11 | 2005-09-02 | ブルーワー サイエンス アイ エヌ シー． | ハロゲン化反射防止膜 |
| WO2006003850A1 (ja) * | 2004-07-02 | 2006-01-12 | Nissan Chemical Industries, Ltd. | ハロゲン原子を有するナフタレン環を含むリソグラフィー用下層膜形成組成物 |
| WO2018012253A1 (ja) * | 2016-07-15 | 2018-01-18 | 日産化学工業株式会社 | ヒダントイン環を有する化合物を含むレジスト下層膜形成組成物 |
| WO2020111068A1 (ja) * | 2018-11-29 | 2020-06-04 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びレジストパターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20240377748A1 (en) | 2024-11-14 |
| WO2023037949A1 (ja) | 2023-03-16 |
| KR20240056584A (ko) | 2024-04-30 |
| TW202328817A (zh) | 2023-07-16 |
| CN118215887A (zh) | 2024-06-18 |
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