JPWO2023008209A5 - - Google Patents
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- Publication number
- JPWO2023008209A5 JPWO2023008209A5 JP2023538428A JP2023538428A JPWO2023008209A5 JP WO2023008209 A5 JPWO2023008209 A5 JP WO2023008209A5 JP 2023538428 A JP2023538428 A JP 2023538428A JP 2023538428 A JP2023538428 A JP 2023538428A JP WO2023008209 A5 JPWO2023008209 A5 JP WO2023008209A5
- Authority
- JP
- Japan
- Prior art keywords
- dielectric portion
- base
- layer
- bonds
- bonding layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 3
- 239000007921 spray Substances 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163226662P | 2021-07-28 | 2021-07-28 | |
| JP2022019880 | 2022-02-10 | ||
| PCT/JP2022/027680 WO2023008209A1 (ja) | 2021-07-28 | 2022-07-14 | 基板支持器及び基板処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023008209A1 JPWO2023008209A1 (https=) | 2023-02-02 |
| JPWO2023008209A5 true JPWO2023008209A5 (https=) | 2025-04-22 |
Family
ID=85087572
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023538428A Pending JPWO2023008209A1 (https=) | 2021-07-28 | 2022-07-14 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20240162075A1 (https=) |
| JP (1) | JPWO2023008209A1 (https=) |
| KR (1) | KR20240036060A (https=) |
| WO (1) | WO2023008209A1 (https=) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5781400A (en) * | 1995-09-20 | 1998-07-14 | Hitachi, Ltd. | Electrostatically attracting electrode and a method of manufacture thereof |
| US6370007B2 (en) * | 1995-09-20 | 2002-04-09 | Hitachi, Ltd. | Electrostatic chuck |
| US6108189A (en) * | 1996-04-26 | 2000-08-22 | Applied Materials, Inc. | Electrostatic chuck having improved gas conduits |
| US6310755B1 (en) * | 1999-05-07 | 2001-10-30 | Applied Materials, Inc. | Electrostatic chuck having gas cavity and method |
| JP5982206B2 (ja) * | 2012-07-17 | 2016-08-31 | 東京エレクトロン株式会社 | 下部電極、及びプラズマ処理装置 |
| CN107004626B (zh) * | 2014-11-20 | 2019-02-05 | 住友大阪水泥股份有限公司 | 静电卡盘装置 |
| JP6986937B2 (ja) * | 2017-01-05 | 2021-12-22 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| CN110770891B (zh) * | 2017-10-30 | 2023-04-07 | 日本碍子株式会社 | 静电卡盘及其制法 |
| JP2019220497A (ja) * | 2018-06-15 | 2019-12-26 | 東京エレクトロン株式会社 | 載置台及びプラズマ処理装置 |
| WO2020027322A1 (ja) * | 2018-08-02 | 2020-02-06 | 住友大阪セメント株式会社 | 静電チャック装置および静電チャック装置の製造方法 |
| JP7474651B2 (ja) | 2019-09-09 | 2024-04-25 | 東京エレクトロン株式会社 | プラズマ処理装置 |
-
2022
- 2022-07-14 KR KR1020247005369A patent/KR20240036060A/ko active Pending
- 2022-07-14 WO PCT/JP2022/027680 patent/WO2023008209A1/ja not_active Ceased
- 2022-07-14 JP JP2023538428A patent/JPWO2023008209A1/ja active Pending
-
2024
- 2024-01-26 US US18/424,223 patent/US20240162075A1/en active Pending
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