JPWO2022239717A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2022239717A5 JPWO2022239717A5 JP2023521004A JP2023521004A JPWO2022239717A5 JP WO2022239717 A5 JPWO2022239717 A5 JP WO2022239717A5 JP 2023521004 A JP2023521004 A JP 2023521004A JP 2023521004 A JP2023521004 A JP 2023521004A JP WO2022239717 A5 JPWO2022239717 A5 JP WO2022239717A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode layer
- main surface
- layer
- electrode
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021079848 | 2021-05-10 | ||
| JP2021079848 | 2021-05-10 | ||
| PCT/JP2022/019619 WO2022239717A1 (ja) | 2021-05-10 | 2022-05-09 | 半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022239717A1 JPWO2022239717A1 (enrdf_load_html_response) | 2022-11-17 |
| JPWO2022239717A5 true JPWO2022239717A5 (enrdf_load_html_response) | 2024-02-13 |
| JP7647880B2 JP7647880B2 (ja) | 2025-03-18 |
Family
ID=84029613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023521004A Active JP7647880B2 (ja) | 2021-05-10 | 2022-05-09 | 半導体装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US12424383B2 (enrdf_load_html_response) |
| JP (1) | JP7647880B2 (enrdf_load_html_response) |
| CN (1) | CN117280433A (enrdf_load_html_response) |
| WO (1) | WO2022239717A1 (enrdf_load_html_response) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025052920A1 (ja) * | 2023-09-08 | 2025-03-13 | 株式会社村田製作所 | 受動電子部品 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0547586A (ja) | 1991-08-16 | 1993-02-26 | Toshiba Corp | コンデンサ部品 |
| TW563142B (en) * | 2001-07-12 | 2003-11-21 | Hitachi Ltd | Thin film capacitor, and electronic circuit component |
| US6635498B2 (en) * | 2001-12-20 | 2003-10-21 | Texas Instruments Incorporated | Method of patterning a FeRAM capacitor with a sidewall during bottom electrode etch |
| JP4166013B2 (ja) * | 2001-12-26 | 2008-10-15 | 富士通株式会社 | 薄膜キャパシタ製造方法 |
| JP2006196871A (ja) * | 2004-12-15 | 2006-07-27 | Kyocera Corp | 薄膜コンデンサおよび可変容量コンデンサならびに電子部品 |
| JP4525947B2 (ja) | 2005-04-27 | 2010-08-18 | 株式会社村田製作所 | 薄膜キャパシタの製造方法 |
| US7304339B2 (en) | 2005-09-22 | 2007-12-04 | Agile Rf, Inc. | Passivation structure for ferroelectric thin-film devices |
| JP4596167B2 (ja) * | 2006-02-24 | 2010-12-08 | セイコーエプソン株式会社 | キャパシタの製造方法 |
| JP2008153497A (ja) | 2006-12-19 | 2008-07-03 | Murata Mfg Co Ltd | 誘電体薄膜キャパシタの製造方法 |
| JP2008252011A (ja) * | 2007-03-30 | 2008-10-16 | Taiyo Yuden Co Ltd | 誘電体キャパシタ |
| JP5098422B2 (ja) * | 2007-04-27 | 2012-12-12 | 株式会社村田製作所 | 薄膜電子部品 |
| EP2166549B1 (en) * | 2007-05-30 | 2017-07-05 | Kyocera Corporation | Capacitor, resonator, filter device, communication device and electric circuit |
| JP6489202B2 (ja) | 2015-02-27 | 2019-03-27 | 株式会社村田製作所 | キャパシタ |
| JPWO2018003445A1 (ja) | 2016-06-28 | 2019-03-07 | 株式会社村田製作所 | キャパシタ |
| CN109196609A (zh) * | 2016-07-07 | 2019-01-11 | 株式会社村田制作所 | 电容器 |
| JP6737118B2 (ja) * | 2016-10-11 | 2020-08-05 | Tdk株式会社 | 薄膜コンデンサ |
| WO2019026771A1 (ja) * | 2017-07-31 | 2019-02-07 | 株式会社村田製作所 | キャパシタ |
| JP2020202307A (ja) * | 2019-06-11 | 2020-12-17 | 株式会社村田製作所 | キャパシタ |
| JP2022144464A (ja) * | 2021-03-19 | 2022-10-03 | 住友電工デバイス・イノベーション株式会社 | キャパシタ |
-
2022
- 2022-05-09 WO PCT/JP2022/019619 patent/WO2022239717A1/ja not_active Ceased
- 2022-05-09 CN CN202280033507.XA patent/CN117280433A/zh active Pending
- 2022-05-09 JP JP2023521004A patent/JP7647880B2/ja active Active
-
2023
- 2023-10-30 US US18/497,066 patent/US12424383B2/en active Active