JPWO2022209346A1 - - Google Patents

Info

Publication number
JPWO2022209346A1
JPWO2022209346A1 JP2022529718A JP2022529718A JPWO2022209346A1 JP WO2022209346 A1 JPWO2022209346 A1 JP WO2022209346A1 JP 2022529718 A JP2022529718 A JP 2022529718A JP 2022529718 A JP2022529718 A JP 2022529718A JP WO2022209346 A1 JPWO2022209346 A1 JP WO2022209346A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022529718A
Other languages
Japanese (ja)
Other versions
JPWO2022209346A5 (https=
JP7100219B1 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2022/005414 external-priority patent/WO2022209346A1/ja
Priority to JP2022105208A priority Critical patent/JP7177961B2/ja
Application granted granted Critical
Publication of JP7100219B1 publication Critical patent/JP7100219B1/ja
Publication of JPWO2022209346A1 publication Critical patent/JPWO2022209346A1/ja
Publication of JPWO2022209346A5 publication Critical patent/JPWO2022209346A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66Vertical DMOS [VDMOS] FETs
    • H10D30/668Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/258Source or drain electrodes for field-effect devices characterised by the relative positions of the source or drain electrodes with respect to the gate electrode
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/20Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/43Layouts of interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/129Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed forming a chip-scale package [CSP]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/944Dispositions of multiple bond pads
    • H10W72/9445Top-view layouts, e.g. mirror arrays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/791Package configurations characterised by the relative positions of pads or connectors relative to package parts of direct-bonded pads
    • H10W90/794Package configurations characterised by the relative positions of pads or connectors relative to package parts of direct-bonded pads between a chip and a stacked insulating package substrate, interposer or RDL
JP2022529718A 2021-03-29 2022-02-10 半導体装置および半導体モジュール Active JP7100219B1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022105208A JP7177961B2 (ja) 2021-03-29 2022-06-30 半導体装置および半導体モジュール

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163167348P 2021-03-29 2021-03-29
US63/167,348 2021-03-29
PCT/JP2022/005414 WO2022209346A1 (ja) 2021-03-29 2022-02-10 半導体装置および半導体モジュール

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022105208A Division JP7177961B2 (ja) 2021-03-29 2022-06-30 半導体装置および半導体モジュール

Publications (3)

Publication Number Publication Date
JP7100219B1 JP7100219B1 (ja) 2022-07-12
JPWO2022209346A1 true JPWO2022209346A1 (https=) 2022-10-06
JPWO2022209346A5 JPWO2022209346A5 (https=) 2023-02-28

Family

ID=82384804

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022529718A Active JP7100219B1 (ja) 2021-03-29 2022-02-10 半導体装置および半導体モジュール
JP2022105208A Active JP7177961B2 (ja) 2021-03-29 2022-06-30 半導体装置および半導体モジュール

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022105208A Active JP7177961B2 (ja) 2021-03-29 2022-06-30 半導体装置および半導体モジュール

Country Status (4)

Country Link
US (2) US12165999B2 (https=)
JP (2) JP7100219B1 (https=)
KR (1) KR102629278B1 (https=)
CN (1) CN116250088B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7728714B2 (ja) * 2022-02-03 2025-08-25 ルネサスエレクトロニクス株式会社 半導体装置および回路装置
JP7851883B2 (ja) * 2023-03-27 2026-04-27 株式会社東芝 半導体装置および半導体装置の製造方法
WO2025197135A1 (ja) * 2024-03-21 2025-09-25 ヌヴォトンテクノロジージャパン株式会社 半導体装置
KR102944952B1 (ko) 2024-03-21 2026-03-27 누보톤 테크놀로지 재팬 가부시키가이샤 반도체 장치
WO2026079377A1 (ja) * 2024-10-09 2026-04-16 ヌヴォトンテクノロジージャパン株式会社 部品内蔵基板

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001059842A1 (en) 2000-02-10 2001-08-16 International Rectifier Corporation Vertical conduction flip-chip device with bump contacts on single surface
JP4270772B2 (ja) 2001-06-08 2009-06-03 三洋電機株式会社 1チップデュアル型絶縁ゲート型半導体装置
JP4453587B2 (ja) * 2005-03-24 2010-04-21 株式会社デンソー 加速度センサ
US7898831B2 (en) * 2008-05-09 2011-03-01 Alpha and Omega Semiconductor Inc. Device and method for limiting drain-source voltage of transformer-coupled push pull power conversion circuit
JP5980515B2 (ja) * 2012-02-06 2016-08-31 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 絶縁ゲート型半導体装置
JP5990401B2 (ja) 2012-05-29 2016-09-14 ルネサスエレクトロニクス株式会社 半導体装置および半導体装置の製造方法
JP6063713B2 (ja) * 2012-11-08 2017-01-18 ルネサスエレクトロニクス株式会社 電池保護システム
JP6348703B2 (ja) 2013-11-12 2018-06-27 ルネサスエレクトロニクス株式会社 半導体装置及びその製造方法
CN107710400A (zh) 2015-07-01 2018-02-16 松下知识产权经营株式会社 半导体装置
JP6795888B2 (ja) 2016-01-06 2020-12-02 力智電子股▲フン▼有限公司uPI Semiconductor Corp. 半導体装置及びそれを用いた携帯機器
JP6447946B1 (ja) 2018-01-19 2019-01-09 パナソニックIpマネジメント株式会社 半導体装置および半導体モジュール
JP6856569B2 (ja) 2018-03-21 2021-04-07 株式会社東芝 半導体装置
TWI761740B (zh) * 2018-12-19 2022-04-21 日商新唐科技日本股份有限公司 半導體裝置

Also Published As

Publication number Publication date
US20230307393A1 (en) 2023-09-28
CN116250088B (zh) 2025-12-26
US12165999B2 (en) 2024-12-10
JP2022153382A (ja) 2022-10-12
KR102629278B1 (ko) 2024-01-25
CN116250088A (zh) 2023-06-09
KR20230043220A (ko) 2023-03-30
JP7177961B2 (ja) 2022-11-24
US20240030167A1 (en) 2024-01-25
JP7100219B1 (ja) 2022-07-12
US12080664B2 (en) 2024-09-03

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