JPWO2022202538A1 - - Google Patents

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Publication number
JPWO2022202538A1
JPWO2022202538A1 JP2023509066A JP2023509066A JPWO2022202538A1 JP WO2022202538 A1 JPWO2022202538 A1 JP WO2022202538A1 JP 2023509066 A JP2023509066 A JP 2023509066A JP 2023509066 A JP2023509066 A JP 2023509066A JP WO2022202538 A1 JPWO2022202538 A1 JP WO2022202538A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023509066A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022202538A1 publication Critical patent/JPWO2022202538A1/ja
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/14Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing three or more hetero rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62Benzothiazoles
    • C07D277/68Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D277/70Sulfur atoms
    • C07D277/74Sulfur atoms substituted by carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76Dibenzothiophenes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D339/00Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/08Six-membered rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/12Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/38Esters containing sulfur
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026Recording materials or recording processes
    • G03H2001/0264Organic recording material
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00Recording materials or recording processes
    • G03H2260/12Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
JP2023509066A 2021-03-23 2022-03-16 Pending JPWO2022202538A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021049181 2021-03-23
PCT/JP2022/011919 WO2022202538A1 (ja) 2021-03-23 2022-03-16 化合物、及びその製造方法、重合性組成物、重合物、ホログラム記録媒体、光学材料、並びに光学部品

Publications (1)

Publication Number Publication Date
JPWO2022202538A1 true JPWO2022202538A1 (https=) 2022-09-29

Family

ID=83397193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023509066A Pending JPWO2022202538A1 (https=) 2021-03-23 2022-03-16

Country Status (6)

Country Link
US (1) US20240018137A1 (https=)
EP (1) EP4317155A4 (https=)
JP (1) JPWO2022202538A1 (https=)
CN (1) CN117120486A (https=)
TW (1) TW202302545A (https=)
WO (1) WO2022202538A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021100654A1 (ja) * 2019-11-19 2021-05-27 三菱ケミカル株式会社 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、及び光学部品
CN115916721B (zh) * 2020-06-24 2025-04-08 住友电气工业株式会社 树脂组合物、光纤以及光纤的制造方法
WO2024063135A1 (ja) * 2022-09-22 2024-03-28 三菱ケミカル株式会社 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、並びに光学部品
TW202432519A (zh) * 2022-10-19 2024-08-16 日商三菱化學股份有限公司 化合物、聚合性組合物、聚合物、全像記錄媒體、光學材料、及光學零件
CN120957964A (zh) * 2023-03-29 2025-11-14 三菱化学株式会社 化合物、聚合性组合物、全息记录介质、聚合物、光学材料以及光学部件
CN120004874A (zh) * 2023-09-28 2025-05-16 西安近代化学研究所 一种3,3-二(4-叠氮基呋咱-3-氧甲基)氧杂环丁烷及其合成方法
WO2026004955A1 (ja) * 2024-06-28 2026-01-02 三菱ケミカル株式会社 組成物、重合体、ホログラム記録媒体、光学材料、並びに光学部品
TWI882856B (zh) * 2024-07-05 2025-05-01 晉一化工股份有限公司 三元二嵌段共聚物、活性陽離子聚合引發系組成物、二異丙烯基苯共聚物、萜烯聚合物、難燃性樹脂組成物、難燃性樹脂固化物及其用途

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060183873A1 (en) * 2005-02-16 2006-08-17 Lunjia Xie Silicon ether compounds and a method for the preparation thereof
JP2016222566A (ja) * 2015-05-28 2016-12-28 三菱化学株式会社 含チオフェン環スルフィド基を有する化合物、及び光反応性組成物
JP2017014213A (ja) * 2015-07-01 2017-01-19 三菱化学株式会社 (メタ)アクリレート化合物、及び重合性組成物
KR20180084460A (ko) * 2017-01-17 2018-07-25 주식회사 트리엘 신규한 비닐페닐옥시기를 포함하는 화합물 및 이를 포함하는 감광성 포토레지스트 조성물
JP2021024842A (ja) * 2019-08-08 2021-02-22 三菱ケミカル株式会社 含硫黄芳香族複素環を有する化合物とその製造方法、重合性組成物、及び重合物

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US4590287A (en) 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
US4713401A (en) 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
JPH05230189A (ja) 1992-02-25 1993-09-07 Nippon Soda Co Ltd スルホニウム塩及び増感剤を含有する硬化性組成物
JP2000119306A (ja) 1998-03-20 2000-04-25 Nippon Soda Co Ltd ヨ―ドニウム塩化合物を含有する光硬化性組成物
US6482551B1 (en) 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
JP2000010277A (ja) 1998-06-19 2000-01-14 Mitsubishi Chemicals Corp 光重合性組成物
JP2000204284A (ja) 1999-01-18 2000-07-25 Kansai Paint Co Ltd 活性エネルギ―線硬化型組成物およびその被膜形成方法
JP3893833B2 (ja) 2000-02-09 2007-03-14 ブラザー工業株式会社 インクジェット記録方式用エネルギー線硬化型組成物
JP2001310937A (ja) 2000-04-27 2001-11-06 Hitachi Chem Co Ltd 硬化性オキセタン組成物およびその硬化方法ならびにその方法により得られる硬化物
JP2004198446A (ja) 2002-04-24 2004-07-15 Mitsubishi Chemicals Corp 光重合性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
CN1978416B (zh) * 2005-12-08 2010-05-12 中国石油化工股份有限公司 一种制备1,3-二醇单醚类化合物的方法
JP5273748B2 (ja) * 2007-04-30 2013-08-28 アルコン,インコーポレイテッド 眼用レンズ材料用uv吸収剤
WO2011054795A1 (de) 2009-11-03 2011-05-12 Bayer Materialscience Ag Fluorurethane als additive in einer photopolymer-formulierung
JP7123890B2 (ja) 2019-09-25 2022-08-23 株式会社ユニバーサルエンターテインメント 遊技機
WO2021100654A1 (ja) * 2019-11-19 2021-05-27 三菱ケミカル株式会社 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、及び光学部品

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060183873A1 (en) * 2005-02-16 2006-08-17 Lunjia Xie Silicon ether compounds and a method for the preparation thereof
JP2016222566A (ja) * 2015-05-28 2016-12-28 三菱化学株式会社 含チオフェン環スルフィド基を有する化合物、及び光反応性組成物
JP2017014213A (ja) * 2015-07-01 2017-01-19 三菱化学株式会社 (メタ)アクリレート化合物、及び重合性組成物
KR20180084460A (ko) * 2017-01-17 2018-07-25 주식회사 트리엘 신규한 비닐페닐옥시기를 포함하는 화합물 및 이를 포함하는 감광성 포토레지스트 조성물
JP2021024842A (ja) * 2019-08-08 2021-02-22 三菱ケミカル株式会社 含硫黄芳香族複素環を有する化合物とその製造方法、重合性組成物、及び重合物

Also Published As

Publication number Publication date
EP4317155A4 (en) 2024-07-31
WO2022202538A1 (ja) 2022-09-29
TW202302545A (zh) 2023-01-16
CN117120486A (zh) 2023-11-24
EP4317155A1 (en) 2024-02-07
US20240018137A1 (en) 2024-01-18

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