CN117120486A - 化合物及其制造方法、聚合性组合物、聚合物、全息摄影记录媒介、光学材料以及光学部件 - Google Patents

化合物及其制造方法、聚合性组合物、聚合物、全息摄影记录媒介、光学材料以及光学部件 Download PDF

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Publication number
CN117120486A
CN117120486A CN202280022428.9A CN202280022428A CN117120486A CN 117120486 A CN117120486 A CN 117120486A CN 202280022428 A CN202280022428 A CN 202280022428A CN 117120486 A CN117120486 A CN 117120486A
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China
Prior art keywords
compound
ring
group
substituent
ethyl acetate
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CN202280022428.9A
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English (en)
Chinese (zh)
Inventor
山下修治
矢部晃子
石川达也
佐藤宪
田中麻人
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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Publication of CN117120486A publication Critical patent/CN117120486A/zh
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing three or more hetero rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62—Benzothiazoles
    • C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D277/70—Sulfur atoms
    • C07D277/74—Sulfur atoms substituted by carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/08—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
CN202280022428.9A 2021-03-23 2022-03-16 化合物及其制造方法、聚合性组合物、聚合物、全息摄影记录媒介、光学材料以及光学部件 Pending CN117120486A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021-049181 2021-03-23
JP2021049181 2021-03-23
PCT/JP2022/011919 WO2022202538A1 (ja) 2021-03-23 2022-03-16 化合物、及びその製造方法、重合性組成物、重合物、ホログラム記録媒体、光学材料、並びに光学部品

Publications (1)

Publication Number Publication Date
CN117120486A true CN117120486A (zh) 2023-11-24

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CN202280022428.9A Pending CN117120486A (zh) 2021-03-23 2022-03-16 化合物及其制造方法、聚合性组合物、聚合物、全息摄影记录媒介、光学材料以及光学部件

Country Status (6)

Country Link
US (1) US20240018137A1 (https=)
EP (1) EP4317155A4 (https=)
JP (1) JPWO2022202538A1 (https=)
CN (1) CN117120486A (https=)
TW (1) TW202302545A (https=)
WO (1) WO2022202538A1 (https=)

Cited By (1)

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TWI882856B (zh) * 2024-07-05 2025-05-01 晉一化工股份有限公司 三元二嵌段共聚物、活性陽離子聚合引發系組成物、二異丙烯基苯共聚物、萜烯聚合物、難燃性樹脂組成物、難燃性樹脂固化物及其用途

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* Cited by examiner, † Cited by third party
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WO2021100654A1 (ja) * 2019-11-19 2021-05-27 三菱ケミカル株式会社 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、及び光学部品
CN115916721B (zh) * 2020-06-24 2025-04-08 住友电气工业株式会社 树脂组合物、光纤以及光纤的制造方法
WO2024063135A1 (ja) * 2022-09-22 2024-03-28 三菱ケミカル株式会社 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、並びに光学部品
TW202432519A (zh) * 2022-10-19 2024-08-16 日商三菱化學股份有限公司 化合物、聚合性組合物、聚合物、全像記錄媒體、光學材料、及光學零件
CN120957964A (zh) * 2023-03-29 2025-11-14 三菱化学株式会社 化合物、聚合性组合物、全息记录介质、聚合物、光学材料以及光学部件
CN120004874A (zh) * 2023-09-28 2025-05-16 西安近代化学研究所 一种3,3-二（4-叠氮基呋咱-3-氧甲基）氧杂环丁烷及其合成方法
WO2026004955A1 (ja) * 2024-06-28 2026-01-02 三菱ケミカル株式会社 組成物、重合体、ホログラム記録媒体、光学材料、並びに光学部品

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CN1978416A (zh) * 2005-12-08 2007-06-13 中国石油化工股份有限公司 一种制备1,3－二醇单醚类化合物的方法
US20080266519A1 (en) * 2007-04-30 2008-10-30 Alcon Research, Ltd. Uv-absorbers for ophthalmic lens materials
JP2017014213A (ja) * 2015-07-01 2017-01-19 三菱化学株式会社 （メタ）アクリレート化合物、及び重合性組成物
KR20180084460A (ko) * 2017-01-17 2018-07-25 주식회사 트리엘 신규한 비닐페닐옥시기를 포함하는 화합물 및 이를 포함하는 감광성 포토레지스트 조성물
JP2021024842A (ja) * 2019-08-08 2021-02-22 三菱ケミカル株式会社 含硫黄芳香族複素環を有する化合物とその製造方法、重合性組成物、及び重合物

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JPH05230189A (ja) 1992-02-25 1993-09-07 Nippon Soda Co Ltd スルホニウム塩及び増感剤を含有する硬化性組成物
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Publication number Priority date Publication date Assignee Title
US20060183873A1 (en) * 2005-02-16 2006-08-17 Lunjia Xie Silicon ether compounds and a method for the preparation thereof
CN1978416A (zh) * 2005-12-08 2007-06-13 中国石油化工股份有限公司 一种制备1,3－二醇单醚类化合物的方法
US20080266519A1 (en) * 2007-04-30 2008-10-30 Alcon Research, Ltd. Uv-absorbers for ophthalmic lens materials
JP2017014213A (ja) * 2015-07-01 2017-01-19 三菱化学株式会社 （メタ）アクリレート化合物、及び重合性組成物
KR20180084460A (ko) * 2017-01-17 2018-07-25 주식회사 트리엘 신규한 비닐페닐옥시기를 포함하는 화합물 및 이를 포함하는 감광성 포토레지스트 조성물
JP2021024842A (ja) * 2019-08-08 2021-02-22 三菱ケミカル株式会社 含硫黄芳香族複素環を有する化合物とその製造方法、重合性組成物、及び重合物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI882856B (zh) * 2024-07-05 2025-05-01 晉一化工股份有限公司 三元二嵌段共聚物、活性陽離子聚合引發系組成物、二異丙烯基苯共聚物、萜烯聚合物、難燃性樹脂組成物、難燃性樹脂固化物及其用途

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JPWO2022202538A1 (https=) 2022-09-29
EP4317155A4 (en) 2024-07-31
WO2022202538A1 (ja) 2022-09-29
TW202302545A (zh) 2023-01-16
EP4317155A1 (en) 2024-02-07
US20240018137A1 (en) 2024-01-18

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