JPWO2022158172A1 - - Google Patents

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Publication number
JPWO2022158172A1
JPWO2022158172A1 JP2022577032A JP2022577032A JPWO2022158172A1 JP WO2022158172 A1 JPWO2022158172 A1 JP WO2022158172A1 JP 2022577032 A JP2022577032 A JP 2022577032A JP 2022577032 A JP2022577032 A JP 2022577032A JP WO2022158172 A1 JPWO2022158172 A1 JP WO2022158172A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2022577032A
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Japanese (ja)
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JP7474875B2 (ja
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Publication of JPWO2022158172A1 publication Critical patent/JPWO2022158172A1/ja
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Publication of JP7474875B2 publication Critical patent/JP7474875B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F5/00—Rotary letterpress machines
    • B41F5/24—Rotary letterpress machines for flexographic printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F10/00—Homopolymers and copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
    • C08F10/04—Monomers containing three or four carbon atoms
    • C08F10/08—Butenes
    • C08F10/10—Isobutene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C08F120/12—Esters of monohydric alcohols or phenols
    • C08F120/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F210/00—Copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
    • C08F210/04—Monomers containing three or four carbon atoms
    • C08F210/08—Butenes
    • C08F210/10—Isobutene
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D123/00—Coating compositions based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Coating compositions based on derivatives of such polymers
    • C09D123/02—Coating compositions based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D123/18—Homopolymers or copolymers of hydrocarbons having four or more carbon atoms
    • C09D123/20—Homopolymers or copolymers of hydrocarbons having four or more carbon atoms having four to nine carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D123/00—Coating compositions based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Coating compositions based on derivatives of such polymers
    • C09D123/02—Coating compositions based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D123/18—Homopolymers or copolymers of hydrocarbons having four or more carbon atoms
    • C09D123/20—Homopolymers or copolymers of hydrocarbons having four or more carbon atoms having four to nine carbon atoms
    • C09D123/22—Copolymers of isobutene; Butyl rubber ; Homo- or copolymers of other iso-olefines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
    • C09D125/02—Homopolymers or copolymers of hydrocarbons
    • C09D125/04—Homopolymers or copolymers of styrene
    • C09D125/08—Copolymers of styrene
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F210/00—Copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
    • C08F210/14—Monomers containing five or more carbon atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP2022577032A 2021-01-20 2021-12-14 フレキソ印刷版用感光性樹脂構成体、及びフレキソ印刷版の製造方法 Active JP7474875B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2021007168 2021-01-20
JP2021007103 2021-01-20
JP2021007103 2021-01-20
JP2021007168 2021-01-20
PCT/JP2021/046025 WO2022158172A1 (ja) 2021-01-20 2021-12-14 フレキソ印刷版用感光性樹脂構成体、及びフレキソ印刷版の製造方法

Publications (2)

Publication Number Publication Date
JPWO2022158172A1 true JPWO2022158172A1 (https=) 2022-07-28
JP7474875B2 JP7474875B2 (ja) 2024-04-25

Family

ID=82548341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022577032A Active JP7474875B2 (ja) 2021-01-20 2021-12-14 フレキソ印刷版用感光性樹脂構成体、及びフレキソ印刷版の製造方法

Country Status (4)

Country Link
US (1) US12019374B2 (https=)
EP (1) EP4282656A4 (https=)
JP (1) JP7474875B2 (https=)
WO (1) WO2022158172A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240141841A (ko) * 2022-07-05 2024-09-27 아사히 가세이 가부시키가이샤 플렉소 인쇄판 제조용 필름, 적층체, 및 플렉소 인쇄판의 제조 방법
WO2025143201A1 (ja) * 2023-12-27 2025-07-03 旭化成株式会社 印刷版の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002357907A (ja) * 2001-03-06 2002-12-13 E I Du Pont De Nemours & Co フレキソ印刷版の製造方法および該方法に使用する感光性要素
JP2010237583A (ja) * 2009-03-31 2010-10-21 Toray Ind Inc 水系現像感光性樹脂印刷原版
JP2014119594A (ja) * 2012-12-17 2014-06-30 Jsr Corp 赤外線アブレーション層を有するフレキソ印刷版用感光性樹脂積層体
WO2020122001A1 (ja) * 2018-12-10 2020-06-18 旭化成株式会社 フレキソ印刷原版及びフレキソ印刷版の製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5506086A (en) * 1995-05-01 1996-04-09 E. I. Du Pont De Nemours And Company Process for making a flexographic printing plate
US6238837B1 (en) 1995-05-01 2001-05-29 E.I. Du Pont De Nemours And Company Flexographic element having an infrared ablatable layer
JP4080068B2 (ja) 1997-09-16 2008-04-23 旭化成ケミカルズ株式会社 フレキソ印刷版用感光性構成体
WO2004104701A1 (ja) 2003-05-23 2004-12-02 Asahi Kasei Chemicals Corporation フレキソ印刷用感光性構成体
US20040241573A1 (en) 2003-06-02 2004-12-02 Ray Kevin Barry Thermally sensitive, white light safe mask for use in flexography
US7226709B1 (en) 2006-06-20 2007-06-05 Eastman Kodak Company Digital mask-forming film and method of use
JP4980038B2 (ja) * 2006-09-20 2012-07-18 東京応化工業株式会社 保護膜形成用材料及びホトレジストパターンの形成方法
JP2009063873A (ja) 2007-09-07 2009-03-26 Toray Ind Inc 感光性印刷版原版
JP2009119810A (ja) 2007-11-19 2009-06-04 Asahi Kasei Chemicals Corp レーザー彫刻用感光性樹脂組成物
TWI363785B (en) * 2007-11-30 2012-05-11 Ind Tech Res Inst Ink composition and fabrication method of color conversion film
US20110236705A1 (en) * 2010-03-29 2011-09-29 Ophira Melamed Flexographic printing precursors and methods of making
JP5710961B2 (ja) 2010-12-24 2015-04-30 住友理工株式会社 フレキソ印刷版原版
JP5433099B1 (ja) 2013-07-02 2014-03-05 日本電子精機株式会社 改良された赤外線アブレーション層を有するフレキソ印刷版用感光性樹脂積層体
JP6232279B2 (ja) 2013-12-24 2017-11-15 住友理工株式会社 赤外線アブレーション層用積層体、フレキソ印刷版原版、赤外線アブレーション層用積層体の製造方法
JP2016188900A (ja) 2015-03-30 2016-11-04 東レ株式会社 感光性樹脂積層体
EP3517310B1 (en) 2016-09-23 2021-02-17 Asahi Kasei Kabushiki Kaisha Ablation layer, photosensitive resin structure, and method for producing letterpress printing plate using said photosensitive resin structure
US20220082940A1 (en) 2019-02-27 2022-03-17 Asahi Kasei Kabushiki Kaisha Flexographic printing raw plate and manufacturing method of flexographic printing plate
WO2020209145A1 (ja) 2019-04-12 2020-10-15 富士フイルム株式会社 水現像性フレキソ印刷版原版、フレキソ印刷版および感光性樹脂組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002357907A (ja) * 2001-03-06 2002-12-13 E I Du Pont De Nemours & Co フレキソ印刷版の製造方法および該方法に使用する感光性要素
JP2010237583A (ja) * 2009-03-31 2010-10-21 Toray Ind Inc 水系現像感光性樹脂印刷原版
JP2014119594A (ja) * 2012-12-17 2014-06-30 Jsr Corp 赤外線アブレーション層を有するフレキソ印刷版用感光性樹脂積層体
WO2020122001A1 (ja) * 2018-12-10 2020-06-18 旭化成株式会社 フレキソ印刷原版及びフレキソ印刷版の製造方法

Also Published As

Publication number Publication date
EP4282656A4 (en) 2024-07-17
US12019374B2 (en) 2024-06-25
EP4282656A1 (en) 2023-11-29
JP7474875B2 (ja) 2024-04-25
US20240012328A1 (en) 2024-01-11
WO2022158172A1 (ja) 2022-07-28

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