JPWO2022009306A1 - - Google Patents

Info

Publication number
JPWO2022009306A1
JPWO2022009306A1 JP2022534531A JP2022534531A JPWO2022009306A1 JP WO2022009306 A1 JPWO2022009306 A1 JP WO2022009306A1 JP 2022534531 A JP2022534531 A JP 2022534531A JP 2022534531 A JP2022534531 A JP 2022534531A JP WO2022009306 A1 JPWO2022009306 A1 JP WO2022009306A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022534531A
Other languages
Japanese (ja)
Other versions
JPWO2022009306A5 (https=
JP7462047B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022009306A1 publication Critical patent/JPWO2022009306A1/ja
Publication of JPWO2022009306A5 publication Critical patent/JPWO2022009306A5/ja
Application granted granted Critical
Publication of JP7462047B2 publication Critical patent/JP7462047B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/817Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/817Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
    • H10H20/818Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0133Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
    • H10H20/01335Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0137Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/811Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN

Landscapes

  • Led Devices (AREA)
JP2022534531A 2020-07-07 2020-07-07 窒化物半導体紫外線発光素子及びその製造方法 Active JP7462047B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/026558 WO2022009306A1 (ja) 2020-07-07 2020-07-07 窒化物半導体紫外線発光素子及びその製造方法

Publications (3)

Publication Number Publication Date
JPWO2022009306A1 true JPWO2022009306A1 (https=) 2022-01-13
JPWO2022009306A5 JPWO2022009306A5 (https=) 2023-02-22
JP7462047B2 JP7462047B2 (ja) 2024-04-04

Family

ID=79552315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022534531A Active JP7462047B2 (ja) 2020-07-07 2020-07-07 窒化物半導体紫外線発光素子及びその製造方法

Country Status (5)

Country Link
US (1) US12328974B2 (https=)
JP (1) JP7462047B2 (https=)
CN (1) CN115868033B (https=)
TW (1) TWI881114B (https=)
WO (1) WO2022009306A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023203599A1 (ja) * 2022-04-18 2023-10-26 日機装株式会社 窒化物半導体紫外線発光素子

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009123969A (ja) * 2007-11-15 2009-06-04 Tohoku Univ 紫外線窒化物半導体発光素子およびその製造方法
JP2011054717A (ja) * 2009-09-01 2011-03-17 Kanazawa Inst Of Technology 半導体発光素子
WO2013021464A1 (ja) * 2011-08-09 2013-02-14 創光科学株式会社 窒化物半導体紫外線発光素子
US20140103289A1 (en) * 2010-04-30 2014-04-17 Yitao Liao High efficiency ultraviolet light emitting diode with band structure potential fluctuations
US9196788B1 (en) * 2014-09-08 2015-11-24 Sandia Corporation High extraction efficiency ultraviolet light-emitting diode
WO2017013729A1 (ja) * 2015-07-21 2017-01-26 創光科学株式会社 窒化物半導体紫外線発光素子
WO2019102557A1 (ja) * 2017-11-22 2019-05-31 創光科学株式会社 窒化物半導体発光素子
JP2019102470A (ja) * 2017-11-28 2019-06-24 日機装株式会社 窒化物半導体発光素子及び窒化物半導体発光素子の製造方法
WO2019159265A1 (ja) * 2018-02-14 2019-08-22 創光科学株式会社 窒化物半導体紫外線発光素子
JP2020087964A (ja) * 2018-11-15 2020-06-04 日機装株式会社 半導体発光素子および半導体発光素子の製造方法
JP2020098908A (ja) * 2018-12-14 2020-06-25 Dowaエレクトロニクス株式会社 Iii族窒化物半導体発光素子及びその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002016000A (ja) * 2000-06-27 2002-01-18 Sanyo Electric Co Ltd 窒化物系半導体素子および窒化物系半導体基板
JP4276020B2 (ja) * 2003-08-01 2009-06-10 豊田合成株式会社 Iii族窒化物系化合物半導体の製造方法
JP2006060164A (ja) * 2004-08-24 2006-03-02 National Institute Of Advanced Industrial & Technology 窒化物半導体デバイスおよび窒化物半導体結晶成長方法
EP2323180A1 (en) * 2008-09-11 2011-05-18 Sumitomo Electric Industries, Ltd. Nitride semiconductor optical device, epitaxial wafer for nitride semiconductor optical device, and method for manufacturing semiconductor light-emitting device
WO2014178288A1 (ja) 2013-04-30 2014-11-06 創光科学株式会社 紫外線発光装置
CN106415854B (zh) * 2014-05-27 2019-10-01 斯兰纳Uv科技有限公司 包括n型和p型超晶格的电子装置
JP6408344B2 (ja) * 2014-11-04 2018-10-17 Dowaエレクトロニクス株式会社 Iii族窒化物半導体エピタキシャル基板およびその製造方法、ならびにiii族窒化物半導体発光素子
WO2016157518A1 (ja) 2015-04-03 2016-10-06 創光科学株式会社 窒化物半導体紫外線発光素子及び窒化物半導体紫外線発光装置
JP6440846B2 (ja) * 2015-08-03 2018-12-19 創光科学株式会社 窒化物半導体ウェハ及びその製造方法、並びに、窒化物半導体紫外線発光素子及び装置
JP6560821B2 (ja) * 2017-02-15 2019-08-14 創光科学株式会社 窒化物半導体紫外線発光素子の製造方法及び窒化物半導体紫外線発光素子
CN109378371B (zh) * 2018-10-17 2020-10-09 湘能华磊光电股份有限公司 Led外延片生长方法

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009123969A (ja) * 2007-11-15 2009-06-04 Tohoku Univ 紫外線窒化物半導体発光素子およびその製造方法
JP2011054717A (ja) * 2009-09-01 2011-03-17 Kanazawa Inst Of Technology 半導体発光素子
US20140103289A1 (en) * 2010-04-30 2014-04-17 Yitao Liao High efficiency ultraviolet light emitting diode with band structure potential fluctuations
WO2013021464A1 (ja) * 2011-08-09 2013-02-14 創光科学株式会社 窒化物半導体紫外線発光素子
US9196788B1 (en) * 2014-09-08 2015-11-24 Sandia Corporation High extraction efficiency ultraviolet light-emitting diode
WO2017013729A1 (ja) * 2015-07-21 2017-01-26 創光科学株式会社 窒化物半導体紫外線発光素子
WO2019102557A1 (ja) * 2017-11-22 2019-05-31 創光科学株式会社 窒化物半導体発光素子
JP2019102470A (ja) * 2017-11-28 2019-06-24 日機装株式会社 窒化物半導体発光素子及び窒化物半導体発光素子の製造方法
WO2019159265A1 (ja) * 2018-02-14 2019-08-22 創光科学株式会社 窒化物半導体紫外線発光素子
JP2020087964A (ja) * 2018-11-15 2020-06-04 日機装株式会社 半導体発光素子および半導体発光素子の製造方法
JP2020098908A (ja) * 2018-12-14 2020-06-25 Dowaエレクトロニクス株式会社 Iii族窒化物半導体発光素子及びその製造方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
KOJIMA, K. ET AL.: "Carrier localization structure combined with current micropaths in AlGaN quantum wells grown on an A", APPLIED PHYSICS LETTERS, vol. 114, JPN7020002979, 7 January 2019 (2019-01-07), US, pages 011102, ISSN: 0005146366 *
NAGASAWA ET AL.: "Comparison of AlxGa1-xN multiple quantum wells designed for 265 and 285 nm deep-ultraviolet LEDs gro", APPLIED PHYSICS EXPRESS, vol. 12, JPN6020036158, June 2019 (2019-06-01), JP, pages 064009, ISSN: 0005286308 *
NAGASAWA, YOSUKE ET AL.: "Two-dimensional analysis of the nonuniform quantum yields of multiple quantum wells for AlGaN-based", JOUANAL OF APPLIED PHYSICS, vol. 126, JPN7020002980, 3 December 2019 (2019-12-03), US, pages 215703, ISSN: 0005286309 *

Also Published As

Publication number Publication date
TWI881114B (zh) 2025-04-21
US12328974B2 (en) 2025-06-10
US20230299232A1 (en) 2023-09-21
CN115868033A (zh) 2023-03-28
TW202218186A (zh) 2022-05-01
JP7462047B2 (ja) 2024-04-04
WO2022009306A1 (ja) 2022-01-13
CN115868033B (zh) 2025-05-16

Similar Documents

Publication Publication Date Title
BR112023005462A2 (https=)
BR112023012656A2 (https=)
BR112021014123A2 (https=)
BR112023009656A2 (https=)
BR112022009896A2 (https=)
BR112021017747A2 (https=)
BR112022024743A2 (https=)
BR112022026905A2 (https=)
BR112023011738A2 (https=)
BR112023004146A2 (https=)
BR112023006729A2 (https=)
BR102021018859A2 (https=)
BR102021015500A2 (https=)
BR102021007058A2 (https=)
BR102020022030A2 (https=)
BR112023016292A2 (https=)
BR112023011539A2 (https=)
BR112023011610A2 (https=)
BR112023008976A2 (https=)
BR102021020147A2 (https=)
BR102021018926A2 (https=)
BR102021018167A2 (https=)
BR102021017576A2 (https=)
BR102021016837A2 (https=)
BR102021016551A2 (https=)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221206

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20221206

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20230317

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230905

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20231005

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240319

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240325

R150 Certificate of patent or registration of utility model

Ref document number: 7462047

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150