CN115868033B - 氮化物半导体紫外线发光元件及其制造方法 - Google Patents
氮化物半导体紫外线发光元件及其制造方法 Download PDFInfo
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- CN115868033B CN115868033B CN202080102781.9A CN202080102781A CN115868033B CN 115868033 B CN115868033 B CN 115868033B CN 202080102781 A CN202080102781 A CN 202080102781A CN 115868033 B CN115868033 B CN 115868033B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
- H10H20/818—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0137—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
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Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2020/026558 WO2022009306A1 (ja) | 2020-07-07 | 2020-07-07 | 窒化物半導体紫外線発光素子及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115868033A CN115868033A (zh) | 2023-03-28 |
| CN115868033B true CN115868033B (zh) | 2025-05-16 |
Family
ID=79552315
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202080102781.9A Active CN115868033B (zh) | 2020-07-07 | 2020-07-07 | 氮化物半导体紫外线发光元件及其制造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12328974B2 (https=) |
| JP (1) | JP7462047B2 (https=) |
| CN (1) | CN115868033B (https=) |
| TW (1) | TWI881114B (https=) |
| WO (1) | WO2022009306A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023203599A1 (ja) * | 2022-04-18 | 2023-10-26 | 日機装株式会社 | 窒化物半導体紫外線発光素子 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101874309A (zh) * | 2008-09-11 | 2010-10-27 | 住友电气工业株式会社 | 氮化物类半导体光元件、用于氮化物类半导体光元件的外延晶片及制造半导体发光元件的方法 |
| CN109378371A (zh) * | 2018-10-17 | 2019-02-22 | 湘能华磊光电股份有限公司 | Led外延片生长方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002016000A (ja) * | 2000-06-27 | 2002-01-18 | Sanyo Electric Co Ltd | 窒化物系半導体素子および窒化物系半導体基板 |
| JP4276020B2 (ja) * | 2003-08-01 | 2009-06-10 | 豊田合成株式会社 | Iii族窒化物系化合物半導体の製造方法 |
| JP2006060164A (ja) * | 2004-08-24 | 2006-03-02 | National Institute Of Advanced Industrial & Technology | 窒化物半導体デバイスおよび窒化物半導体結晶成長方法 |
| JP5142371B2 (ja) * | 2007-11-15 | 2013-02-13 | 国立大学法人東北大学 | 紫外線窒化物半導体発光素子およびその製造方法 |
| JP5409210B2 (ja) | 2009-09-01 | 2014-02-05 | 学校法人金沢工業大学 | 半導体発光素子 |
| WO2012012010A2 (en) * | 2010-04-30 | 2012-01-26 | Trustees Of Boston University | High efficiency ultraviolet light emitting diode with band structure potential fluctuations |
| KR20140043161A (ko) | 2011-08-09 | 2014-04-08 | 소코 가가쿠 가부시키가이샤 | 질화물 반도체 자외선 발광 소자 |
| WO2014178288A1 (ja) | 2013-04-30 | 2014-11-06 | 創光科学株式会社 | 紫外線発光装置 |
| CN106415854B (zh) * | 2014-05-27 | 2019-10-01 | 斯兰纳Uv科技有限公司 | 包括n型和p型超晶格的电子装置 |
| US9196788B1 (en) | 2014-09-08 | 2015-11-24 | Sandia Corporation | High extraction efficiency ultraviolet light-emitting diode |
| JP6408344B2 (ja) * | 2014-11-04 | 2018-10-17 | Dowaエレクトロニクス株式会社 | Iii族窒化物半導体エピタキシャル基板およびその製造方法、ならびにiii族窒化物半導体発光素子 |
| WO2016157518A1 (ja) | 2015-04-03 | 2016-10-06 | 創光科学株式会社 | 窒化物半導体紫外線発光素子及び窒化物半導体紫外線発光装置 |
| EP3293774B1 (en) * | 2015-07-21 | 2020-03-18 | Soko Kagaku Co., Ltd. | Nitride semiconductor ultraviolet light-emitting element |
| JP6440846B2 (ja) * | 2015-08-03 | 2018-12-19 | 創光科学株式会社 | 窒化物半導体ウェハ及びその製造方法、並びに、窒化物半導体紫外線発光素子及び装置 |
| JP6560821B2 (ja) * | 2017-02-15 | 2019-08-14 | 創光科学株式会社 | 窒化物半導体紫外線発光素子の製造方法及び窒化物半導体紫外線発光素子 |
| WO2019102557A1 (ja) * | 2017-11-22 | 2019-05-31 | 創光科学株式会社 | 窒化物半導体発光素子 |
| JP6691090B2 (ja) * | 2017-11-28 | 2020-04-28 | 日機装株式会社 | 窒化物半導体発光素子及び窒化物半導体発光素子の製造方法 |
| WO2019159265A1 (ja) * | 2018-02-14 | 2019-08-22 | 創光科学株式会社 | 窒化物半導体紫外線発光素子 |
| JP7146589B2 (ja) * | 2018-11-15 | 2022-10-04 | 日機装株式会社 | 半導体発光素子および半導体発光素子の製造方法 |
| CN113169255B (zh) * | 2018-12-14 | 2025-05-16 | 同和电子科技有限公司 | Iii族氮化物半导体发光元件及其制造方法 |
-
2020
- 2020-07-07 WO PCT/JP2020/026558 patent/WO2022009306A1/ja not_active Ceased
- 2020-07-07 US US18/010,393 patent/US12328974B2/en active Active
- 2020-07-07 JP JP2022534531A patent/JP7462047B2/ja active Active
- 2020-07-07 CN CN202080102781.9A patent/CN115868033B/zh active Active
-
2021
- 2021-04-20 TW TW110114068A patent/TWI881114B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101874309A (zh) * | 2008-09-11 | 2010-10-27 | 住友电气工业株式会社 | 氮化物类半导体光元件、用于氮化物类半导体光元件的外延晶片及制造半导体发光元件的方法 |
| CN109378371A (zh) * | 2018-10-17 | 2019-02-22 | 湘能华磊光电股份有限公司 | Led外延片生长方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI881114B (zh) | 2025-04-21 |
| US12328974B2 (en) | 2025-06-10 |
| US20230299232A1 (en) | 2023-09-21 |
| CN115868033A (zh) | 2023-03-28 |
| TW202218186A (zh) | 2022-05-01 |
| JP7462047B2 (ja) | 2024-04-04 |
| WO2022009306A1 (ja) | 2022-01-13 |
| JPWO2022009306A1 (https=) | 2022-01-13 |
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| PB01 | Publication | ||
| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20230420 Address after: Tokyo, Japan Applicant after: NIKKISO Co.,Ltd. Address before: Ishikawa County, Japan Applicant before: SOKO KAGAKU Co.,Ltd. |
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| GR01 | Patent grant |