CN115868033B - 氮化物半导体紫外线发光元件及其制造方法 - Google Patents

氮化物半导体紫外线发光元件及其制造方法 Download PDF

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CN115868033B
CN115868033B CN202080102781.9A CN202080102781A CN115868033B CN 115868033 B CN115868033 B CN 115868033B CN 202080102781 A CN202080102781 A CN 202080102781A CN 115868033 B CN115868033 B CN 115868033B
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CN115868033A (zh
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平野光
长泽阳祐
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Nikkiso Co Ltd
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Nikkiso Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/817Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/817Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
    • H10H20/818Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0133Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
    • H10H20/01335Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0137Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/811Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN

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CN202080102781.9A 2020-07-07 2020-07-07 氮化物半导体紫外线发光元件及其制造方法 Active CN115868033B (zh)

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PCT/JP2020/026558 WO2022009306A1 (ja) 2020-07-07 2020-07-07 窒化物半導体紫外線発光素子及びその製造方法

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US (1) US12328974B2 (https=)
JP (1) JP7462047B2 (https=)
CN (1) CN115868033B (https=)
TW (1) TWI881114B (https=)
WO (1) WO2022009306A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023203599A1 (ja) * 2022-04-18 2023-10-26 日機装株式会社 窒化物半導体紫外線発光素子

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CN101874309A (zh) * 2008-09-11 2010-10-27 住友电气工业株式会社 氮化物类半导体光元件、用于氮化物类半导体光元件的外延晶片及制造半导体发光元件的方法
CN109378371A (zh) * 2018-10-17 2019-02-22 湘能华磊光电股份有限公司 Led外延片生长方法

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JP4276020B2 (ja) * 2003-08-01 2009-06-10 豊田合成株式会社 Iii族窒化物系化合物半導体の製造方法
JP2006060164A (ja) * 2004-08-24 2006-03-02 National Institute Of Advanced Industrial & Technology 窒化物半導体デバイスおよび窒化物半導体結晶成長方法
JP5142371B2 (ja) * 2007-11-15 2013-02-13 国立大学法人東北大学 紫外線窒化物半導体発光素子およびその製造方法
JP5409210B2 (ja) 2009-09-01 2014-02-05 学校法人金沢工業大学 半導体発光素子
WO2012012010A2 (en) * 2010-04-30 2012-01-26 Trustees Of Boston University High efficiency ultraviolet light emitting diode with band structure potential fluctuations
KR20140043161A (ko) 2011-08-09 2014-04-08 소코 가가쿠 가부시키가이샤 질화물 반도체 자외선 발광 소자
WO2014178288A1 (ja) 2013-04-30 2014-11-06 創光科学株式会社 紫外線発光装置
CN106415854B (zh) * 2014-05-27 2019-10-01 斯兰纳Uv科技有限公司 包括n型和p型超晶格的电子装置
US9196788B1 (en) 2014-09-08 2015-11-24 Sandia Corporation High extraction efficiency ultraviolet light-emitting diode
JP6408344B2 (ja) * 2014-11-04 2018-10-17 Dowaエレクトロニクス株式会社 Iii族窒化物半導体エピタキシャル基板およびその製造方法、ならびにiii族窒化物半導体発光素子
WO2016157518A1 (ja) 2015-04-03 2016-10-06 創光科学株式会社 窒化物半導体紫外線発光素子及び窒化物半導体紫外線発光装置
EP3293774B1 (en) * 2015-07-21 2020-03-18 Soko Kagaku Co., Ltd. Nitride semiconductor ultraviolet light-emitting element
JP6440846B2 (ja) * 2015-08-03 2018-12-19 創光科学株式会社 窒化物半導体ウェハ及びその製造方法、並びに、窒化物半導体紫外線発光素子及び装置
JP6560821B2 (ja) * 2017-02-15 2019-08-14 創光科学株式会社 窒化物半導体紫外線発光素子の製造方法及び窒化物半導体紫外線発光素子
WO2019102557A1 (ja) * 2017-11-22 2019-05-31 創光科学株式会社 窒化物半導体発光素子
JP6691090B2 (ja) * 2017-11-28 2020-04-28 日機装株式会社 窒化物半導体発光素子及び窒化物半導体発光素子の製造方法
WO2019159265A1 (ja) * 2018-02-14 2019-08-22 創光科学株式会社 窒化物半導体紫外線発光素子
JP7146589B2 (ja) * 2018-11-15 2022-10-04 日機装株式会社 半導体発光素子および半導体発光素子の製造方法
CN113169255B (zh) * 2018-12-14 2025-05-16 同和电子科技有限公司 Iii族氮化物半导体发光元件及其制造方法

Patent Citations (2)

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CN109378371A (zh) * 2018-10-17 2019-02-22 湘能华磊光电股份有限公司 Led外延片生长方法

Also Published As

Publication number Publication date
TWI881114B (zh) 2025-04-21
US12328974B2 (en) 2025-06-10
US20230299232A1 (en) 2023-09-21
CN115868033A (zh) 2023-03-28
TW202218186A (zh) 2022-05-01
JP7462047B2 (ja) 2024-04-04
WO2022009306A1 (ja) 2022-01-13
JPWO2022009306A1 (https=) 2022-01-13

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