JPWO2021220648A5 - - Google Patents
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- Publication number
- JPWO2021220648A5 JPWO2021220648A5 JP2022517543A JP2022517543A JPWO2021220648A5 JP WO2021220648 A5 JPWO2021220648 A5 JP WO2021220648A5 JP 2022517543 A JP2022517543 A JP 2022517543A JP 2022517543 A JP2022517543 A JP 2022517543A JP WO2021220648 A5 JPWO2021220648 A5 JP WO2021220648A5
- Authority
- JP
- Japan
- Prior art keywords
- formula
- examples
- limited
- compound represented
- following compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 description 2
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020077908 | 2020-04-27 | ||
| PCT/JP2021/010568 WO2021220648A1 (ja) | 2020-04-27 | 2021-03-16 | 感放射線性樹脂組成物及びそれを用いたレジストパターンの形成方法、並びに、スルホン酸塩化合物及びそれを含む感放射線性酸発生剤 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2021220648A1 JPWO2021220648A1 (https=) | 2021-11-04 |
| JPWO2021220648A5 true JPWO2021220648A5 (https=) | 2023-01-23 |
Family
ID=78331946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022517543A Pending JPWO2021220648A1 (https=) | 2020-04-27 | 2021-03-16 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2021220648A1 (https=) |
| TW (1) | TW202140420A (https=) |
| WO (1) | WO2021220648A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023100574A1 (ja) * | 2021-12-01 | 2023-06-08 | Jsr株式会社 | 感放射線性樹脂組成物、パターン形成方法、基板の製造方法、及び化合物 |
| WO2024070091A1 (ja) * | 2022-09-29 | 2024-04-04 | 東洋合成工業株式会社 | オニウム塩、光酸発生剤、ポリマー、レジスト組成物及び、該レジスト組成物を用いたデバイスの製造方法 |
| WO2025041682A1 (ja) * | 2023-08-18 | 2025-02-27 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、化合物、及び、酸発生剤 |
| KR20260049287A (ko) * | 2023-09-13 | 2026-04-13 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 수지 조성물, 레지스트막, 패턴 형성 방법, 및 전자 디바이스의 제조 방법 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003057825A (ja) * | 2001-08-16 | 2003-02-28 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| US7678528B2 (en) * | 2005-11-16 | 2010-03-16 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| US8455176B2 (en) * | 2008-11-12 | 2013-06-04 | Az Electronic Materials Usa Corp. | Coating composition |
| KR101766491B1 (ko) * | 2009-04-21 | 2017-08-08 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 중합체 및 레지스트 패턴 형성 방법 |
| JP5618619B2 (ja) * | 2010-05-17 | 2014-11-05 | 富士フイルム株式会社 | Ｘ線、電子線又はｅｕｖ光露光用の感活性光線性又は感放射線性樹脂組成物、並びに該組成物を用いたレジスト膜及びパターン形成方法 |
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2021
- 2021-03-16 WO PCT/JP2021/010568 patent/WO2021220648A1/ja not_active Ceased
- 2021-03-16 JP JP2022517543A patent/JPWO2021220648A1/ja active Pending
- 2021-03-23 TW TW110110465A patent/TW202140420A/zh unknown