JPWO2021192507A1 - - Google Patents

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Publication number
JPWO2021192507A1
JPWO2021192507A1 JP2022509288A JP2022509288A JPWO2021192507A1 JP WO2021192507 A1 JPWO2021192507 A1 JP WO2021192507A1 JP 2022509288 A JP2022509288 A JP 2022509288A JP 2022509288 A JP2022509288 A JP 2022509288A JP WO2021192507 A1 JPWO2021192507 A1 JP WO2021192507A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022509288A
Other languages
Japanese (ja)
Other versions
JP7332031B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021192507A1 publication Critical patent/JPWO2021192507A1/ja
Application granted granted Critical
Publication of JP7332031B2 publication Critical patent/JP7332031B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2022509288A 2020-03-23 2021-01-13 アクリル系重合体、硬化性組成物及びその硬化物 Active JP7332031B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020050414 2020-03-23
JP2020050414 2020-03-23
PCT/JP2021/000893 WO2021192507A1 (ja) 2020-03-23 2021-01-13 アクリル系重合体、硬化性組成物及びその硬化物

Publications (2)

Publication Number Publication Date
JPWO2021192507A1 true JPWO2021192507A1 (zh) 2021-09-30
JP7332031B2 JP7332031B2 (ja) 2023-08-23

Family

ID=77890099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022509288A Active JP7332031B2 (ja) 2020-03-23 2021-01-13 アクリル系重合体、硬化性組成物及びその硬化物

Country Status (5)

Country Link
JP (1) JP7332031B2 (zh)
KR (1) KR20220101130A (zh)
CN (1) CN114867761B (zh)
TW (1) TWI776359B (zh)
WO (1) WO2021192507A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023063633A1 (ko) 2021-10-12 2023-04-20 주식회사 엘지에너지솔루션 배터리 팩 및 이를 포함하는 자동차

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151939A (en) * 1981-03-16 1982-09-20 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS6341569A (ja) * 1986-08-04 1988-02-22 ザ　グリデン　カンパニ− グリシジルアクリル粉末塗料
JP2009020246A (ja) * 2007-07-11 2009-01-29 Toray Ind Inc 感光性樹脂組成物、これを用いた絶縁性樹脂パターンの製造方法および有機電界発光素子
JP2013514403A (ja) * 2009-12-18 2013-04-25 ビーエーエスエフ ソシエタス・ヨーロピア コールドシールされ、再封止可能な包装、およびその製造のための組成物
WO2018186208A1 (ja) * 2017-04-04 2018-10-11 旭化成株式会社 フレキソ印刷版用感光性樹脂組成物、フレキソ印刷原版、フレキソ印刷版、及び、共重合体

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2896833B2 (ja) 1993-10-06 1999-05-31 三菱レイヨン株式会社 ビニル系重合体粒子
JP2001281931A (ja) 2000-03-31 2001-10-10 Nippon Zeon Co Ltd 静電荷像現像用トナー及びその製造方法
JP6444159B2 (ja) * 2014-12-17 2018-12-26 株式会社日本触媒 重合体およびその用途

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151939A (en) * 1981-03-16 1982-09-20 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS6341569A (ja) * 1986-08-04 1988-02-22 ザ　グリデン　カンパニ− グリシジルアクリル粉末塗料
JP2009020246A (ja) * 2007-07-11 2009-01-29 Toray Ind Inc 感光性樹脂組成物、これを用いた絶縁性樹脂パターンの製造方法および有機電界発光素子
JP2013514403A (ja) * 2009-12-18 2013-04-25 ビーエーエスエフ ソシエタス・ヨーロピア コールドシールされ、再封止可能な包装、およびその製造のための組成物
WO2018186208A1 (ja) * 2017-04-04 2018-10-11 旭化成株式会社 フレキソ印刷版用感光性樹脂組成物、フレキソ印刷原版、フレキソ印刷版、及び、共重合体

Also Published As

Publication number Publication date
CN114867761A (zh) 2022-08-05
JP7332031B2 (ja) 2023-08-23
TWI776359B (zh) 2022-09-01
CN114867761B (zh) 2024-02-09
KR20220101130A (ko) 2022-07-19
WO2021192507A1 (ja) 2021-09-30
TW202136333A (zh) 2021-10-01

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