JPWO2021156910A1 - - Google Patents
Info
- Publication number
- JPWO2021156910A1 JPWO2021156910A1 JP2021560933A JP2021560933A JPWO2021156910A1 JP WO2021156910 A1 JPWO2021156910 A1 JP WO2021156910A1 JP 2021560933 A JP2021560933 A JP 2021560933A JP 2021560933 A JP2021560933 A JP 2021560933A JP WO2021156910 A1 JPWO2021156910 A1 JP WO2021156910A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G7/00—Capacitors in which the capacitance is varied by non-mechanical means; Processes of their manufacture
- H01G7/06—Capacitors in which the capacitance is varied by non-mechanical means; Processes of their manufacture having a dielectric selected for the variation of its permittivity with applied voltage, i.e. ferroelectric capacitors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Transform (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2020/003910 WO2021156910A1 (ja) | 2020-02-03 | 2020-02-03 | 可変容量素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2021156910A1 true JPWO2021156910A1 (https=) | 2021-08-12 |
| JP7003344B2 JP7003344B2 (ja) | 2022-01-20 |
Family
ID=77199848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021560933A Expired - Fee Related JP7003344B2 (ja) | 2020-02-03 | 2020-02-03 | 可変容量素子 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7003344B2 (https=) |
| WO (1) | WO2021156910A1 (https=) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06243990A (ja) * | 1992-12-16 | 1994-09-02 | Hitachi Ltd | インピーダンス整合方法及びその装置 |
| JPH07169590A (ja) * | 1993-09-16 | 1995-07-04 | Fujitsu Ltd | 電子密度の測定方法及びその装置及び電子密度の制御装置及びプラズマ処理装置 |
| JPH08115902A (ja) * | 1994-10-14 | 1996-05-07 | Fujitsu Ltd | 半導体製造装置及び半導体装置の製造方法 |
| JPH08236504A (ja) * | 1995-02-27 | 1996-09-13 | Fujitsu Ltd | 半導体製造装置及び半導体装置の製造方法 |
| JP2002206167A (ja) * | 2000-12-28 | 2002-07-26 | Toshiba Corp | プラズマコーティング装置及びプラズマコーティング方法 |
| JP2002540582A (ja) * | 1999-03-31 | 2002-11-26 | ラム リサーチ コーポレーション | 可変高周波結合を有するコイルを備えたプラズマ・プロセッサ |
| JP2013098177A (ja) * | 2011-10-31 | 2013-05-20 | Semes Co Ltd | 基板処理装置及びインピーダンスマッチング方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4482308B2 (ja) * | 2002-11-26 | 2010-06-16 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
-
2020
- 2020-02-03 JP JP2021560933A patent/JP7003344B2/ja not_active Expired - Fee Related
- 2020-02-03 WO PCT/JP2020/003910 patent/WO2021156910A1/ja not_active Ceased
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06243990A (ja) * | 1992-12-16 | 1994-09-02 | Hitachi Ltd | インピーダンス整合方法及びその装置 |
| JPH07169590A (ja) * | 1993-09-16 | 1995-07-04 | Fujitsu Ltd | 電子密度の測定方法及びその装置及び電子密度の制御装置及びプラズマ処理装置 |
| JPH08115902A (ja) * | 1994-10-14 | 1996-05-07 | Fujitsu Ltd | 半導体製造装置及び半導体装置の製造方法 |
| JPH08236504A (ja) * | 1995-02-27 | 1996-09-13 | Fujitsu Ltd | 半導体製造装置及び半導体装置の製造方法 |
| JP2002540582A (ja) * | 1999-03-31 | 2002-11-26 | ラム リサーチ コーポレーション | 可変高周波結合を有するコイルを備えたプラズマ・プロセッサ |
| JP2002206167A (ja) * | 2000-12-28 | 2002-07-26 | Toshiba Corp | プラズマコーティング装置及びプラズマコーティング方法 |
| JP2013098177A (ja) * | 2011-10-31 | 2013-05-20 | Semes Co Ltd | 基板処理装置及びインピーダンスマッチング方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7003344B2 (ja) | 2022-01-20 |
| WO2021156910A1 (ja) | 2021-08-12 |
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