JPWO2021124609A1 - - Google Patents

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Publication number
JPWO2021124609A1
JPWO2021124609A1 JP2021565327A JP2021565327A JPWO2021124609A1 JP WO2021124609 A1 JPWO2021124609 A1 JP WO2021124609A1 JP 2021565327 A JP2021565327 A JP 2021565327A JP 2021565327 A JP2021565327 A JP 2021565327A JP WO2021124609 A1 JPWO2021124609 A1 JP WO2021124609A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021565327A
Other languages
Japanese (ja)
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JP7374222B2 (ja
JPWO2021124609A5 (https=
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Publication of JPWO2021124609A1 publication Critical patent/JPWO2021124609A1/ja
Publication of JPWO2021124609A5 publication Critical patent/JPWO2021124609A5/ja
Application granted granted Critical
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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/802Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
    • H10F39/8027Geometry of the photosensitive area
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/806Optical elements or arrangements associated with the image sensors
    • H10F39/8067Reflectors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Light Receiving Elements (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Solid State Image Pick-Up Elements (AREA)
JP2021565327A 2019-12-17 2020-07-30 電磁波検出器および電磁波検出器集合体 Active JP7374222B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019227413 2019-12-17
JP2019227413 2019-12-17
PCT/JP2020/029339 WO2021124609A1 (ja) 2019-12-17 2020-07-30 電磁波検出器および電磁波検出器集合体

Publications (3)

Publication Number Publication Date
JPWO2021124609A1 true JPWO2021124609A1 (https=) 2021-06-24
JPWO2021124609A5 JPWO2021124609A5 (https=) 2022-07-14
JP7374222B2 JP7374222B2 (ja) 2023-11-06

Family

ID=76478702

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021565327A Active JP7374222B2 (ja) 2019-12-17 2020-07-30 電磁波検出器および電磁波検出器集合体

Country Status (4)

Country Link
US (1) US12199113B2 (https=)
JP (1) JP7374222B2 (https=)
CN (1) CN114846628B (https=)
WO (1) WO2021124609A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7550854B2 (ja) * 2020-06-15 2024-09-13 三菱電機株式会社 電磁波検出器および電磁波検出器アレイ
FR3114440B1 (fr) * 2020-09-21 2022-08-19 Commissariat Energie Atomique Photodiode passivée comportant une portion périphérique ferroélectrique
FR3124311B1 (fr) * 2021-06-16 2023-06-30 St Microelectronics Crolles 2 Sas Capteur photosensible et procédé de fabrication correspondant.
JP7562054B1 (ja) * 2023-12-20 2024-10-04 三菱電機株式会社 電磁波検出器及び電磁波検出器アレイ
WO2026079611A1 (ko) * 2024-10-10 2026-04-16 엘지이노텍 주식회사 단차 구조가 형성되는 필드 플레이트를 포함하는 spad 소자

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004260184A (ja) * 2003-02-25 2004-09-16 Samsung Electronics Co Ltd 光素子および光信号入出力装置
US20130082241A1 (en) * 2011-09-29 2013-04-04 Francis J. Kub Graphene on Semiconductor Detector
JP2013177273A (ja) * 2012-02-28 2013-09-09 Kyushu Univ グラフェン薄膜の製造方法及びグラフェン薄膜
US20150243826A1 (en) * 2012-08-28 2015-08-27 Northeastern University Tunable heterojunction for multifunctional electronics and photovoltaics
JP2016025356A (ja) * 2014-07-18 2016-02-08 三星電子株式会社Samsung Electronics Co.,Ltd. グラフェン素子、その製造及び動作方法、並びにグラフェン素子を含む電子装置
WO2017145299A1 (ja) * 2016-02-24 2017-08-31 三菱電機株式会社 電磁波検出器
WO2018173347A1 (ja) * 2017-03-22 2018-09-27 三菱電機株式会社 電磁波検出器、電磁波検出器アレイおよび電磁波検出方法
WO2019081492A1 (en) * 2017-10-26 2019-05-02 Emberion Oy PHOTOSENSITIVE FIELD EFFECT TRANSISTOR
JP6528918B1 (ja) * 2018-03-06 2019-06-12 三菱電機株式会社 電磁波検出器及びそれを備えた電磁波検出器アレイ
WO2019171622A1 (ja) * 2018-03-06 2019-09-12 三菱電機株式会社 電磁波検出器及びそれを備えた電磁波検出器アレイ

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8530933B2 (en) * 2008-10-10 2013-09-10 National Institute Of Advanced Industrial Science And Technology Photo transistor
US8053782B2 (en) * 2009-08-24 2011-11-08 International Business Machines Corporation Single and few-layer graphene based photodetecting devices
JP5095864B2 (ja) * 2009-12-09 2012-12-12 シャープ株式会社 半導体装置およびその製造方法
US9373685B2 (en) * 2013-02-15 2016-06-21 Samsung Electronics Co., Ltd. Graphene device and electronic apparatus
KR102214833B1 (ko) * 2014-06-17 2021-02-10 삼성전자주식회사 그래핀과 양자점을 포함하는 전자 소자
KR102363563B1 (ko) * 2016-03-03 2022-02-17 하마마츠 포토닉스 가부시키가이샤 반도체 광검출 소자
KR102496483B1 (ko) * 2017-11-23 2023-02-06 삼성전자주식회사 아발란치 광검출기 및 이를 포함하는 이미지 센서

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004260184A (ja) * 2003-02-25 2004-09-16 Samsung Electronics Co Ltd 光素子および光信号入出力装置
US20130082241A1 (en) * 2011-09-29 2013-04-04 Francis J. Kub Graphene on Semiconductor Detector
JP2013177273A (ja) * 2012-02-28 2013-09-09 Kyushu Univ グラフェン薄膜の製造方法及びグラフェン薄膜
US20150243826A1 (en) * 2012-08-28 2015-08-27 Northeastern University Tunable heterojunction for multifunctional electronics and photovoltaics
JP2016025356A (ja) * 2014-07-18 2016-02-08 三星電子株式会社Samsung Electronics Co.,Ltd. グラフェン素子、その製造及び動作方法、並びにグラフェン素子を含む電子装置
WO2017145299A1 (ja) * 2016-02-24 2017-08-31 三菱電機株式会社 電磁波検出器
WO2018173347A1 (ja) * 2017-03-22 2018-09-27 三菱電機株式会社 電磁波検出器、電磁波検出器アレイおよび電磁波検出方法
WO2019081492A1 (en) * 2017-10-26 2019-05-02 Emberion Oy PHOTOSENSITIVE FIELD EFFECT TRANSISTOR
JP6528918B1 (ja) * 2018-03-06 2019-06-12 三菱電機株式会社 電磁波検出器及びそれを備えた電磁波検出器アレイ
WO2019171622A1 (ja) * 2018-03-06 2019-09-12 三菱電機株式会社 電磁波検出器及びそれを備えた電磁波検出器アレイ

Also Published As

Publication number Publication date
JP7374222B2 (ja) 2023-11-06
US12199113B2 (en) 2025-01-14
WO2021124609A1 (ja) 2021-06-24
US20220392934A1 (en) 2022-12-08
CN114846628A (zh) 2022-08-02
CN114846628B (zh) 2025-02-18

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