JPWO2021085397A5 - - Google Patents
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- Publication number
- JPWO2021085397A5 JPWO2021085397A5 JP2021553612A JP2021553612A JPWO2021085397A5 JP WO2021085397 A5 JPWO2021085397 A5 JP WO2021085397A5 JP 2021553612 A JP2021553612 A JP 2021553612A JP 2021553612 A JP2021553612 A JP 2021553612A JP WO2021085397 A5 JPWO2021085397 A5 JP WO2021085397A5
- Authority
- JP
- Japan
- Prior art keywords
- protective film
- wet etching
- forming
- etching solution
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001681 protective effect Effects 0.000 claims description 22
- 239000004065 semiconductor Substances 0.000 claims description 19
- 238000001039 wet etching Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000004094 surface-active agent Substances 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 2
- 238000004132 cross linking Methods 0.000 claims description 2
- 239000003431 cross linking reagent Substances 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000000178 monomer Substances 0.000 claims 3
- 239000011347 resin Substances 0.000 claims 3
- 229920005989 resin Polymers 0.000 claims 3
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 125000000962 organic group Chemical group 0.000 claims 2
- 230000002378 acidificating effect Effects 0.000 claims 1
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- AHKHCABWJGFHOG-UHFFFAOYSA-N 4-hydroxybenzenesulfonate pyridin-1-ium Chemical compound c1cc[nH+]cc1.Oc1ccc(cc1)S([O-])(=O)=O AHKHCABWJGFHOG-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019195504 | 2019-10-28 | ||
| JP2019195504 | 2019-10-28 | ||
| PCT/JP2020/040162 WO2021085397A1 (ja) | 2019-10-28 | 2020-10-27 | 多価カルボン酸含有薬液耐性保護膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021085397A1 JPWO2021085397A1 (https=) | 2021-05-06 |
| JPWO2021085397A5 true JPWO2021085397A5 (https=) | 2023-09-15 |
| JP7632295B2 JP7632295B2 (ja) | 2025-02-19 |
Family
ID=75715981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021553612A Active JP7632295B2 (ja) | 2019-10-28 | 2020-10-27 | 多価カルボン酸含有薬液耐性保護膜 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20220404706A1 (https=) |
| JP (1) | JP7632295B2 (https=) |
| KR (1) | KR102808976B1 (https=) |
| CN (1) | CN114402009B (https=) |
| TW (1) | TWI862717B (https=) |
| WO (1) | WO2021085397A1 (https=) |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101107569B (zh) * | 2005-01-21 | 2011-06-15 | 日产化学工业株式会社 | 含有具有被保护的羧基的化合物的形成光刻用下层膜的组合物 |
| JP5167252B2 (ja) * | 2007-04-24 | 2013-03-21 | 三井化学株式会社 | 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 |
| TWI421632B (zh) * | 2007-04-24 | 2014-01-01 | Mitsui Chemicals Inc | 感光性樹脂組成物、乾膜、以及其加工品 |
| JP5229025B2 (ja) * | 2009-03-13 | 2013-07-03 | Ｊｓｒ株式会社 | パターン形成方法及び平坦化膜形成用組成物 |
| US10528156B2 (en) * | 2009-05-22 | 2020-01-07 | Hawkvision Emmersion Computing, LLC | Input cueing emmersion system and method |
| US20140134355A1 (en) * | 2011-06-08 | 2014-05-15 | Goodrich Corporation | Treated graphene nanoplatelets for inflatable structure barrier layers |
| IN2015DN00369A (https=) * | 2012-07-17 | 2015-06-12 | Mitsui Chemicals Inc | |
| JP2015010115A (ja) * | 2013-06-27 | 2015-01-19 | 三洋化成工業株式会社 | エポキシ系水性分散体 |
| SG11201510744VA (en) * | 2013-07-05 | 2016-01-28 | Wako Pure Chem Ind Ltd | Etching agent, etching method and etching agent preparation liquid |
| SG11201802613SA (en) * | 2015-09-30 | 2018-04-27 | Toray Industries | Negative type coloring photosensitive resin composition, cured film, element, and display device |
| CN108713164B (zh) * | 2016-03-09 | 2022-03-18 | 日产化学工业株式会社 | 抗蚀剂下层膜形成用组合物及使用了该组合物的抗蚀剂图案的形成方法 |
| WO2018052130A1 (ja) | 2016-09-16 | 2018-03-22 | 日産化学工業株式会社 | 保護膜形成組成物 |
| CN110582728B (zh) * | 2017-05-02 | 2023-11-17 | 日产化学株式会社 | 耐受过氧化氢水溶液的保护膜形成用组合物 |
-
2020
- 2020-10-26 TW TW109137032A patent/TWI862717B/zh active
- 2020-10-27 KR KR1020227008196A patent/KR102808976B1/ko active Active
- 2020-10-27 WO PCT/JP2020/040162 patent/WO2021085397A1/ja not_active Ceased
- 2020-10-27 US US17/765,722 patent/US20220404706A1/en active Pending
- 2020-10-27 JP JP2021553612A patent/JP7632295B2/ja active Active
- 2020-10-27 CN CN202080064632.8A patent/CN114402009B/zh active Active
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