JPWO2021010058A1 - - Google Patents

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Publication number
JPWO2021010058A1
JPWO2021010058A1 JP2021532726A JP2021532726A JPWO2021010058A1 JP WO2021010058 A1 JPWO2021010058 A1 JP WO2021010058A1 JP 2021532726 A JP2021532726 A JP 2021532726A JP 2021532726 A JP2021532726 A JP 2021532726A JP WO2021010058 A1 JPWO2021010058 A1 JP WO2021010058A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021532726A
Other languages
Japanese (ja)
Other versions
JP7213981B2 (ja
JPWO2021010058A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed filed Critical
Publication of JPWO2021010058A1 publication Critical patent/JPWO2021010058A1/ja
Publication of JPWO2021010058A5 publication Critical patent/JPWO2021010058A5/ja
Application granted granted Critical
Publication of JP7213981B2 publication Critical patent/JP7213981B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/06—Interconnection of layers permitting easy separation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
  • Graft Or Block Polymers (AREA)
JP2021532726A 2019-07-12 2020-06-09 転写フィルム、積層体の製造方法およびタッチパネルの製造方法 Active JP7213981B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019130239 2019-07-12
JP2019130239 2019-07-12
PCT/JP2020/022684 WO2021010058A1 (ja) 2019-07-12 2020-06-09 転写フィルム、積層体の製造方法およびタッチパネルの製造方法

Publications (3)

Publication Number Publication Date
JPWO2021010058A1 true JPWO2021010058A1 (https=) 2021-01-21
JPWO2021010058A5 JPWO2021010058A5 (https=) 2022-03-17
JP7213981B2 JP7213981B2 (ja) 2023-01-27

Family

ID=74210549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021532726A Active JP7213981B2 (ja) 2019-07-12 2020-06-09 転写フィルム、積層体の製造方法およびタッチパネルの製造方法

Country Status (3)

Country Link
JP (1) JP7213981B2 (https=)
CN (2) CN119620546A (https=)
WO (1) WO2021010058A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116917123A (zh) * 2021-02-26 2023-10-20 富士胶片株式会社 转印膜以及导体图案的制造方法
WO2022209307A1 (ja) * 2021-03-30 2022-10-06 富士フイルム株式会社 積層体及び積層体の製造方法
WO2025099999A1 (ja) * 2023-11-07 2025-05-15 住友電気工業株式会社 ドライフィルムレジスト及びプリント配線板の製造方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10128930A (ja) * 1996-11-01 1998-05-19 Teijin Ltd 感光性積層体
JPH11260254A (ja) * 1998-03-13 1999-09-24 Dainippon Printing Co Ltd 転写シート
JP2002144504A (ja) * 2000-09-04 2002-05-21 Toray Ind Inc ポリオレフィンフィルムおよび感光製版用フォトレジストカバーフィルム
JP2002229199A (ja) * 2001-02-01 2002-08-14 Hitachi Chem Co Ltd スペーサ用２層フィルム
JP2002323759A (ja) * 2001-04-25 2002-11-08 Asahi Kasei Corp 感光性樹脂積層体
JP2002372780A (ja) * 2001-12-21 2002-12-26 Asahi Kasei Corp 感光性樹脂積層体
WO2013084872A1 (ja) * 2011-12-05 2013-06-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物、感光性エレメント、タッチパネルの製造方法及び樹脂硬化膜
JP2016083937A (ja) * 2014-10-24 2016-05-19 富士フイルム株式会社 転写フィルム及びその製造方法、積層体の製造方法、静電容量型入力装置の製造方法、並びに、画像表示装置の製造方法
WO2018105313A1 (ja) * 2016-12-08 2018-06-14 富士フイルム株式会社 転写フィルム、電極保護膜、積層体、静電容量型入力装置、及び、タッチパネルの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7083891B2 (en) * 2001-12-17 2006-08-01 Fuji Photo Film Co., Ltd. Multi-color image forming material and multi-color image forming method
JP4734380B2 (ja) * 2008-07-14 2011-07-27 富士フイルム株式会社 カラーフィルターの形成方法及びカラーフィルター
JP6584357B2 (ja) * 2016-03-30 2019-10-02 富士フイルム株式会社 転写フィルム、静電容量型入力装置の電極保護膜、積層体および静電容量型入力装置
WO2017209193A1 (ja) * 2016-05-31 2017-12-07 富士フイルム株式会社 転写フィルム、加飾パターン及びタッチパネル

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10128930A (ja) * 1996-11-01 1998-05-19 Teijin Ltd 感光性積層体
JPH11260254A (ja) * 1998-03-13 1999-09-24 Dainippon Printing Co Ltd 転写シート
JP2002144504A (ja) * 2000-09-04 2002-05-21 Toray Ind Inc ポリオレフィンフィルムおよび感光製版用フォトレジストカバーフィルム
JP2002229199A (ja) * 2001-02-01 2002-08-14 Hitachi Chem Co Ltd スペーサ用２層フィルム
JP2002323759A (ja) * 2001-04-25 2002-11-08 Asahi Kasei Corp 感光性樹脂積層体
JP2002372780A (ja) * 2001-12-21 2002-12-26 Asahi Kasei Corp 感光性樹脂積層体
WO2013084872A1 (ja) * 2011-12-05 2013-06-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物、感光性エレメント、タッチパネルの製造方法及び樹脂硬化膜
JP2016083937A (ja) * 2014-10-24 2016-05-19 富士フイルム株式会社 転写フィルム及びその製造方法、積層体の製造方法、静電容量型入力装置の製造方法、並びに、画像表示装置の製造方法
WO2018105313A1 (ja) * 2016-12-08 2018-06-14 富士フイルム株式会社 転写フィルム、電極保護膜、積層体、静電容量型入力装置、及び、タッチパネルの製造方法

Also Published As

Publication number Publication date
CN119620546A (zh) 2025-03-14
JP7213981B2 (ja) 2023-01-27
CN114026498A (zh) 2022-02-08
WO2021010058A1 (ja) 2021-01-21
CN114026498B (zh) 2024-12-13

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