JPWO2020262674A1 - - Google Patents

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Publication number
JPWO2020262674A1
JPWO2020262674A1 JP2021528283A JP2021528283A JPWO2020262674A1 JP WO2020262674 A1 JPWO2020262674 A1 JP WO2020262674A1 JP 2021528283 A JP2021528283 A JP 2021528283A JP 2021528283 A JP2021528283 A JP 2021528283A JP WO2020262674 A1 JPWO2020262674 A1 JP WO2020262674A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021528283A
Other versions
JP7261298B2 (ja
JPWO2020262674A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020262674A1 publication Critical patent/JPWO2020262674A1/ja
Publication of JPWO2020262674A5 publication Critical patent/JPWO2020262674A5/ja
Application granted granted Critical
Publication of JP7261298B2 publication Critical patent/JP7261298B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2021528283A 2019-06-28 2020-06-26 ミラー装着部材、これを使用した位置計測用ミラー、および露光装置 Active JP7261298B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019122425 2019-06-28
JP2019122425 2019-06-28
PCT/JP2020/025391 WO2020262674A1 (ja) 2019-06-28 2020-06-26 ミラー装着部材、これを使用した位置計測用ミラー、および露光装置

Publications (3)

Publication Number Publication Date
JPWO2020262674A1 true JPWO2020262674A1 (ja) 2020-12-30
JPWO2020262674A5 JPWO2020262674A5 (ja) 2022-03-11
JP7261298B2 JP7261298B2 (ja) 2023-04-19

Family

ID=74061283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021528283A Active JP7261298B2 (ja) 2019-06-28 2020-06-26 ミラー装着部材、これを使用した位置計測用ミラー、および露光装置

Country Status (6)

Country Link
US (1) US20220269040A1 (ja)
EP (1) EP3992716A4 (ja)
JP (1) JP7261298B2 (ja)
KR (1) KR20220011153A (ja)
CN (1) CN113994267B (ja)
WO (1) WO2020262674A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022145470A1 (ja) * 2020-12-28 2022-07-07 京セラ株式会社 構造体、これを使用した位置計測用ミラーおよび露光装置

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0373906U (ja) * 1989-11-22 1991-07-25
JP2002182103A (ja) * 2000-12-14 2002-06-26 Alps Electric Co Ltd 樹脂成形光学部品及びそれを備えた光ピックアップ装置
JP2002277782A (ja) * 2001-03-16 2002-09-25 Sharp Corp 光学部品の取付構造
JP2004163491A (ja) * 2002-11-11 2004-06-10 Nippon Sheet Glass Co Ltd 光学素子及びその製造方法
JP2004177331A (ja) * 2002-11-28 2004-06-24 Taiheiyo Cement Corp 位置測定用ミラーおよびミラー用部材
JP2004309733A (ja) * 2003-04-04 2004-11-04 Seiko Epson Corp 凹部付き基材の製造方法、凹部付き基材、マイクロレンズ用凹部付き基材、マイクロレンズ基板、透過型スクリーンおよびリア型プロジェクタ
JP2008124219A (ja) * 2006-11-10 2008-05-29 Canon Inc 液浸露光装置
JP2008191592A (ja) * 2007-02-07 2008-08-21 Hitachi Ltd 光学部材
CN105589170A (zh) * 2016-01-28 2016-05-18 中国华能集团清洁能源技术研究院有限公司 一种桁架式线性菲涅尔太阳能反射镜框架
JP2018004956A (ja) * 2016-07-01 2018-01-11 恵和株式会社 光学ユニット及び光学ユニットの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3795869B2 (ja) * 2003-02-18 2006-07-12 株式会社東芝 光モジュール
JP2012203371A (ja) * 2011-03-28 2012-10-22 Nippon Shokubai Co Ltd 金属膜を用いた光導波路のミラー部の製造方法、及び光導波路
JP6301067B2 (ja) * 2013-04-26 2018-03-28 富士通コンポーネント株式会社 光学部材、光モジュール
CN105652393B (zh) * 2016-03-18 2018-01-05 武汉华工正源光子技术有限公司 基于光学基座的单纤双向器件的封装结构及封装方法
KR102354871B1 (ko) * 2016-12-21 2022-01-21 니치아 카가쿠 고교 가부시키가이샤 발광 장치의 제조 방법

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0373906U (ja) * 1989-11-22 1991-07-25
JP2002182103A (ja) * 2000-12-14 2002-06-26 Alps Electric Co Ltd 樹脂成形光学部品及びそれを備えた光ピックアップ装置
JP2002277782A (ja) * 2001-03-16 2002-09-25 Sharp Corp 光学部品の取付構造
JP2004163491A (ja) * 2002-11-11 2004-06-10 Nippon Sheet Glass Co Ltd 光学素子及びその製造方法
JP2004177331A (ja) * 2002-11-28 2004-06-24 Taiheiyo Cement Corp 位置測定用ミラーおよびミラー用部材
JP2004309733A (ja) * 2003-04-04 2004-11-04 Seiko Epson Corp 凹部付き基材の製造方法、凹部付き基材、マイクロレンズ用凹部付き基材、マイクロレンズ基板、透過型スクリーンおよびリア型プロジェクタ
JP2008124219A (ja) * 2006-11-10 2008-05-29 Canon Inc 液浸露光装置
JP2008191592A (ja) * 2007-02-07 2008-08-21 Hitachi Ltd 光学部材
CN105589170A (zh) * 2016-01-28 2016-05-18 中国华能集团清洁能源技术研究院有限公司 一种桁架式线性菲涅尔太阳能反射镜框架
JP2018004956A (ja) * 2016-07-01 2018-01-11 恵和株式会社 光学ユニット及び光学ユニットの製造方法

Also Published As

Publication number Publication date
JP7261298B2 (ja) 2023-04-19
KR20220011153A (ko) 2022-01-27
US20220269040A1 (en) 2022-08-25
WO2020262674A1 (ja) 2020-12-30
CN113994267A (zh) 2022-01-28
EP3992716A1 (en) 2022-05-04
CN113994267B (zh) 2024-01-19
EP3992716A4 (en) 2023-08-09

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