JPWO2020179904A5 - - Google Patents

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JPWO2020179904A5
JPWO2020179904A5 JP2021503663A JP2021503663A JPWO2020179904A5 JP WO2020179904 A5 JPWO2020179904 A5 JP WO2020179904A5 JP 2021503663 A JP2021503663 A JP 2021503663A JP 2021503663 A JP2021503663 A JP 2021503663A JP WO2020179904 A5 JPWO2020179904 A5 JP WO2020179904A5
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Japan
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droplet
modeling
moving
temperature gradient
processing unit
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JP2021503663A
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Japanese (ja)
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JPWO2020179904A1 (enExample
JP7313078B2 (ja
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Priority claimed from PCT/JP2020/009634 external-priority patent/WO2020179904A1/ja
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JP2021503663A 2019-03-07 2020-03-06 造形装置、液滴移動装置、目的物生産方法、造形方法、液滴移動方法、造形プログラムおよび液滴移動プログラム Active JP7313078B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2019042010 2019-03-07
JP2019042010 2019-03-07
JP2019158495 2019-08-30
JP2019158495 2019-08-30
PCT/JP2020/009634 WO2020179904A1 (ja) 2019-03-07 2020-03-06 造形装置、液滴移動装置、目的物生産方法、造形方法、液滴移動方法、造形プログラムおよび液滴移動プログラム

Publications (3)

Publication Number Publication Date
JPWO2020179904A1 JPWO2020179904A1 (enExample) 2020-09-10
JPWO2020179904A5 true JPWO2020179904A5 (enExample) 2022-02-28
JP7313078B2 JP7313078B2 (ja) 2023-07-24

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JP2021503663A Active JP7313078B2 (ja) 2019-03-07 2020-03-06 造形装置、液滴移動装置、目的物生産方法、造形方法、液滴移動方法、造形プログラムおよび液滴移動プログラム

Country Status (3)

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US (1) US12036725B2 (enExample)
JP (1) JP7313078B2 (enExample)
WO (1) WO2020179904A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11518086B2 (en) * 2020-12-08 2022-12-06 Palo Alto Research Center Incorporated Additive manufacturing systems and methods for the same

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6079821A (en) * 1997-10-17 2000-06-27 Eastman Kodak Company Continuous ink jet printer with asymmetric heating drop deflection
JP2005144217A (ja) * 2003-11-11 2005-06-09 Seiko Epson Corp 薄膜形成方法、デバイスの製造方法、電気光学装置の製造方法、電子機器
US7582858B2 (en) * 2004-01-23 2009-09-01 Sri International Apparatus and method of moving micro-droplets using laser-induced thermal gradients
JP2005254263A (ja) * 2004-03-10 2005-09-22 Matsushita Electric Ind Co Ltd 光加熱装置とその制御方法
US7670560B2 (en) * 2005-04-29 2010-03-02 Georgia Tech Research Corporation Droplet transport system and methods
US20110232524A1 (en) * 2009-05-25 2011-09-29 Korea Institute Of Ceramic Engineering And Technology Ceramic ink for manufacturing ceramic thick film by inkjet printing
JP2012032258A (ja) * 2010-07-30 2012-02-16 Osaka City Univ 液滴移動装置および液滴移動方法
JP5956460B2 (ja) * 2010-12-21 2016-07-27 ストラタシス リミテッド 付加製造システムにおいて材料を再利用するための方法およびシステム
US8944084B2 (en) * 2011-06-03 2015-02-03 Wayne State University Optofluidic tweezers
JP6321446B2 (ja) * 2014-05-09 2018-05-09 学校法人大同学園 強化繊維基材の切断方法および繊維強化樹脂の製造方法
DE102014222685A1 (de) 2014-11-06 2016-05-12 Wacker Chemie Ag Verfahren zur Herstellung von Siliconelastomerteilen
JP6462559B2 (ja) * 2015-05-15 2019-01-30 東京エレクトロン株式会社 基板処理装置
JP6594680B2 (ja) * 2015-07-07 2019-10-23 日立オートモティブシステムズ株式会社 中空複合磁性部材の製造方法及び製造装置並びに燃料噴射弁
US10372110B2 (en) * 2016-06-17 2019-08-06 Hamilton Sundstrand Corporation Controlled thin wall thickness of heat exchangers through modeling of additive manufacturing process
WO2019156170A1 (ja) * 2018-02-07 2019-08-15 国立大学法人横浜国立大学 造形装置、液滴移動装置、目的物生産方法、液滴移動方法及びプログラム

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