JPWO2020064522A5 - - Google Patents

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Publication number
JPWO2020064522A5
JPWO2020064522A5 JP2021540913A JP2021540913A JPWO2020064522A5 JP WO2020064522 A5 JPWO2020064522 A5 JP WO2020064522A5 JP 2021540913 A JP2021540913 A JP 2021540913A JP 2021540913 A JP2021540913 A JP 2021540913A JP WO2020064522 A5 JPWO2020064522 A5 JP WO2020064522A5
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JP
Japan
Prior art keywords
alkyl
alkoxy
phenyl
hydrogen
substituted
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Application number
JP2021540913A
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English (en)
Japanese (ja)
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JP2022514433A5 (https=
JP2022514433A (ja
JP7541011B2 (ja
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Priority claimed from PCT/EP2019/075276 external-priority patent/WO2020064522A1/en
Publication of JP2022514433A publication Critical patent/JP2022514433A/ja
Publication of JP2022514433A5 publication Critical patent/JP2022514433A5/ja
Publication of JPWO2020064522A5 publication Critical patent/JPWO2020064522A5/ja
Application granted granted Critical
Publication of JP7541011B2 publication Critical patent/JP7541011B2/ja
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JP2021540913A 2018-09-24 2019-09-20 3d印刷において使用するための光硬化性組成物 Active JP7541011B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP18196328 2018-09-24
EP18196328.1 2018-09-24
PCT/EP2019/075276 WO2020064522A1 (en) 2018-09-24 2019-09-20 Photocurable composition for use in 3d printing

Publications (4)

Publication Number Publication Date
JP2022514433A JP2022514433A (ja) 2022-02-10
JP2022514433A5 JP2022514433A5 (https=) 2022-09-07
JPWO2020064522A5 true JPWO2020064522A5 (https=) 2022-09-07
JP7541011B2 JP7541011B2 (ja) 2024-08-27

Family

ID=63683091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021540913A Active JP7541011B2 (ja) 2018-09-24 2019-09-20 3d印刷において使用するための光硬化性組成物

Country Status (6)

Country Link
US (1) US12325806B2 (https=)
EP (1) EP3856807A1 (https=)
JP (1) JP7541011B2 (https=)
KR (1) KR102887471B1 (https=)
CN (1) CN112638968A (https=)
WO (1) WO2020064522A1 (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3738772B1 (en) * 2019-05-13 2023-02-15 Henkel AG & Co. KGaA Dual cure polyurethane formulations for 3d printing applications
EP3738771B1 (en) 2019-05-13 2023-08-16 Henkel AG & Co. KGaA Dual cure epoxy formulations for 3d printing applications
FR3111637B1 (fr) * 2020-06-18 2022-09-02 Arkema France Compositions et procédés de formation de matériaux imprimables 3d capables d’une faible perte diélectrique
CN116472175A (zh) * 2020-09-03 2023-07-21 巴斯夫欧洲公司 反应性聚氨酯弹性体
JP2023547400A (ja) * 2020-10-21 2023-11-10 ストラタシス リミテッド 透明材料を含む三次元物体の積層造形
JP2024502839A (ja) * 2021-01-06 2024-01-23 ビーエーエスエフ ソシエタス・ヨーロピア 高い熱たわみ温度を有する光硬化性樹脂
KR20230134531A (ko) * 2021-01-19 2023-09-21 에보니크 오퍼레이션즈 게엠베하 인성 물체의 적층 제조를 위한 방사선 경화성 조성물
EP4049841B1 (en) * 2021-02-26 2026-03-18 Cubicure GmbH Hybrid resin composition
JP7843783B2 (ja) * 2021-06-14 2026-04-10 ストラタシス リミテッド エラストマー材料の付加製造のための配合物
WO2023025625A1 (en) * 2021-08-27 2023-03-02 Evonik Operations Gmbh Radiation curable compositions for additive manufacturing of parts with high impact resistance, high ductility and high heat resistance
KR102897770B1 (ko) * 2021-11-19 2025-12-09 (주) 베리콤 항균성 3d 프린팅 조성물 및 이를 이용한 치과용 항균성 3d 프린팅 제품
WO2023090779A1 (ko) * 2021-11-19 2023-05-25 (주) 베리콤 항균성 3d 프린팅 조성물 및 이를 이용한 치과용 항균성 3d 프린팅 제품
CN114316203A (zh) * 2021-12-21 2022-04-12 郑州轻工业大学 聚氨酯丙烯酸酯光固化树脂材料及其制备方法、聚氨酯丙烯酸酯预聚物的制备方法
WO2024099798A1 (en) * 2022-11-08 2024-05-16 Evonik Operations Gmbh Radiation curable compositions for additive manufacturing of high toughness articles
KR102835706B1 (ko) * 2022-12-09 2025-07-18 주식회사 그래피 3d 프린터용 광경화형 조성물
CN116041628B (zh) * 2023-01-16 2026-01-30 珠海赛纳三维科技有限公司 一种3d打印用组合物、3d打印方法和装置
CN116476286B (zh) * 2023-04-28 2026-01-20 浙江伟星光学股份有限公司 一种红外阻隔烯丙基树脂镜片的制备方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA741203B (en) 1973-03-23 1975-01-29 Smithkline Corp Veterinary feed compositions for inhibiting rumen microbial deamination
US4151175A (en) 1976-12-09 1979-04-24 General Electric Company Method for making diarylhalonium salts
US4399071A (en) 1982-03-12 1983-08-16 General Electric Company Method for making diaryliodonium salts
US4575330A (en) 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4694029A (en) 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
JPH0623324B2 (ja) 1986-11-05 1994-03-30 日本化薬株式会社 印刷インキ用組成物
US4950581A (en) 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US4844144A (en) * 1988-08-08 1989-07-04 Desoto, Inc. Investment casting utilizing patterns produced by stereolithography
JP2893135B2 (ja) * 1990-10-19 1999-05-17 ジェイエスアール株式会社 光ファイバー被覆用液状硬化性樹脂組成物
FR2688783A1 (fr) 1992-03-23 1993-09-24 Rhone Poulenc Chimie Nouveaux borates d'onium ou de complexe organometallique amorceurs cationiques de polymerisation.
US5587405A (en) * 1992-09-14 1996-12-24 Yoshino Kogyosho Co., Ltd. Ink compositions
JP3356557B2 (ja) 1994-08-18 2002-12-16 ジェイエスアール株式会社 光学的立体造形用樹脂組成物
KR100235841B1 (ko) * 1994-09-30 1999-12-15 아란.디말리 가스킷용 조성물 및 이것을 사용한 가스킷의 제조방법
FR2762001B1 (fr) 1997-04-11 1999-07-02 Rhodia Chimie Sa Amorceurs non toxiques, resines a groupements organofonctionnels reticulables comprenant les amorceurs, et leur utilisation pour la preparation de polymeres stables et non toxiques
SG98433A1 (en) 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors
JP4171154B2 (ja) 2000-01-14 2008-10-22 日立化成ポリマー株式会社 光硬化性樹脂組成物
DE60111405T2 (de) 2000-09-14 2006-05-11 Ciba Speciality Chemicals Holding Inc. Acylphosphinoxid-photoinitiatoren in methacrylatgiessharzen
US6534128B1 (en) 2000-11-09 2003-03-18 3M Innovative Properties Company Inks and other compositions incorporating low viscosity, radiation curable, polyester urethane oligomer
US6989225B2 (en) 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
JP2004115771A (ja) * 2002-09-27 2004-04-15 Hitachi Kasei Polymer Co Ltd 活性エネルギー線硬化性樹脂組成物
US7211368B2 (en) 2003-01-07 2007-05-01 3 Birds, Inc. Stereolithography resins and methods
JP2004307783A (ja) * 2003-04-08 2004-11-04 Hitachi Kasei Polymer Co Ltd 活性エネルギー線硬化性樹脂組成物
WO2006008251A2 (en) 2004-07-21 2006-01-26 Ciba Specialty Chemicals Holding Inc. Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
EP1786860B1 (en) 2004-09-03 2008-03-26 Ciba Specialty Chemicals Holding Inc. In-can stabilizers
WO2008012292A1 (de) 2006-07-24 2008-01-31 Basf Se Flüssigkristallines gemisch
JP5578060B2 (ja) * 2010-01-15 2014-08-27 東洋インキScホールディングス株式会社 活性エネルギー線硬化型接着剤
EP2436510A1 (en) * 2010-10-04 2012-04-04 3D Systems, Inc. System and resin for rapid prototyping
JP5890990B2 (ja) 2010-11-01 2016-03-22 株式会社キーエンス インクジェット光造形法における、光造形品形成用モデル材、光造形品の光造形時の形状支持用サポート材および光造形品の製造方法
ES2959200T3 (es) 2013-06-04 2024-02-21 Basf Se Elastómeros termoplásticos de poliuretano blando y proceso para su preparación
CN106459322A (zh) 2014-06-18 2017-02-22 保力马科技(日本)株式会社 活性能量线硬化型树脂组合物以及其硬化物和其成形体
WO2016153711A1 (en) * 2015-03-23 2016-09-29 Dow Global Technologies Llc Photocurable compositions for three-dimensional printing
JP6836373B2 (ja) * 2016-11-16 2021-03-03 リケンテクノス株式会社 表面に微細凹凸構造を有する塗膜の生産方法
US11738511B2 (en) 2016-12-08 2023-08-29 Igneous IP Holdings, LLC Additive manufacturing using foaming radiation-curable resin

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