JPWO2019199585A5 - - Google Patents
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- JPWO2019199585A5 JPWO2019199585A5 JP2020555097A JP2020555097A JPWO2019199585A5 JP WO2019199585 A5 JPWO2019199585 A5 JP WO2019199585A5 JP 2020555097 A JP2020555097 A JP 2020555097A JP 2020555097 A JP2020555097 A JP 2020555097A JP WO2019199585 A5 JPWO2019199585 A5 JP WO2019199585A5
- Authority
- JP
- Japan
- Prior art keywords
- overlay
- weighing system
- alignment
- images
- imaging system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005303 weighing Methods 0.000 claims 80
- 238000003384 imaging method Methods 0.000 claims 40
- 238000005259 measurement Methods 0.000 claims 5
- 238000005286 illumination Methods 0.000 claims 2
- 230000003287 optical Effects 0.000 claims 2
- 210000001747 Pupil Anatomy 0.000 claims 1
- 230000001747 exhibiting Effects 0.000 claims 1
- 230000000737 periodic Effects 0.000 claims 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/948,941 US10677588B2 (en) | 2018-04-09 | 2018-04-09 | Localized telecentricity and focus optimization for overlay metrology |
US15/948,941 | 2018-04-09 | ||
PCT/US2019/025917 WO2019199585A1 (en) | 2018-04-09 | 2019-04-05 | Localized telecentricity and focus optimization for overlay metrology |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2021521418A JP2021521418A (ja) | 2021-08-26 |
JPWO2019199585A5 true JPWO2019199585A5 (zh) | 2022-04-08 |
JP7085642B2 JP7085642B2 (ja) | 2022-06-16 |
Family
ID=68096386
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020555097A Active JP7085642B2 (ja) | 2018-04-09 | 2019-04-05 | オーバレイ計量向けの局所的テレセントリシティ及び合焦最適化 |
Country Status (9)
Country | Link |
---|---|
US (1) | US10677588B2 (zh) |
EP (1) | EP3762900A4 (zh) |
JP (1) | JP7085642B2 (zh) |
KR (1) | KR102448698B1 (zh) |
CN (1) | CN111971712B (zh) |
IL (1) | IL277841B1 (zh) |
SG (1) | SG11202005972UA (zh) |
TW (1) | TWI781312B (zh) |
WO (1) | WO2019199585A1 (zh) |
Families Citing this family (22)
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US10444161B2 (en) * | 2017-04-05 | 2019-10-15 | Kla-Tencor Corporation | Systems and methods for metrology with layer-specific illumination spectra |
US11703464B2 (en) | 2018-07-28 | 2023-07-18 | Bruker Technologies Ltd. | Small-angle x-ray scatterometry |
EP3811154A4 (en) * | 2018-08-28 | 2022-04-06 | Kla-Tencor Corporation | OVERLAY MEASUREMENT WITH OFF-AXIAL ILLUMINATION USING DUAL DIFFRACTION ORDER IMAGING |
CN113124751B (zh) * | 2019-12-31 | 2022-07-29 | 上海微电子装备(集团)股份有限公司 | 一种散射测量装置及散射测量方法 |
US11481922B2 (en) * | 2020-04-07 | 2022-10-25 | Kla Corporation | Online navigational drift correction for metrology measurements |
US11604149B2 (en) * | 2020-04-23 | 2023-03-14 | Kla Corporation | Metrology methods and optical schemes for measurement of misregistration by using hatched target designs |
US11302030B2 (en) * | 2020-05-14 | 2022-04-12 | Kla Corporation | System, method, and target for wafer alignment |
US11346657B2 (en) * | 2020-05-22 | 2022-05-31 | Kla Corporation | Measurement modes for overlay |
CN113865503A (zh) * | 2020-06-30 | 2021-12-31 | 得力富企业股份有限公司 | 形心检测装置 |
KR102461662B1 (ko) * | 2020-07-02 | 2022-11-02 | (주)오로스 테크놀로지 | 오버레이 측정장치 |
US11244474B1 (en) | 2020-10-01 | 2022-02-08 | Kla Corporation | Sample positioning system and method |
US20220291143A1 (en) * | 2021-03-11 | 2022-09-15 | Kla Corporation | Optical metrology utilizing short-wave infrared wavelengths |
US11592755B2 (en) * | 2021-03-31 | 2023-02-28 | Kla Corporation | Enhancing performance of overlay metrology |
US20220341725A1 (en) * | 2021-04-26 | 2022-10-27 | Quality Vision International Inc. | Non-invasive alignment method and system for imager-illuminator optical measurement machines |
US20220357674A1 (en) * | 2021-05-04 | 2022-11-10 | Kla Corporation | Oblique illumination for overlay metrology |
US11781999B2 (en) | 2021-09-05 | 2023-10-10 | Bruker Technologies Ltd. | Spot-size control in reflection-based and scatterometry-based X-ray metrology systems |
US20230259040A1 (en) * | 2022-02-14 | 2023-08-17 | Kla Corporation | Imaging overlay with mutually coherent oblique illumination |
KR102524462B1 (ko) * | 2022-03-28 | 2023-04-21 | (주)오로스 테크놀로지 | 오버레이 측정장치 |
US20230324809A1 (en) * | 2022-04-07 | 2023-10-12 | Kla Corporation | Extra tall target metrology |
KR102526522B1 (ko) | 2022-11-02 | 2023-04-27 | (주)오로스테크놀로지 | 포커스를 제어하는 오버레이 계측 장치 및 방법과 이를 위한 프로그램 |
KR102550408B1 (ko) * | 2023-02-14 | 2023-07-03 | (주)오로스 테크놀로지 | 오버레이 측정장치 및 방법 |
KR102617147B1 (ko) * | 2023-07-14 | 2023-12-27 | (주)오로스 테크놀로지 | 오버레이 계측 장치 및 오버레이 계측 장치의 교정방법 |
Family Cites Families (41)
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JPH096017A (ja) * | 1995-06-22 | 1997-01-10 | Nikon Corp | アライメント装置 |
US6710847B1 (en) * | 1998-11-06 | 2004-03-23 | Nikon Corporation | Exposure method and exposure apparatus |
IL130874A (en) * | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring pattern structures |
KR100827741B1 (ko) * | 2000-07-17 | 2008-05-07 | 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 | 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템 |
US20030002043A1 (en) * | 2001-04-10 | 2003-01-02 | Kla-Tencor Corporation | Periodic patterns and technique to control misalignment |
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US20040032581A1 (en) * | 2002-01-15 | 2004-02-19 | Mehrdad Nikoonahad | Systems and methods for inspection of specimen surfaces |
US7804994B2 (en) | 2002-02-15 | 2010-09-28 | Kla-Tencor Technologies Corporation | Overlay metrology and control method |
CN101887032B (zh) * | 2005-07-08 | 2012-05-16 | 伊雷克托科学工业股份有限公司 | 远心轴上暗场照明所实施的光学系统的优化使用及性能 |
JP5465880B2 (ja) * | 2005-11-18 | 2014-04-09 | ケーエルエー−テンカー コーポレイション | 検査データと組み合わせて設計データを使用するための方法及びシステム |
US7846624B2 (en) | 2006-02-17 | 2010-12-07 | Litel Instruments | Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves |
US7714996B2 (en) * | 2007-01-23 | 2010-05-11 | 3i Systems Corporation | Automatic inspection system for flat panel substrate |
US8175831B2 (en) * | 2007-04-23 | 2012-05-08 | Kla-Tencor Corp. | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers |
JP5634864B2 (ja) * | 2007-05-30 | 2014-12-03 | ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation | リソグラフィック・プロセスに於ける、プロセス制御方法およびプロセス制御装置 |
NL2004400A (en) * | 2009-04-09 | 2010-10-12 | Asml Holding Nv | Tunable wavelength illumination system. |
KR20120058572A (ko) * | 2009-08-24 | 2012-06-07 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치, 리소그래피 장치, 리소그래피 처리 셀 및 메트롤로지 타겟들을 포함하는 기판 |
AU2009230797B2 (en) * | 2009-10-28 | 2011-06-09 | Canon Kabushiki Kaisha | Focus finding and alignment using a split linear mask |
EP2539770B1 (en) * | 2010-02-23 | 2016-12-07 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN103201682B (zh) * | 2010-11-12 | 2015-06-17 | Asml荷兰有限公司 | 量测方法和设备、光刻系统和器件制造方法 |
US8248591B2 (en) * | 2010-11-18 | 2012-08-21 | Quality Vision International, Inc. | Through-the-lens illuminator for optical comparator |
US9400246B2 (en) * | 2011-10-11 | 2016-07-26 | Kla-Tencor Corporation | Optical metrology tool equipped with modulated illumination sources |
US9228943B2 (en) * | 2011-10-27 | 2016-01-05 | Kla-Tencor Corporation | Dynamically adjustable semiconductor metrology system |
KR102473825B1 (ko) * | 2012-05-22 | 2022-12-02 | 케이엘에이 코포레이션 | 직교 하지층 더미필을 갖는 오버레이 타겟 |
GB2504970A (en) * | 2012-08-15 | 2014-02-19 | Swan Thomas & Co Ltd | Optical device and methods to reduce cross-talk |
US10242290B2 (en) * | 2012-11-09 | 2019-03-26 | Kla-Tencor Corporation | Method, system, and user interface for metrology target characterization |
US9341769B2 (en) * | 2012-12-17 | 2016-05-17 | Kla-Tencor Corporation | Spectral control system |
US9575008B2 (en) * | 2014-02-12 | 2017-02-21 | ASA Corporation | Apparatus and method for photographing glass in multiple layers |
US10152654B2 (en) * | 2014-02-20 | 2018-12-11 | Kla-Tencor Corporation | Signal response metrology for image based overlay measurements |
NL2014941A (en) * | 2014-07-16 | 2016-04-12 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. |
WO2016078862A1 (en) * | 2014-11-21 | 2016-05-26 | Asml Netherlands B.V. | Metrology method and apparatus |
IL290735B2 (en) * | 2014-11-26 | 2023-03-01 | Asml Netherlands Bv | Metrological method, computer product and system |
KR102665579B1 (ko) * | 2015-05-19 | 2024-05-10 | 케이엘에이 코포레이션 | 오버레이 측정을 위한 지형 위상 제어 |
KR102128488B1 (ko) * | 2015-12-09 | 2020-07-01 | 에이에스엠엘 홀딩 엔.브이. | 플렉시블 일루미네이터 |
WO2017114652A1 (en) * | 2015-12-28 | 2017-07-06 | Asml Netherlands B.V. | Alternative target design for metrology using modulation techniques |
JP6896702B2 (ja) * | 2016-03-10 | 2021-06-30 | 浜松ホトニクス株式会社 | レーザ光照射装置及びレーザ光照射方法 |
US10422508B2 (en) * | 2016-03-28 | 2019-09-24 | Kla-Tencor Corporation | System and method for spectral tuning of broadband light sources |
US10018919B2 (en) | 2016-05-29 | 2018-07-10 | Kla-Tencor Corporation | System and method for fabricating metrology targets oriented with an angle rotated with respect to device features |
US10371626B2 (en) * | 2016-08-17 | 2019-08-06 | Kla-Tencor Corporation | System and method for generating multi-channel tunable illumination from a broadband source |
US11815347B2 (en) * | 2016-09-28 | 2023-11-14 | Kla-Tencor Corporation | Optical near-field metrology |
US10444161B2 (en) * | 2017-04-05 | 2019-10-15 | Kla-Tencor Corporation | Systems and methods for metrology with layer-specific illumination spectra |
US10817999B2 (en) * | 2017-07-18 | 2020-10-27 | Kla Corporation | Image-based overlay metrology and monitoring using through-focus imaging |
-
2018
- 2018-04-09 US US15/948,941 patent/US10677588B2/en active Active
-
2019
- 2019-04-05 SG SG11202005972UA patent/SG11202005972UA/en unknown
- 2019-04-05 EP EP19785061.3A patent/EP3762900A4/en active Pending
- 2019-04-05 CN CN201980023057.4A patent/CN111971712B/zh active Active
- 2019-04-05 WO PCT/US2019/025917 patent/WO2019199585A1/en unknown
- 2019-04-05 IL IL277841A patent/IL277841B1/en unknown
- 2019-04-05 JP JP2020555097A patent/JP7085642B2/ja active Active
- 2019-04-05 KR KR1020207032174A patent/KR102448698B1/ko active IP Right Grant
- 2019-04-08 TW TW108112069A patent/TWI781312B/zh active
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