JPWO2019199585A5 - - Google Patents
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- JPWO2019199585A5 JPWO2019199585A5 JP2020555097A JP2020555097A JPWO2019199585A5 JP WO2019199585 A5 JPWO2019199585 A5 JP WO2019199585A5 JP 2020555097 A JP2020555097 A JP 2020555097A JP 2020555097 A JP2020555097 A JP 2020555097A JP WO2019199585 A5 JPWO2019199585 A5 JP WO2019199585A5
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- 238000005303 weighing Methods 0.000 claims 80
- 238000003384 imaging method Methods 0.000 claims 40
- 238000005259 measurement Methods 0.000 claims 5
- 238000005286 illumination Methods 0.000 claims 2
- 230000003287 optical Effects 0.000 claims 2
- 210000001747 Pupil Anatomy 0.000 claims 1
- 230000001747 exhibiting Effects 0.000 claims 1
- 230000000737 periodic Effects 0.000 claims 1
Claims (44)
２個以上の合焦位置にて対物レンズ経由で像を捉えるよう構成された１個又は複数個のカメラを有するテレセントリック撮像システムに、可通信結合されたコントローラを備え、そのコントローラが、プログラム命令を実行するよう構成された１個又は複数個のプロセッサを有し、それら命令の実行により、当該１個又は複数個のプロセッサが、
前記撮像システムにより２個以上の合焦位置にて標本上のオーバレイターゲットを捉えた２枚以上のアライメント画像であり、そのオーバレイターゲットの１個又は複数個のフィーチャが入っている２枚以上のアライメント画像を受け取り、
それら２枚以上のアライメント画像に基づき、前記撮像システムにおける前記オーバレイターゲットのアライメント具合を示すアライメントデータを生成し、
前記オーバレイターゲットのアライメント具合が指定アライメント公差内である場合に、前記２枚以上のアライメント画像を計測画像として設定し、
前記オーバレイターゲットのアライメント具合が前記指定アライメント公差外である場合に、前記撮像システムにおけるそのオーバレイターゲットのアライメント具合を調整するようその撮像システムに指令してその撮像システムから１枚又は複数枚の計測画像を更に受け取り、且つ
それら計測画像のうち少なくとも１枚に基づき前記標本の２個以上の層間のオーバレイを判別する、
オーバレイ計量システム。 Overlay weighing system
A telecentric imaging system with one or more cameras configured to capture an image through an objective lens at two or more in-focus positions is equipped with a communicable coupled controller, which provides program instructions. It has one or more processors configured to execute, and the execution of those instructions causes the one or more processors to execute.
Two or more alignment images that capture the overlay target on the specimen at two or more in-focus positions by the imaging system, and the alignment of two or more images containing one or more features of the overlay target. Receive the image,
Based on these two or more alignment images, alignment data indicating the alignment condition of the overlay target in the imaging system is generated.
When the alignment condition of the overlay target is within the specified alignment tolerance, the two or more alignment images are set as measurement images.
When the alignment condition of the overlay target is outside the specified alignment tolerance, the imaging system is instructed to adjust the alignment condition of the overlay target in the imaging system, and one or a plurality of measured images from the imaging system. And determine the overlay between two or more layers of the sample based on at least one of those measured images.
Overlay weighing system.
前記２個以上の合焦位置にて撮像するよう構成された２個以上のカメラを備え、それら２個以上のカメラが前記２枚以上のアライメント画像を同時生成するオーバレイ計量システム。 The overlay weighing system according to claim 1, wherein the imaging system is
An overlay weighing system comprising two or more cameras configured to capture images at the two or more in-focus positions, the two or more cameras simultaneously generating the two or more alignment images.
前記オーバレイターゲットの合焦位置を変化させつつ前記２枚以上のアライメント画像を順次生成するよう構成された単一のカメラを備えるオーバレイ計量システム。 The overlay weighing system according to claim 1, wherein the imaging system is
An overlay weighing system including a single camera configured to sequentially generate two or more aligned images while changing the focus position of the overlay target.
それら計測画像のうち１枚に基づき前記標本の２個以上の層間のオーバレイを判別するオーバレイ計量システム。 In the overlay weighing system according to claim 1, when determining the overlay between two or more layers of the sample based on at least one of the measured images.
An overlay weighing system that discriminates overlays between two or more layers of the sample based on one of the measured images.
それら計測画像のうち少なくとも２枚に基づき前記標本の２個以上の層間のオーバレイを判別するオーバレイ計量システム。 In the overlay weighing system according to claim 1, when determining the overlay between two or more layers of the sample based on at least one of the measured images.
An overlay weighing system that discriminates overlays between two or more layers of the sample based on at least two of the measured images.
前記２枚以上のアライメント画像における前記オーバレイターゲットの合焦品質を示す合焦データを含み、前記指定アライメント公差が指定合焦公差を含むオーバレイ計量システム。 The overlay weighing system according to claim 1, wherein the alignment data is
An overlay weighing system that includes focusing data indicating the focusing quality of the overlay target in the two or more alignment images, and the designated alignment tolerance includes the designated focusing tolerance.
前記２枚以上のアライメント画像の画像コントラストデータを含むオーバレイ計量システム。 The overlay measuring system according to claim 9, wherein the focusing data is
An overlay weighing system that includes image contrast data of the two or more aligned images.
前記オーバレイターゲットの前記１個又は複数個のフィーチャのうち少なくとも幾つかと、背景エリアと、の間の画素値の差異を含むオーバレイ計量システム。 The overlay weighing system according to claim 10, wherein the image contrast data is based on the image contrast data.
An overlay weighing system that includes differences in pixel values between at least some of the one or more features of the overlay target and the background area.
前記オーバレイターゲットの前記１個又は複数個のフィーチャのうち少なくとも幾つかの空間周波数分析を実行し、前記画像コントラストデータを、指定空間周波数の相対強度に基づくものとするオーバレイ計量システム。 The overlay weighing system according to claim 10, which is an overlay weighing system that generates image contrast data for each of the two or more aligned images.
An overlay weighing system that performs spatial frequency analysis of at least some of the one or more features of the overlay target and bases the image contrast data on the relative intensity of a designated spatial frequency.
前記２枚以上のアライメント画像それぞれに関し画像コントラストデータを生成し、且つ
それら２枚以上のアライメント画像の画像コントラストデータを校正画像コントラストデータと比較することで前記標本の合焦データを決定する、
オーバレイ計量システム。 The overlay weighing system according to claim 10, when generating alignment data.
Image contrast data is generated for each of the two or more aligned images, and the in-focus data of the sample is determined by comparing the image contrast data of the two or more aligned images with the calibration image contrast data.
Overlay weighing system.
複数個の合焦位置における供試フィーチャの画像に由来する画像コントラストデータを含むオーバレイ計量システム。 The overlay weighing system according to claim 13, wherein the calibration image contrast data is obtained.
Overlay weighing system containing image contrast data derived from images of test features at multiple in-focus positions.
前記撮像システムにおける前記オーバレイターゲットのテレセントリシティ品質を示すテレセントリシティデータを含み、前記指定アライメント公差が指定テレセントリシティ公差を含むオーバレイ計量システム。 The overlay weighing system according to claim 1, wherein the alignment data is
An overlay weighing system that includes telecentricity data indicating the telecentricity quality of the overlay target in the imaging system, and the designated alignment tolerance includes a designated telecentricity tolerance.
前記２枚以上のアライメント画像における前記１個又は複数個のフィーチャの位置ばらつきに基づき前記テレセントリシティデータを決定するオーバレイ計量システム。 The overlay weighing system according to claim 17, which is an overlay weighing system for determining telecentricity data.
An overlay weighing system that determines the telecentricity data based on the position variation of the one or more features in the two or more aligned images.
それら２枚以上のアライメント画像それぞれにおける前記１個又は複数個のフィーチャの位置を求め、且つ
テレセントリシティ誤差を、前記１個又は複数個のフィーチャの位置変化速度であり合焦位置の関数たるものとして、前記２枚以上のアライメント画像に基づき計測する、
オーバレイ計量システム。 The overlay weighing system according to claim 18, in which the telecentricity data is determined based on the positional variation of the one or a plurality of features in the two or more aligned images.
The position of the one or more features in each of the two or more alignment images is obtained, and the telecentricity error is the position change speed of the one or more features and is a function of the in-focus position. The measurement is performed based on the two or more alignment images.
Overlay weighing system.
前記撮像システムの１個又は複数個のカメラ上に１個又は複数個のパターンを投射するよう構成されたパターン投射器を備え、１個又は複数個のフィーチャの位置ばらつきを求めるための参照データを、当該１個又は複数個のパターンにより提供するオーバレイ計量システム。 The overlay weighing system according to claim 1, further
A pattern projector configured to project one or more patterns on one or more cameras of the imaging system is provided , and reference data for obtaining the position variation of one or more features is obtained. , An overlay weighing system provided by the one or more patterns.
前記２枚以上のアライメント画像それぞれにおける前記１個又は複数個のフィーチャの位置を、前記１個又は複数個のパターンを基準として求め、且つ
テレセントリシティ誤差を、前記１個又は複数個のフィーチャの位置変化速度であり合焦位置の関数たるものとして、前記２枚以上のアライメント画像に基づき計測する、
オーバレイ計量システム。 The overlay weighing system according to claim 20, when determining the telecentricity data.
The position of the one or more features in each of the two or more alignment images is obtained with reference to the one or more patterns, and the telecentricity error is obtained for the one or more features. It is a position change speed and a function of the in-focus position, and is measured based on the two or more alignment images.
Overlay weighing system.
第１方向に沿った少なくとも１個のパターンと、
その第１方向に直交する第２方向に沿った少なくとも１個のパターンと、
を含むオーバレイ計量システム。 The overlay weighing system according to claim 20, wherein the one or more patterns are
At least one pattern along the first direction,
At least one pattern along the second direction orthogonal to the first direction,
Overlay weighing system including.
周期的なパターン構成要素分布を呈する１個又は複数個の格子パターンを含むオーバレイ計量システム。 The overlay weighing system according to claim 20, wherein the one or more patterns are
An overlay weighing system containing one or more grid patterns exhibiting a periodic pattern component distribution.
前記１個又は複数個のパターンを有するパターンマスクと、
そのパターンマスクを照明するよう構成された照明源と、
前記１個又は複数個のカメラ上に前記パターンマスクの像を生成するよう構成されたパターン結像システムと、
を備えるオーバレイ計量システム。 The overlay weighing system according to claim 20, wherein the pattern projector is
With the pattern mask having one or more patterns,
With a lighting source configured to illuminate the pattern mask,
A pattern imaging system configured to generate an image of the pattern mask on the one or more cameras.
Overlay weighing system with.
第１方向に沿い周期分布するパターン構成要素群を有する少なくとも１個の格子パターンと、
その第１方向に直交する第２方向に沿い周期分布するパターン構成要素群を有する少なくとも１個の格子パターンと、
を含むオーバレイ計量システム。 The overlay weighing system according to claim 24, wherein the one or more patterns are
At least one lattice pattern having a group of pattern components periodically distributed along the first direction, and
At least one lattice pattern having a group of pattern components periodically distributed along the second direction orthogonal to the first direction, and
Overlay weighing system including.
前記照明源に発し前記１個又は複数個のパターンにより回折された照明を受光するよう前記パターン結像システムの瞳面に配置された暗視野絞りを備え、前記暗視野絞りの開口が、第１方向に沿い二通りの指定回折次数、第２方向に沿い二通りの指定回折次数を通すオーバレイ計量システム。 25. The overlay weighing system according to claim 25, wherein the pattern projector further comprises.
The dark field diaphragm is provided on the pupil surface of the pattern imaging system so as to receive the illumination emitted from the illumination source and diffracted by the one or more patterns, and the opening of the dark field diaphragm is the first. An overlay weighing system that passes two designated diffraction orders along the direction and two designated diffraction orders along the second direction.
前記撮像システムの１個又は複数個の構成部材を調整することで前記標本の合焦位置を制御し、それによりその撮像システムを前記指定合焦公差内で位置揃えするオーバレイ計量システム。 The overlay weighing system according to claim 1, when instructing the imaging system to adjust the alignment of the overlay target in the imaging system.
An overlay weighing system that controls the focusing position of a sample by adjusting one or more components of the imaging system, thereby aligning the imaging system within the designated focusing tolerance.
前記標本を固持する標本ステージの位置を調整するオーバレイ計量システム。 The overlay weighing system according to claim 29, wherein the focus position of the sample is controlled by adjusting one or a plurality of components of the image pickup system, whereby the image pickup system is focused on the designated focus. When aligning within tolerances
An overlay weighing system that adjusts the position of the specimen stage that holds the specimen.
対物レンズの位置を調整するオーバレイ計量システム。 The overlay weighing system according to claim 29, wherein the focus position of the sample is controlled by adjusting one or a plurality of components of the image pickup system, whereby the image pickup system is focused on the designated focus. When aligning within tolerances
Overlay weighing system that adjusts the position of the objective lens.
検出器の位置を調整するオーバレイ計量システム。 The overlay weighing system according to claim 29, wherein the focus position of the sample is controlled by adjusting one or a plurality of components of the image pickup system, whereby the image pickup system is focused on the designated focus. When aligning within tolerances
Overlay weighing system that adjusts the position of the detector.
前記アライメントデータが、前記２枚以上のアライメント画像における前記オーバレイターゲットの合焦品質を示す合焦データを含み、前記指定アライメント公差が指定合焦公差を含み、且つ
前記アライメントデータが、前記撮像システムにおける前記オーバレイターゲットのテレセントリシティ品質を示すテレセントリシティデータを含み、前記指定アライメント公差が指定テレセントリシティ公差を含む、
オーバレイ計量システム。 The overlay weighing system according to claim 1.
The alignment data includes focusing data indicating the focusing quality of the overlay target in the two or more alignment images, the designated alignment tolerance includes the designated focusing tolerance, and the alignment data is the imaging system. A telecentricity data indicating the telecentricity quality of the overlay target is included, and the designated alignment tolerance includes a designated telecentricity tolerance.
Overlay weighing system.
前記指定テレセントリシティ公差内で前記撮像システムが位置揃えされるようその撮像システムの１個又は複数個の構成部材を調整するオーバレイ計量システム。 The overlay weighing system according to claim 33 , when instructing the imaging system to adjust the alignment of the overlay target in the imaging system.
An overlay weighing system that adjusts one or more components of an imaging system so that the imaging system is aligned within the designated telecentricity tolerance.
開口絞りの位置を調整するオーバレイ計量システム。 34. The overlay weighing system of claim 34, in which one or more components of the imaging system are controlled so that the imaging system is aligned within the designated telecentricity tolerance.
Overlay weighing system that adjusts the position of the aperture stop.
標本ステージを用い前記標本の傾斜を制御するオーバレイ計量システム。 34. The overlay weighing system of claim 34, in which one or more components of the imaging system are controlled so that the imaging system is aligned within the designated telecentricity tolerance.
An overlay weighing system that controls the tilt of the specimen using the specimen stage.
その撮像システムの視野内で前記オーバレイターゲットの少なくとも１個の指定フィーチャをセンタリングするオーバレイ計量システム。 The overlay weighing system according to claim 1, when instructing the imaging system to adjust the alignment of the overlay target in the imaging system.
An overlay weighing system that centers at least one designated feature of the overlay target within the field of view of the imaging system.
そのオーバレイターゲットの一部分を含むオーバレイ計量システム。 The overlay weighing system according to claim 1, wherein the one or more features of the overlay target are
An overlay weighing system that includes a portion of its overlay target.
レジスト層を含むオーバレイ計量システム。 The designated layer of the overlay target in the overlay weighing system according to claim 41.
Overlay weighing system including resist layer.
２個以上の合焦位置にて対物レンズ経由で像を捉えるよう構成された１個又は複数個のカメラを有するテレセントリック撮像システムと、
その撮像システムに可通信結合されたコントローラと、
を備え、そのコントローラが、プログラム命令を実行するよう構成された１個又は複数個のプロセッサを有し、それら命令の実行により、当該１個又は複数個のプロセッサが、
前記撮像システムにより２個以上の合焦位置にて標本上のオーバレイターゲットを捉えた２枚以上のアライメント画像であり、そのオーバレイターゲットの１個又は複数個のフィーチャが入っている２枚以上のアライメント画像を受け取り、
それら２枚以上のアライメント画像に基づき、前記撮像システムにおける前記オーバレイターゲットのアライメント具合を示すアライメントデータを生成し、
前記オーバレイターゲットのアライメント具合が指定アライメント公差内である場合に、前記２枚以上のアライメント画像を計測画像として設定し、
前記オーバレイターゲットのアライメント具合が前記指定アライメント公差外である場合に、前記撮像システムにおけるそのオーバレイターゲットのアライメント具合を調整するようその撮像システムに指令してその撮像システムから１枚又は複数枚の計測画像を更に受け取り、且つ
それら計測画像のうち少なくとも１枚に基づき前記標本の２個以上の層間のオーバレイを判別する、
オーバレイ計量システム。 Overlay weighing system
A telecentric imaging system with one or more cameras configured to capture an image through an objective lens at two or more in-focus positions.
With a controller that is communicatively coupled to the imaging system,
The controller has one or more processors configured to execute program instructions, and the execution of those instructions causes the one or more processors to execute.
Two or more alignment images that capture the overlay target on the specimen at two or more in-focus positions by the imaging system, and the alignment of two or more images containing one or more features of the overlay target. Receive the image,
Based on these two or more alignment images, alignment data indicating the alignment condition of the overlay target in the imaging system is generated.
When the alignment condition of the overlay target is within the specified alignment tolerance, the two or more alignment images are set as measurement images.
When the alignment condition of the overlay target is outside the specified alignment tolerance, the imaging system is instructed to adjust the alignment condition of the overlay target in the imaging system, and one or a plurality of measured images from the imaging system. And determine the overlay between two or more layers of the sample based on at least one of those measured images.
Overlay weighing system.
テレセントリック撮像システムにより２個以上の合焦位置にて標本を捉えた２枚以上のアライメント画像であり、オーバレイターゲットの１個又は複数個のフィーチャが入っている２枚以上のアライメント画像を受け取り、
それら２枚以上のアライメント画像に基づき、前記撮像システムにおける前記オーバレイターゲットのアライメント具合を示すアライメントデータを、１個又は複数個のプロセッサで以て生成し、
前記オーバレイターゲットのアライメント具合が指定アライメント公差内である場合に、前記２枚以上のアライメント画像を計測画像として設定し、
前記オーバレイターゲットのアライメント具合が前記指定アライメント公差外である場合に、前記撮像システムにおけるそのオーバレイターゲットのアライメント具合を調整するようその撮像システムに指令してその撮像システムから１枚又は複数枚の計測画像を更に受け取り、且つ
それら計測画像に基づき前記標本の２個以上の層間のオーバレイを１個又は複数個のプロセッサで以て判別する、
オーバレイ計量方法。 Overlay weighing method
Two or more alignment images that capture a sample at two or more in-focus positions with a telecentric imaging system, and receive two or more alignment images containing one or more features of an overlay target.
Based on these two or more alignment images, alignment data indicating the alignment condition of the overlay target in the imaging system is generated by one or a plurality of processors.
When the alignment condition of the overlay target is within the specified alignment tolerance, the two or more alignment images are set as measurement images.
When the alignment condition of the overlay target is outside the specified alignment tolerance, the image pickup system is instructed to adjust the alignment condition of the overlay target in the image pickup system, and one or a plurality of measurement images are measured from the image pickup system. And, based on those measured images, the overlay between two or more layers of the sample is discriminated by one or a plurality of processors.
Overlay weighing method.
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| Application Number | Priority Date | Filing Date | Title |
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| US15/948,941 US10677588B2 (en) | 2018-04-09 | 2018-04-09 | Localized telecentricity and focus optimization for overlay metrology |
| US15/948,941 | 2018-04-09 | ||
| PCT/US2019/025917 WO2019199585A1 (en) | 2018-04-09 | 2019-04-05 | Localized telecentricity and focus optimization for overlay metrology |
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| JP2021521418A JP2021521418A (en) | 2021-08-26 |
| JPWO2019199585A5 true JPWO2019199585A5 (en) | 2022-04-08 |
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| WO2020046408A1 (en) * | 2018-08-28 | 2020-03-05 | Kla-Tencor Corporation | Off-axis illumination overlay measurement using two-diffracted orders imaging |
| CN113124751B (en) * | 2019-12-31 | 2022-07-29 | 上海微电子装备（集团）股份有限公司 | Scattering measurement device and scattering measurement method |
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