JPH03211811A - Exposure aligner - Google Patents

Exposure aligner

Info

Publication number
JPH03211811A
JPH03211811A JP2007887A JP788790A JPH03211811A JP H03211811 A JPH03211811 A JP H03211811A JP 2007887 A JP2007887 A JP 2007887A JP 788790 A JP788790 A JP 788790A JP H03211811 A JPH03211811 A JP H03211811A
Authority
JP
Japan
Prior art keywords
projection
illuminance
aperture
shielding plate
light receiving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007887A
Other languages
Japanese (ja)
Inventor
Atsuhito Yamaguchi
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007887A priority Critical patent/JPH03211811A/en
Publication of JPH03211811A publication Critical patent/JPH03211811A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70216—Systems for imaging mask onto workpiece
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Abstract

PURPOSE: To realize high precision projection baking, by using a light shielding plate having an aperture as an element of an illuminating system, and a photo detecting means having a light receiving surface of a specified size, and constituting each element in the manner in which a measurement surface is scanned with a projection image, formed by a projection optical system, of the aperture of the light shielding plate.
CONSTITUTION: A photo detecting means 13 having a light receiving surface of a specified size is arranged in a space on the projection surface side of a projection optical system; an aperture 2a of a light shielding plate 2 is moved in a plane perpendicular to the optical axis of an illuminating system 1, thereby measuring the illuminance and/or the illuminance distribution at arbitrary positions on the projection surface of the projection optical system. Hence the illuminance of an arbitrary position can be accurately measured without accurately aligning the light receiving surface to a wafer 9 surface or an image surface of the projection optical system. Thereby an aligner capable of rapidly and highly precisely measuring the illuminance and the illuminance distribution and available for high resolution projection baking can be obtained.
COPYRIGHT: (C)1991,JPO&Japio
JP2007887A 1990-01-17 1990-01-17 Exposure aligner Pending JPH03211811A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007887A JPH03211811A (en) 1990-01-17 1990-01-17 Exposure aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007887A JPH03211811A (en) 1990-01-17 1990-01-17 Exposure aligner

Publications (1)

Publication Number Publication Date
JPH03211811A true JPH03211811A (en) 1991-09-17

Family

ID=11678104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007887A Pending JPH03211811A (en) 1990-01-17 1990-01-17 Exposure aligner

Country Status (1)

Country Link
JP (1) JPH03211811A (en)

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