JPWO2019173171A5 - - Google Patents

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Publication number
JPWO2019173171A5
JPWO2019173171A5 JP2020546104A JP2020546104A JPWO2019173171A5 JP WO2019173171 A5 JPWO2019173171 A5 JP WO2019173171A5 JP 2020546104 A JP2020546104 A JP 2020546104A JP 2020546104 A JP2020546104 A JP 2020546104A JP WO2019173171 A5 JPWO2019173171 A5 JP WO2019173171A5
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Japan
Prior art keywords
overlay
weighing
weighing system
tool
target
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JP2020546104A
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English (en)
Japanese (ja)
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JP2021516366A (ja
JP7177846B2 (ja
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Priority claimed from US16/057,498 external-priority patent/US10533848B2/en
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Publication of JPWO2019173171A5 publication Critical patent/JPWO2019173171A5/ja
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JP2020546104A 2018-03-05 2019-03-04 オーバレイ及びエッジ配置誤差の計量及び制御 Active JP7177846B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862638900P 2018-03-05 2018-03-05
US62/638,900 2018-03-05
US16/057,498 2018-08-07
US16/057,498 US10533848B2 (en) 2018-03-05 2018-08-07 Metrology and control of overlay and edge placement errors
PCT/US2019/020471 WO2019173171A1 (en) 2018-03-05 2019-03-04 Metrology and control of overlay and edge placement errors

Publications (3)

Publication Number Publication Date
JP2021516366A JP2021516366A (ja) 2021-07-01
JPWO2019173171A5 true JPWO2019173171A5 (zh) 2022-03-10
JP7177846B2 JP7177846B2 (ja) 2022-11-24

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JP2020546104A Active JP7177846B2 (ja) 2018-03-05 2019-03-04 オーバレイ及びエッジ配置誤差の計量及び制御

Country Status (9)

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US (1) US10533848B2 (zh)
EP (1) EP3762780B1 (zh)
JP (1) JP7177846B2 (zh)
KR (1) KR102450009B1 (zh)
CN (1) CN111801625B (zh)
IL (1) IL276811B2 (zh)
SG (1) SG11202008005WA (zh)
TW (1) TWI781298B (zh)
WO (1) WO2019173171A1 (zh)

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US11353321B2 (en) 2020-06-12 2022-06-07 Kla Corporation Metrology system and method for measuring diagonal diffraction-based overlay targets
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TWI795798B (zh) * 2021-06-02 2023-03-11 東龍投資股份有限公司 對準誤差補償方法及其系統
US11703767B2 (en) * 2021-06-28 2023-07-18 Kla Corporation Overlay mark design for electron beam overlay
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