JPWO2019121899A5 - - Google Patents
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- Publication number
- JPWO2019121899A5 JPWO2019121899A5 JP2020534418A JP2020534418A JPWO2019121899A5 JP WO2019121899 A5 JPWO2019121899 A5 JP WO2019121899A5 JP 2020534418 A JP2020534418 A JP 2020534418A JP 2020534418 A JP2020534418 A JP 2020534418A JP WO2019121899 A5 JPWO2019121899 A5 JP WO2019121899A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- electrodes
- temperature control
- heat transfer
- connecting piece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102017223592.6 | 2017-12-21 | ||
DE102017223592.6A DE102017223592B4 (de) | 2017-12-21 | 2017-12-21 | System zur elektrisch entkoppelten, homogenen Temperierung einer Elektrode mittels Wärmeleitrohren sowie Bearbeitungsanlage mit einem solchen System |
PCT/EP2018/085820 WO2019121899A1 (de) | 2017-12-21 | 2018-12-19 | System zur elektrisch entkoppelten, homogenen temperierung einer elektrode mittels wärmeleitrohren sowie bearbeitungsanlage mit einem solchen system |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2021507536A JP2021507536A (ja) | 2021-02-22 |
JPWO2019121899A5 true JPWO2019121899A5 (zh) | 2023-04-17 |
JP7274487B2 JP7274487B2 (ja) | 2023-05-16 |
Family
ID=64902075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020534418A Active JP7274487B2 (ja) | 2017-12-21 | 2018-12-19 | 伝熱管を用いて電極を電気的に切り離された形で均一に温度制御するシステム及びそのようなシステムを備えた処理設備 |
Country Status (10)
Country | Link |
---|---|
US (1) | US20210090863A1 (zh) |
EP (1) | EP3729486B1 (zh) |
JP (1) | JP7274487B2 (zh) |
KR (1) | KR20200100749A (zh) |
CN (2) | CN209119039U (zh) |
DE (1) | DE102017223592B4 (zh) |
EA (1) | EA202000177A1 (zh) |
ES (1) | ES2960584T3 (zh) |
SG (1) | SG11202005224TA (zh) |
WO (1) | WO2019121899A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102017223592B4 (de) * | 2017-12-21 | 2023-11-09 | Meyer Burger (Germany) Gmbh | System zur elektrisch entkoppelten, homogenen Temperierung einer Elektrode mittels Wärmeleitrohren sowie Bearbeitungsanlage mit einem solchen System |
DE102020124022A1 (de) | 2020-09-15 | 2022-03-17 | centrotherm international AG | Werkstückträger, System und Betriebsverfahren für PECVD |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2033704B (en) * | 1978-10-30 | 1982-09-29 | Electricity Council | Electron discharge heating device |
US4381965A (en) * | 1982-01-06 | 1983-05-03 | Drytek, Inc. | Multi-planar electrode plasma etching |
JPS6225411A (ja) * | 1985-07-25 | 1987-02-03 | Fujitsu Ltd | プラズマcvd膜形成法 |
US5231291A (en) * | 1989-08-01 | 1993-07-27 | Canon Kabushiki Kaisha | Wafer table and exposure apparatus with the same |
JP3100236B2 (ja) * | 1992-08-03 | 2000-10-16 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US5647911A (en) | 1993-12-14 | 1997-07-15 | Sony Corporation | Gas diffuser plate assembly and RF electrode |
JPH08203692A (ja) | 1995-01-25 | 1996-08-09 | Hitachi Ltd | 誘導結合プラズマ発生装置 |
JP3393742B2 (ja) * | 1995-09-28 | 2003-04-07 | 京セラ株式会社 | ウエハ保持部材 |
JP4015210B2 (ja) * | 1996-05-30 | 2007-11-28 | 富士電機システムズ株式会社 | オゾン発生装置 |
US6566667B1 (en) | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
KR100425445B1 (ko) | 2001-04-24 | 2004-03-30 | 삼성전자주식회사 | 플라즈마 에칭 챔버 및 이를 이용한 포토마스크 제조 방법 |
JP2003100835A (ja) | 2001-09-25 | 2003-04-04 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP4186644B2 (ja) * | 2003-02-17 | 2008-11-26 | 株式会社Ihi | 真空処理装置の冷却装置 |
KR100528334B1 (ko) * | 2003-04-08 | 2005-11-16 | 삼성전자주식회사 | 베이크 시스템 |
JP4463583B2 (ja) | 2004-02-13 | 2010-05-19 | 東京エレクトロン株式会社 | 成膜方法および成膜装置 |
US7548303B2 (en) * | 2004-09-04 | 2009-06-16 | Nikon Corporation | Cooling assembly for a stage |
JP2010510649A (ja) * | 2006-11-17 | 2010-04-02 | セントロターム・サーマル・ソルーションズ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンデイトゲゼルシヤフト | 基層の熱処理方法及び熱処理装置 |
JP2009170721A (ja) | 2008-01-17 | 2009-07-30 | Nikon Corp | 静電チャック、マスク保持装置、基板保持装置、露光装置及びデバイスの製造方法 |
EP2403975A1 (en) | 2009-03-03 | 2012-01-11 | S.O.I.Tec Silicon on Insulator Technologies | Gas injectors for cvd systems with the same |
JP5320171B2 (ja) * | 2009-06-05 | 2013-10-23 | 東京エレクトロン株式会社 | 基板処理装置 |
JP5566389B2 (ja) | 2009-09-25 | 2014-08-06 | 京セラ株式会社 | 堆積膜形成装置および堆積膜形成方法 |
DE202010004109U1 (de) * | 2010-03-11 | 2011-10-21 | Asia Vital Components Co., Ltd. | Brückenverbindung von Wärmeleitrohren und deren Kühlmodul |
JP4852653B2 (ja) | 2010-03-15 | 2012-01-11 | シャープ株式会社 | プラズマ処理装置、プラズマ処理方法および半導体素子の製造方法 |
WO2012042664A1 (ja) * | 2010-10-01 | 2012-04-05 | 東芝三菱電機産業システム株式会社 | 均熱処理装置 |
US10274270B2 (en) | 2011-10-27 | 2019-04-30 | Applied Materials, Inc. | Dual zone common catch heat exchanger/chiller |
US20140356985A1 (en) * | 2013-06-03 | 2014-12-04 | Lam Research Corporation | Temperature controlled substrate support assembly |
DE102015113962A1 (de) * | 2015-08-24 | 2017-03-02 | Meyer Burger (Germany) Ag | Substratbehandlungsvorrichtung |
DE102016215712A1 (de) | 2016-08-22 | 2018-02-22 | Siemens Aktiengesellschaft | Vorrichtung und Verfahren zur Erzeugung eines elektrischen Plasmas |
EP3302006A1 (en) * | 2016-09-30 | 2018-04-04 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Component carrier comprising at least one heat pipe and method for producing said component carrier |
DE102017223592B4 (de) * | 2017-12-21 | 2023-11-09 | Meyer Burger (Germany) Gmbh | System zur elektrisch entkoppelten, homogenen Temperierung einer Elektrode mittels Wärmeleitrohren sowie Bearbeitungsanlage mit einem solchen System |
-
2017
- 2017-12-21 DE DE102017223592.6A patent/DE102017223592B4/de active Active
-
2018
- 2018-12-19 KR KR1020207020772A patent/KR20200100749A/ko not_active Application Discontinuation
- 2018-12-19 WO PCT/EP2018/085820 patent/WO2019121899A1/de unknown
- 2018-12-19 ES ES18829350T patent/ES2960584T3/es active Active
- 2018-12-19 EP EP18829350.0A patent/EP3729486B1/de active Active
- 2018-12-19 SG SG11202005224TA patent/SG11202005224TA/en unknown
- 2018-12-19 JP JP2020534418A patent/JP7274487B2/ja active Active
- 2018-12-19 EA EA202000177A patent/EA202000177A1/ru unknown
- 2018-12-19 US US16/956,387 patent/US20210090863A1/en active Pending
- 2018-12-21 CN CN201822167758.0U patent/CN209119039U/zh active Active
- 2018-12-21 CN CN201811569221.5A patent/CN109950120B/zh active Active
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