JPWO2017141598A1 - ポーラス部材の製造方法 - Google Patents
ポーラス部材の製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title claims abstract description 39
- 229910052751 metal Inorganic materials 0.000 claims abstract description 79
- 239000002184 metal Substances 0.000 claims abstract description 79
- 239000007769 metal material Substances 0.000 claims abstract description 72
- 238000010438 heat treatment Methods 0.000 claims abstract description 65
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 38
- 239000000956 alloy Substances 0.000 claims abstract description 38
- 239000007787 solid Substances 0.000 claims abstract description 20
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 238000002156 mixing Methods 0.000 claims abstract description 13
- 229910052759 nickel Inorganic materials 0.000 claims description 15
- 229910052749 magnesium Inorganic materials 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 12
- 230000008018 melting Effects 0.000 claims description 11
- 238000002844 melting Methods 0.000 claims description 11
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 229910052791 calcium Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- 229910052744 lithium Inorganic materials 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- 229910052745 lead Inorganic materials 0.000 claims description 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 2
- 150000002910 rare earth metals Chemical class 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 239000011777 magnesium Substances 0.000 description 43
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 38
- 238000006243 chemical reaction Methods 0.000 description 29
- 239000012071 phase Substances 0.000 description 10
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 9
- 229910017604 nitric acid Inorganic materials 0.000 description 9
- 239000010409 thin film Substances 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000002114 nanocomposite Substances 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 238000010828 elution Methods 0.000 description 4
- 229910000856 hastalloy Inorganic materials 0.000 description 4
- 238000001000 micrograph Methods 0.000 description 4
- 239000012300 argon atmosphere Substances 0.000 description 3
- 238000010406 interfacial reaction Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910019083 Mg-Ni Inorganic materials 0.000 description 1
- 229910019403 Mg—Ni Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
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- 239000000835 fiber Substances 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000011534 incubation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 210000003041 ligament Anatomy 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000013526 supercooled liquid Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
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- C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
- C22C19/056—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 10% but less than 20%
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Abstract
【解決手段】第1の成分から成る固体の金属体11と、第1の成分に対してそれぞれ正および負の混合熱を有する第2の成分および第3の成分を同時に含有する化合物、合金または非平衡合金から成る固体の金属材料12とを接触させて、所定の温度で所定時間熱処理を行う。熱処理により、第1の成分を金属材料12の側に、第3の成分を金属体11の側に拡散させた後、第1の成分および/または第3の成分が拡散した部分から第2の成分を主体とする部分以外を選択的に取り除き、微小間隙を有する部材を得る。
【選択図】図1
Description
本発明の実施の形態のポーラス部材の製造方法は、まず、図1(a)に示すように、第1の成分から成る固体の金属体11と、第1の成分に対してそれぞれ正および負の混合熱を有する第2の成分および第3の成分を同時に含有する化合物、合金または非平衡合金から成る固体の金属材料12とを用い、互いに接触させる。
次に、図1(b)に示すように、処理中に離れないよう金属体11と金属材料12との間に荷重をかけ(loading)、熱処理としてアニール処理(annealing)を行う。熱処理は、金属体11の絶対温度での融点の75〜85%の温度で、5時間以上80時間以下保持することにより行う。これにより、金属体11である第1の成分との混合熱に依存して、金属材料12から第3の成分が金属体11へ、金属体11から第1の成分が金属材料12へ相互拡散する。金属材料12の第2の成分は、第1の成分と正の混合熱を有するため、金属体11の側には拡散しない。これにより、図1(c)に示すように、金属材料12中に、反応領域(reaction layer)13として、第1の成分および第3の成分から成る部分と第2の成分から成る部分とが、ナノメートルオーダーで互いに混合した状態の領域が得られる。このとき、固体間での相互拡散は、特許文献1に記載のような金属浴への溶出と比べて、ゆっくりと進むため、第1の成分および第3の成分から成る部分と第2の成分から成る部分とが、互いにより細かく混合した状態となる。
次に、熱処理の後、エッチングにより、反応領域13から第2の成分を主体とする部分以外、すなわち第1の成分および第3の成分を選択的に溶出して取り除き、第2の成分を主体とする部分を露出させる。第1の成分と第3の成分とが結合して化合物、合金または非平衡合金が形成されている場合には、これらを選択的に取り除く。これにより、第2の成分を主体とした、ナノメートル寸法の微小間隙を有するポーラス部材を製造することができる。このとき、固体間での相互拡散により、第1の成分および第3の成分から成る部分と第2の成分から成る部分とが、互いにより細かく混合した状態となっているため、形成される微小間隙のサイズを、特許文献1と比べて、より小さくすることができる。
厚さ30ミクロンのTi50Cu50原子%アモルファスリボン(金属材料12)を、鏡面研磨したMg板(金属体11)に20MPaで押し当て、Mgの融点の50%以上の温度である480℃に加熱して保持した。これにより、両者の接触界面に、Cu(第3の成分)およびMg(第1の成分)を主成分とする部分と、Ti(第2の成分)を主成分とする部分とから成る共連続構造ナノ複合組織が形成された。これを硝酸に浸漬し、Tiを主成分とする部分以外を取り除き、100nm以下の間隙を有するポーラス金属部材が得られた。
12 金属材料
13 反応領域
Claims (10)
- 第1の成分から成る固体の金属体と、前記第1の成分に対してそれぞれ正および負の混合熱を有する第2の成分および第3の成分を同時に含有する化合物、合金または非平衡合金から成る固体の金属材料とを接触させて、所定の温度で所定時間熱処理を行うことにより、前記第1の成分を前記金属材料側に、前記第3の成分を前記金属体側に拡散させた後、前記第1の成分および/または前記第3の成分が拡散した部分から前記第2の成分を主体とする部分以外を選択的に取り除き、微小間隙を有する部材を得ることを特徴とするポーラス部材の製造方法。
- 前記第2の成分を主体とする部分以外を選択的に取り除くとき、前記第2の成分を主体とする部分を露出させることを特徴とする請求項1記載のポーラス部材の製造方法。
- 前記金属体と前記金属材料とを接触させた後、前記第1の成分と前記第3の成分とが相互拡散して結合するよう、前記熱処理を行うことを特徴とする請求項1または2記載のポーラス部材の製造方法。
- 前記熱処理を行った後、前記第1の成分と前記第3の成分とが結合して形成された化合物、合金または非平衡合金を選択的に取り除くことを特徴とする請求項3記載のポーラス部材の製造方法。
- 前記熱処理を行った後、エッチングにより前記第1の成分および前記第3の成分を選択的に溶出して取り除くことを特徴とする請求項1乃至4のいずれか1項に記載のポーラス部材の製造方法。
- 前記熱処理は、前記金属体の絶対温度での融点の50%以上の温度で保持することを特徴とする請求項1乃至5のいずれか1項に記載のポーラス部材の製造方法。
- 前記金属体の前記金属材料との接触面、および前記金属材料の前記金属体との接触面をあらかじめ鏡面仕上げしておき、
前記熱処理の間、前記金属体の接触面と前記金属材料の接触面とをぴったりと接触させておくことを
特徴とする請求項1乃至6のいずれか1項に記載のポーラス部材の製造方法。 - 前記第1の成分は、Li、Mg、Ca、Cu、Zn、Ag、Pb、Bi、希土類金属元素、もしくは、これらのいずれか一つを主成分とする合金または化合物である混和体から成り、
前記第2の成分は、Ti、Zr、Hf、Nb、Ta、V、Cr、Mo、W、Fe、Co、Ni、C、Si、Ge、Sn、Alのいずれか一つ、もしくは、その複数を含む合金または化合物である混和体から成り、
前記第3の成分は、Li、Mg、Ca、Mn、Fe、Co、Ni、Cu、Ti、Zr、Hf、Nb、Ta、Cr、Mo、Wのいずれか一つ、もしくは、その複数を含む混和体から成ることを
特徴とする請求項1乃至7のいずれか1項に記載のポーラス部材の製造方法。 - 前記第1の成分がMgから成り、
前記第3の成分がNiから成り、前記金属材料がNi含有合金から成ることを
特徴とする請求項1乃至8のいずれか1項に記載のポーラス部材の製造方法。 - 第2の成分から成る固体の金属体と、第1の成分および第3の成分を同時に含有する化合物、合金または非平衡合金から成る固体の金属材料とを接触させて、所定の温度で所定時間熱処理を行うことにより、前記第2の成分を前記金属材料側に、前記第3の成分を前記金属体側に拡散させた後、前記第2の成分および/または前記第3の成分が拡散した部分から前記第1の成分を主体とする部分以外を選択的に取り除き、微小間隙を有する部材を得ることを特徴とし、
前記第2の成分および前記第3の成分が、前記第1の成分に対してそれぞれ正および負の混合熱を有し、前記第1の成分の絶対温度での融点が前記第2の成分の絶対温度での融点の半分以上である、ポーラス部材の製造方法。
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