JPWO2016052080A1 - 反射防止膜及びカルコゲナイドガラスレンズ並びに撮像装置 - Google Patents
反射防止膜及びカルコゲナイドガラスレンズ並びに撮像装置 Download PDFInfo
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- 238000003384 imaging method Methods 0.000 title claims abstract description 7
- 239000005387 chalcogenide glass Substances 0.000 title claims description 21
- 150000001721 carbon Chemical class 0.000 claims abstract description 65
- 239000001257 hydrogen Substances 0.000 claims abstract description 31
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 31
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000007789 gas Substances 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims description 22
- 238000004544 sputter deposition Methods 0.000 claims description 17
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- 230000003667 anti-reflective effect Effects 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 34
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 6
- 230000006870 function Effects 0.000 abstract description 6
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 4
- 229910052786 argon Inorganic materials 0.000 abstract description 3
- 238000005984 hydrogenation reaction Methods 0.000 abstract description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 abstract 3
- 239000010408 film Substances 0.000 description 171
- 239000010410 layer Substances 0.000 description 63
- 238000011156 evaluation Methods 0.000 description 10
- 230000007423 decrease Effects 0.000 description 8
- 239000011669 selenium Substances 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000001678 elastic recoil detection analysis Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 206010037660 Pyrexia Diseases 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 238000003745 diagnosis Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 1
- 229910005742 Ge—C Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- -1 helium ions Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000004297 night vision Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
- C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/32—Non-oxide glass compositions, e.g. binary or ternary halides, sulfides or nitrides of germanium, selenium or tellurium
- C03C3/321—Chalcogenide glasses, e.g. containing S, Se, Te
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
図2に概略を示すRFマグネトロンスパッタ装置(シンクロン株式会社製BMS−800)21により、炭素ターゲット32として、アルバック製φ6インチターゲットを用い、水素化炭素膜16を成膜した。
スパッタリング電力:750W〜375W(水素化炭素膜16の製造時)、375W(MgF2膜17の製造時)
スパッタリングガス: Ar+H2の混合ガス(水素化炭素膜16の製造時:流量120sccm、水素流量比2.5%に固定)、Arガス(MgF2膜17の製造時)
スパッタリングガス圧力:0.2Pa
光学基材11とターゲット32,33間の距離:120mm
光学基材11の加熱温度:ヒータ27により300℃に加熱
Aランク:剥離操作3回で膜剥離が無かった。
Bランク:剥離操作3回目で水素化炭素膜16の損傷がみられた。光学基材11の地は見られなかった。
Cランク:剥離操作2回目で水素化炭素膜16の損傷がみられた。光学基材11の地が見られなかった。
Dランク:剥離操作1回目で水素化炭素膜16の損傷がみられ、光学基材11の地が見られた。
λn=1/(1/λ0±(n−1)×k)
但し、nは1からの自然数であり、n=1の時に測定波長λ1は基準波長λ0と一致する。符号±は、基準波長に対して長波長側か短波長側の波長を求めるかにより適宜選択可能である。
11 光学基材
12 第1層
13 第2層
14 第3層
15 第4層
16 水素化炭素膜
17 MgF2膜
21 スパッタ装置
25 基材ホルダ
28,29 ターゲットホルダ
32 炭素ターゲット
33 MgF2ターゲット
Claims (9)
- カルコゲナイドガラスからなる基材の表面に設けられ、前記基材側から順に複数の層を有する反射防止膜において、
前記基材と接する第1層が水素化炭素膜からなる反射防止膜。 - 前記水素化炭素膜は、水素含有率chが、
0[at.%]<ch≦6.1[at.%]の範囲内である請求項1に記載の反射防止膜。 - 前記第1層に積層され、前記第1層の屈折率よりも低屈折率である第2層を有する請求項1又は2記載の反射防止膜。
- 前記第1層及び前記第2層を交互に複数有する請求項3記載の反射防止膜。
- 前記第2層の波長10.5μmにおける屈折率は、1.5以下である請求項3又は請求項4に記載の反射防止膜。
- 前記第2層はMgF2膜からなる請求項3から5のいずれか1項に記載の反射防止膜。
- 前記水素化炭素膜は、炭素ターゲットを、H2を含むガス雰囲気中でスパッタ処理して成膜される請求項1から6いずれか1項に記載の反射防止膜。
- 請求項1から7いずれか1項に記載の反射防止膜を有するカルコゲナイドガラスレンズ。
- 請求項8に記載のカルコゲナイドガラスレンズを少なくとも1枚有する撮像装置。
Applications Claiming Priority (3)
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JP2014202655 | 2014-09-30 | ||
JP2014202655 | 2014-09-30 | ||
PCT/JP2015/075279 WO2016052080A1 (ja) | 2014-09-30 | 2015-09-07 | 反射防止膜及びレンズ並びに撮像装置 |
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JPWO2016052080A1 true JPWO2016052080A1 (ja) | 2017-06-15 |
JP6155400B2 JP6155400B2 (ja) | 2017-06-28 |
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US (1) | US9766375B2 (ja) |
JP (1) | JP6155400B2 (ja) |
CN (1) | CN106796308B (ja) |
DE (1) | DE112015004470B4 (ja) |
WO (1) | WO2016052080A1 (ja) |
Families Citing this family (4)
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JP7172024B2 (ja) * | 2017-09-12 | 2022-11-16 | 日本電気硝子株式会社 | カルコゲナイドガラス材 |
CN108441837B (zh) * | 2018-06-13 | 2024-04-16 | 天津南玻节能玻璃有限公司 | 一种减反射镀膜结构 |
WO2020146320A1 (en) * | 2019-01-11 | 2020-07-16 | General Plasma Inc. | Antireflective overlays for mobile devices and methods of forming the same |
JP2023075372A (ja) * | 2020-04-16 | 2023-05-31 | Agc株式会社 | 赤外線透過部材、及び赤外線透過部材の製造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6480903A (en) * | 1987-09-22 | 1989-03-27 | Nikon Corp | Infrared optical element |
US4859536A (en) * | 1985-05-11 | 1989-08-22 | Barr & Stroud Limited | Optical coating |
JP2006036611A (ja) * | 2004-07-29 | 2006-02-09 | Sumitomo Electric Ind Ltd | 水素含有炭素膜 |
WO2009038143A1 (ja) * | 2007-09-19 | 2009-03-26 | Asahi Glass Company, Limited | 導電性積層体 |
JP2011221048A (ja) * | 2010-04-02 | 2011-11-04 | Fujifilm Corp | 反射防止膜及び赤外線用光学素子 |
WO2014008484A2 (en) * | 2012-07-05 | 2014-01-09 | Intevac, Inc. | Method to produce highly transparent hydrogenated carbon protective coating for transparent substrates |
JP2014032213A (ja) * | 2010-11-30 | 2014-02-20 | Fujifilm Corp | 赤外線用光学機能膜 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH658522A5 (de) | 1982-03-01 | 1986-11-14 | Balzers Hochvakuum | Optisches element. |
GB2192733B (en) | 1986-06-18 | 1991-02-06 | Raytheon Co | Impact resistant and tempered optical elements |
GB9018608D0 (en) | 1989-08-30 | 2013-11-13 | Texas Instruments Inc | Durable wideband anti-reflection coating for infrared windows |
US8630041B2 (en) * | 2009-07-17 | 2014-01-14 | International Business Machines Corporation | Data storage assembly with diamond like carbon antireflective layer |
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2015
- 2015-09-07 DE DE112015004470.1T patent/DE112015004470B4/de active Active
- 2015-09-07 CN CN201580052923.4A patent/CN106796308B/zh active Active
- 2015-09-07 JP JP2016551678A patent/JP6155400B2/ja active Active
- 2015-09-07 WO PCT/JP2015/075279 patent/WO2016052080A1/ja active Application Filing
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2017
- 2017-02-23 US US15/440,992 patent/US9766375B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4859536A (en) * | 1985-05-11 | 1989-08-22 | Barr & Stroud Limited | Optical coating |
JPS6480903A (en) * | 1987-09-22 | 1989-03-27 | Nikon Corp | Infrared optical element |
JP2006036611A (ja) * | 2004-07-29 | 2006-02-09 | Sumitomo Electric Ind Ltd | 水素含有炭素膜 |
WO2009038143A1 (ja) * | 2007-09-19 | 2009-03-26 | Asahi Glass Company, Limited | 導電性積層体 |
JP2011221048A (ja) * | 2010-04-02 | 2011-11-04 | Fujifilm Corp | 反射防止膜及び赤外線用光学素子 |
JP2014032213A (ja) * | 2010-11-30 | 2014-02-20 | Fujifilm Corp | 赤外線用光学機能膜 |
WO2014008484A2 (en) * | 2012-07-05 | 2014-01-09 | Intevac, Inc. | Method to produce highly transparent hydrogenated carbon protective coating for transparent substrates |
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Publication number | Publication date |
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US9766375B2 (en) | 2017-09-19 |
WO2016052080A1 (ja) | 2016-04-07 |
JP6155400B2 (ja) | 2017-06-28 |
CN106796308B (zh) | 2018-12-14 |
US20170160436A1 (en) | 2017-06-08 |
DE112015004470T5 (de) | 2017-06-08 |
DE112015004470B4 (de) | 2018-08-23 |
CN106796308A (zh) | 2017-05-31 |
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