JPWO2015001753A1 - コヒーレントテラヘルツ光用光学装置 - Google Patents
コヒーレントテラヘルツ光用光学装置 Download PDFInfo
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- JPWO2015001753A1 JPWO2015001753A1 JP2015525035A JP2015525035A JPWO2015001753A1 JP WO2015001753 A1 JPWO2015001753 A1 JP WO2015001753A1 JP 2015525035 A JP2015525035 A JP 2015525035A JP 2015525035 A JP2015525035 A JP 2015525035A JP WO2015001753 A1 JPWO2015001753 A1 JP WO2015001753A1
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- 230000003287 optical effect Effects 0.000 title claims abstract description 79
- 230000001427 coherent effect Effects 0.000 title claims abstract description 60
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- 238000005286 illumination Methods 0.000 description 7
- 238000007689 inspection Methods 0.000 description 5
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/361—Optical details, e.g. image relay to the camera or image sensor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0216—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using light concentrators or collectors or condensers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
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- Investigating Or Analysing Materials By Optical Means (AREA)
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- Microscoopes, Condenser (AREA)
Abstract
Description
〔実施例〕
次に実際の観察結果の一例を示す。現象の要因を複雑化させないために、量子カスケードレーザと、レンズの無い金属枠のみと、赤外線カットフィルタと、テラヘルツカメラと、を直線上に配置して実験を行った。ここで枠は、有効径の固定された絞りとみなすことが出来る。
2 光学系
3 有効径
4 構造体
5 反射防止体
6、101 筐体
7、102 コヒーレントテラヘルツ光源
8、115 レンズ支持体
9、107 第1レンズ
10 試料支持体
11、105 テラヘルツカメラ
12、117 センサパッケージ
13、118 アレイセンサ
14、119 窓
15 テラヘルツ顕微鏡
16、108 ミラー
17、109 虹彩絞り
18、110 第2レンズ
19、116 ミラー支持体
20、104 鏡筒
21、111 対物レンズ
22、112 赤外線カットフィルタ
23、113 接眼レンズ
24、103 試料ステージ
25、114 アーム
26、106 試料
27 羽根
28 絞り支持体
29 レバー
30 レーザ
31 可動ミラー
32 レンズ
33 手荷物検査装置
34 コンベア
35 手荷物
Claims (10)
- 周波数が0.1から10THzのコヒーレントテラヘルツ光を用いる光学系と、前記光学系の有効径外に位置する構造体の前記有効径側に設置された反射防止体と、を有する、ことを特徴とするコヒーレントテラヘルツ光用光学装置。
- 前記有効径が、幾何光学の光線追跡範囲であることを特徴とする請求項1に記載のコヒーレントテラヘルツ光用光学装置。
- 前記光学装置が、前記コヒーレントテラヘルツ光を検出する光検出手段を有することを特徴とするコヒーレントテラヘルツ光用光学装置。
- 前記光学装置が、前記コヒーレントテラヘルツ光を出力するコヒーレントテラヘルツ光源を有することを特徴とする請求項1乃至請求項3いずれか一項に記載のコヒーレントテラヘルツ光用光学装置。
- 前記コヒーレントテラヘルツ光源が、周波数の異なる複数の前記コヒーレントテラヘルツ光を選択的に出力することを特徴とする請求項4に記載のコヒーレントテラヘルツ光用光学装置。
- 前記構造体が絞りであることを特徴とする請求項1乃至請求項5いずれか一項に記載のコヒーレントテラヘルツ光用光学装置。
- 前記光学装置がレンズまたはミラーであることを特徴とする請求項1または請求項2に記載のコヒーレントテラヘルツ光用光学装置。
- 前記光学装置が前記コヒーレントテラヘルツ光を検出する光検出装置であり、前記構造体が前記光検出装置の光検出部を収納する筐体を含むことを特徴とする請求項1または請求項2に記載のコヒーレントテラヘルツ光用光学装置。
- 前記光検出装置が、光検出素子がアレイ状に配列した光検出部を有することを特徴とする請求項8に記載のコヒーレントテラヘルツ光用光学装置。
- 前記光検出部への光入射部の端部に前記反射防止体が設けられていることを特徴とする請求項9に記載のコヒーレントテラヘルツ光用光学装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013137713 | 2013-07-01 | ||
JP2013137713 | 2013-07-01 | ||
PCT/JP2014/003324 WO2015001753A1 (ja) | 2013-07-01 | 2014-06-20 | コヒーレントテラヘルツ光用光学装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2015001753A1 true JPWO2015001753A1 (ja) | 2017-02-23 |
JP6156495B2 JP6156495B2 (ja) | 2017-07-05 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015525035A Expired - Fee Related JP6156495B2 (ja) | 2013-07-01 | 2014-06-20 | コヒーレントテラヘルツ光用光学装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20160131889A1 (ja) |
JP (1) | JP6156495B2 (ja) |
WO (1) | WO2015001753A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015141172A (ja) * | 2014-01-30 | 2015-08-03 | パイオニア株式会社 | テラヘルツ波ガイド装置、及びテラヘルツ波装置 |
US10247842B2 (en) * | 2015-12-23 | 2019-04-02 | Raysecur Inc. | Mail screening apparatus |
WO2018169517A1 (en) * | 2017-03-14 | 2018-09-20 | Archit Lens Technology Inc. | Terahertz-gigahertz illuminator |
WO2019116998A1 (ja) * | 2017-12-13 | 2019-06-20 | キヤノン株式会社 | テラヘルツ波カメラおよび検出モジュール |
JP7288296B2 (ja) | 2017-12-13 | 2023-06-07 | キヤノン株式会社 | テラヘルツ波カメラおよび検出モジュール |
DE102018105352A1 (de) | 2018-03-08 | 2019-09-12 | Deutsche Post Ag | Verfahren und Vorrichtung zur Untersuchung von Sendungen |
DE102018128669A1 (de) * | 2018-11-15 | 2020-05-20 | Sick Ag | Verfahren zum Herstellen eines optischen Systems |
TWI723877B (zh) * | 2020-05-13 | 2021-04-01 | 國家中山科學研究院 | 插件式同軸熱輻射影像量測系統 |
CN111537087B (zh) * | 2020-05-25 | 2021-06-01 | 苏州大学 | 测量矢量随机电磁光场二维空间相干结构分布的方法 |
Citations (9)
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JP2001304959A (ja) * | 2000-04-27 | 2001-10-31 | Omron Corp | 赤外線センサ |
JP2005156188A (ja) * | 2003-11-20 | 2005-06-16 | National Institute Of Advanced Industrial & Technology | 光の透過測定による試料の平坦度と複素誘電率測定装置及び測定法 |
US20050148166A1 (en) * | 2003-12-26 | 2005-07-07 | Shun-Li Lin | [structure applied to a photolithographic process and method for fabricating a semiconductor device] |
JP2006234681A (ja) * | 2005-02-25 | 2006-09-07 | National Institute Of Advanced Industrial & Technology | 立体双楕円型光学装置 |
JP2009288047A (ja) * | 2008-05-29 | 2009-12-10 | Epson Toyocom Corp | テラヘルツ分光分析用液体セルおよびテラヘルツ分光分析用液体セルの製造方法 |
JP2010038809A (ja) * | 2008-08-07 | 2010-02-18 | Murata Mfg Co Ltd | テラヘルツ分光装置 |
JP2011198801A (ja) * | 2010-03-17 | 2011-10-06 | Canon Inc | 光伝導素子 |
WO2011134562A1 (de) * | 2010-04-30 | 2011-11-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. | Anordnung zum erzeugen eines signals mit einstellbarer zeit- oder phasenlage |
JP2011252872A (ja) * | 2010-06-04 | 2011-12-15 | Nec Corp | 反射型イメージング装置 |
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US5030828A (en) * | 1990-06-25 | 1991-07-09 | Grumman Aerospace Corporation | Recessed element photosensitive detector array with optical isolation |
US5591975A (en) * | 1993-09-10 | 1997-01-07 | Santa Barbara Research Center | Optical sensing apparatus for remotely measuring exhaust gas composition of moving motor vehicles |
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-
2014
- 2014-06-20 JP JP2015525035A patent/JP6156495B2/ja not_active Expired - Fee Related
- 2014-06-20 WO PCT/JP2014/003324 patent/WO2015001753A1/ja active Application Filing
- 2014-06-20 US US14/898,524 patent/US20160131889A1/en not_active Abandoned
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2001304959A (ja) * | 2000-04-27 | 2001-10-31 | Omron Corp | 赤外線センサ |
JP2005156188A (ja) * | 2003-11-20 | 2005-06-16 | National Institute Of Advanced Industrial & Technology | 光の透過測定による試料の平坦度と複素誘電率測定装置及び測定法 |
US20050148166A1 (en) * | 2003-12-26 | 2005-07-07 | Shun-Li Lin | [structure applied to a photolithographic process and method for fabricating a semiconductor device] |
JP2006234681A (ja) * | 2005-02-25 | 2006-09-07 | National Institute Of Advanced Industrial & Technology | 立体双楕円型光学装置 |
JP2009288047A (ja) * | 2008-05-29 | 2009-12-10 | Epson Toyocom Corp | テラヘルツ分光分析用液体セルおよびテラヘルツ分光分析用液体セルの製造方法 |
JP2010038809A (ja) * | 2008-08-07 | 2010-02-18 | Murata Mfg Co Ltd | テラヘルツ分光装置 |
JP2011198801A (ja) * | 2010-03-17 | 2011-10-06 | Canon Inc | 光伝導素子 |
WO2011134562A1 (de) * | 2010-04-30 | 2011-11-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. | Anordnung zum erzeugen eines signals mit einstellbarer zeit- oder phasenlage |
JP2011252872A (ja) * | 2010-06-04 | 2011-12-15 | Nec Corp | 反射型イメージング装置 |
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Publication number | Publication date |
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US20160131889A1 (en) | 2016-05-12 |
JP6156495B2 (ja) | 2017-07-05 |
WO2015001753A1 (ja) | 2015-01-08 |
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