JPWO2014192311A1 - 半導体基板、半導体基板の製造方法および電子デバイス - Google Patents
半導体基板、半導体基板の製造方法および電子デバイス Download PDFInfo
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- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
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- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42356—Disposition, e.g. buried gate electrode
- H01L29/4236—Disposition, e.g. buried gate electrode within a trench, e.g. trench gate electrode, groove gate electrode
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- H01L21/02178—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing aluminium, e.g. Al2O3
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
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- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
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- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
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- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
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- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66613—Lateral single gate silicon transistors with a gate recessing step, e.g. using local oxidation
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
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- H01L29/7782—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET
- H01L29/7783—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material
- H01L29/7785—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material with more than one donor layer
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
Abstract
Description
図1は、本実施形態1の半導体基板100を示した断面図である。半導体基板100は、基板102、化合物半導体層104、第1絶縁層106および第2絶縁層108を有する。基板102、化合物半導体層104、第1絶縁層106および第2絶縁層108は、基板102、化合物半導体層104、第1絶縁層106、第2絶縁層108の順に位置する。
図2は、実施形態2の電子デバイス200を示した断面図である。電子デバイス200は、実施形態1で説明したのと同様な半導体基板100と、ソース電極204、ドレイン電極206およびゲート電極208と、を有する。ただし、電子デバイス200の化合物半導体層104にはリセス部210が形成され、ゲート電極208はリセス部210に位置する。
基板102および化合物半導体層104としてGaAs基板を適用した。本願発明は、III−V族半導体全般に適用可能な技術であるところ、III−V族半導体として最も一般的なGaAsを用いて本願発明の効果を示したものである。本願発明のMOS界面における性能の向上を示すため、本実施例1では化合物半導体層104としてGaAs層を用いた。
実施例2では、実施例1の半導体基板におけるAlN層の厚さを変化させた複数の半導体基板を作成し、AlN層の厚さ依存性を検討した。AlN層は、0.1nm〜10nmの範囲で変化させ、AlN層設計厚さが異なる9種類の半導体基板を作成した。AlNの成長速度は0.65[Å/s]とし、時間制御により、設計厚さが0.1nm、1nm、2nm、3nm、4nm、5nm、6nm、8nmおよび10nmとなるAlN層を形成した。その他の条件等は実施例1と同様である。
AlN層設計厚さを1nmとし、AlN層の形成温度を250℃〜550℃の範囲で変化させた以外は実施例1と同様に実施例3の半導体基板を作成した。図25は、AlN層の形成温度が250℃の場合のMISダイオードの室温CV特性(左)と高温CV特性(右)を示す。図26は、AlN層の形成温度が300℃の場合のMISダイオードの室温CV特性(左)と高温CV特性(右)を示す。図27は、AlN層の形成温度が350℃の場合のMISダイオードの室温CV特性(左)と高温CV特性(右)を示す。図28は、AlN層の形成温度が450℃の場合のMISダイオードの室温CV特性(左)と高温CV特性(右)を示す。図29は、AlN層の形成温度が550℃の場合のMISダイオードの室温CV特性(左)と高温CV特性(右)を示す。図25〜図29から、周波数分散およびコブの状態は、温度が450℃程度までは比較的良好であるものの、温度が550℃に至ると悪化することがわかる。AlN層の形成温度は、250℃〜450℃が適しているといえる。
GaAs基板上に200nm厚さのGaAs層を形成し、100nm深さのリセスを形成した後、設計厚さを1nmのAlN層と、厚さ10nmのAl2O3層を形成した。その他の条件は実施例1と同様とした。ソース電極およびドレイン電極を形成し、リセス部にゲート電極を形成して、実施例4のMISトランジスタを製造した。比較として、AlN層を形成しない以外は実施例4と同様な比較例のMISトランジスタも製造した。
本実施例5では、MISゲート構造のゲート絶縁体にAlN層およびAl2O3層を用いたPHEMT(Pseudomorphic High Electron Mobility Transistor)の製造例を説明する。
本実施例6では、Al2O3層を薄くした例を説明する。Al2O3層の厚さを4nmとした以外は実施例1と同様にMOSキャパシタおよびMOSゲート型PHEMTを作製した。
本実施例7では、実施例1のAlN層に代えて、厚さ1nmのGaN層を用いた例を説明する。実施例1におけるAlN層をGaN層に代えた他は実施例1と同様に半導体基板を作製した。なお、GaN層の成長温度は425℃とした。
Claims (14)
- 基板、化合物半導体層、第1絶縁層および第2絶縁層が、前記基板、前記化合物半導体層、前記第1絶縁層、前記第2絶縁層の順に位置する半導体基板であって、
前記第1絶縁層が、全ての金属原子、B原子、Si原子、As原子、Te原子およびAt原子からなる群から選択された1以上の第1原子と、酸素原子および窒素原子とを含み、
前記第2絶縁層が、全ての金属原子からなる群から選択された1以上の第2原子と、酸素原子および窒素原子とを含み、
前記化合物半導体層が、金属原子である第3原子と、非金属原子である第4原子とを含み、
前記酸素原子および前記窒素原子が、前記第2絶縁層の表面から前記基板に向かう深さ方向において、前記第2絶縁層、前記第1絶縁層および前記化合物半導体層の中で、連続的に分布し、
前記深さ方向に沿った前記窒素原子の単位体積当たり原子数が、前記第1絶縁層の中で極大を示し、
前記深さ方向に沿った前記第3原子および第4原子の単位体積当たり合計原子数が、前記化合物半導体層の中で最大となり、
前記化合物半導体層と前記第1絶縁層との界面である第1界面における前記酸素原子の単位体積当たり原子数が、前記第1絶縁層と前記第2絶縁層との界面である第2界面における前記酸素原子の単位体積当たり原子数より小さい
半導体基板。 - 前記第1原子および前記第2原子が、同種元素からなる絶縁層構成金属原子であり、
前記絶縁層構成金属原子、前記酸素原子および前記窒素原子が、前記深さ方向において、前記第2絶縁層、前記第1絶縁層および前記化合物半導体層の中で、連続的に分布する
請求項1に記載の半導体基板。 - 前記第1界面における前記絶縁層構成金属原子の単位体積当たり原子数が、前記第2界面における前記絶縁層構成金属原子の単位体積当たり原子数より小さい
請求項2に記載の半導体基板。 - 前記第1界面における前記第3原子の単位体積当たり原子数が、前記第2界面における前記第3原子の単位体積当たり原子数より大きく、
前記第1界面における前記第4原子の単位体積当たり原子数が、前記第2界面における前記第4原子の単位体積当たり原子数より大きい
請求項1から請求項3の何れか一項に記載の半導体基板。 - 前記深さ方向に沿った前記第2絶縁層の中の前記窒素原子の単位体積当たり原子数が、深さが増すに連れ増加する
請求項1から請求項4の何れか一項に記載の半導体基板。 - 前記深さ方向に沿った前記化合物半導体層の中の前記窒素原子の単位体積当たり原子数が、深さが増すに連れ減少する
請求項1から請求項5の何れか一項に記載の半導体基板。 - 前記第3原子および前記第4原子が、前記第1絶縁層の中に存在し、
前記深さ方向に沿った前記第1絶縁層の中の前記第3原子および前記第4原子の単位体積当たり原子数が、深さが増すに連れ増加する
請求項1から請求項6の何れか一項に記載の半導体基板。 - 前記第1原子が、Al原子、Ga原子、In原子、Ti原子、Zr原子、Hf原子、Gd原子、Er原子、B原子、Si原子、As原子、Te原子およびAt原子からなる群から選択された1以上の原子であり、
前記第2原子が、Al原子、Ga原子、In原子、Ti原子、Zr原子、Hf原子、Gd原子およびEr原子からなる群から選択された1以上の原子である
請求項1から請求項7の何れか一項に記載の半導体基板。 - 前記第1絶縁層および前記第2絶縁層が、水素原子を含み、
前記第1絶縁層における水素原子の単位体積当たり原子数の最大値が、前記第2絶縁層における水素原子の単位体積当たり原子数の最大値より大きい
請求項1から請求項8の何れか一項に記載の半導体基板。 - 前記第1絶縁層が、基板温度を250℃以上450℃以下とするCVD法により形成されたものであり、
前記第2絶縁層が、前記第1絶縁層を形成後大気開放することなく連続にALD法により形成されたものである
請求項1から請求項9の何れか一項に記載の半導体基板。 - 基板上に化合物半導体層を形成するステップと、
前記化合物半導体層の上に、第1ガスおよび第2ガスを原料ガスとし、基板温度を250℃以上450℃以下とするCVD法により、第1絶縁層を形成するステップと、
前記第1絶縁層を形成した後、第3ガスおよび第4ガスを用い、ALD法により、第2絶縁層を形成するステップと、を有し、
前記第1ガスが、気体の第1原子の化合物を含むガスであり、
前記第2ガスが、気体の窒素化合物および窒素分子からなる群から選択された1以上のガスであり、
前記第3ガスが、気体の第2原子の化合物を含むガスであり、
前記第4ガスが、気体の酸素化合物および酸素分子からなる群から選択された1以上のガスであり、
前記第1原子が、全ての金属原子、B原子、Si原子、As原子、Te原子およびAt原子からなる群から選択された1以上の原子であり、
前記第2原子が、全ての金属原子からなる群から選択された1以上の原子である
半導体基板の製造方法。 - 前記第1絶縁層を形成した後、大気開放することなく連続に、前記第2絶縁層を形成する
請求項11に記載の半導体基板の製造方法。 - 請求項1から請求項10の何れか一項に記載の半導体基板と、ソース電極、ドレイン電極およびゲート電極と、を有し、
前記化合物半導体層、前記第1絶縁層、前記第2絶縁層および前記ゲート電極が、前記化合物半導体層、前記第1絶縁層、前記第2絶縁層、前記ゲート電極の順に位置し、
前記ソース電極および前記ドレイン電極が、平面配置において前記ゲート電極を挟んで位置するとともに、前記化合物半導体層に電気的に接続された
電子デバイス。 - 前記化合物半導体層がリセス部を有し、
前記ゲート電極が前記リセス部に位置する
請求項13に記載の電子デバイス。
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