JP2013004545A - 半導体基板の製造方法および半導体基板 - Google Patents
半導体基板の製造方法および半導体基板 Download PDFInfo
- Publication number
- JP2013004545A JP2013004545A JP2011130726A JP2011130726A JP2013004545A JP 2013004545 A JP2013004545 A JP 2013004545A JP 2011130726 A JP2011130726 A JP 2011130726A JP 2011130726 A JP2011130726 A JP 2011130726A JP 2013004545 A JP2013004545 A JP 2013004545A
- Authority
- JP
- Japan
- Prior art keywords
- compound semiconductor
- layer
- semiconductor layer
- substrate
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 92
- 239000000758 substrate Substances 0.000 title claims abstract description 89
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 150000001875 compounds Chemical class 0.000 claims abstract description 60
- 238000004140 cleaning Methods 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 31
- 239000007788 liquid Substances 0.000 claims abstract description 28
- 229940065287 selenium compound Drugs 0.000 claims abstract description 12
- 150000003343 selenium compounds Chemical class 0.000 claims abstract description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 18
- 125000003748 selenium group Chemical group *[Se]* 0.000 claims description 10
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 abstract description 14
- 238000002161 passivation Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 98
- 230000005669 field effect Effects 0.000 description 32
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 30
- 239000011669 selenium Substances 0.000 description 19
- 125000004429 atom Chemical group 0.000 description 12
- 238000000231 atomic layer deposition Methods 0.000 description 12
- 239000000243 solution Substances 0.000 description 10
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 9
- 229910052717 sulfur Inorganic materials 0.000 description 9
- 239000011593 sulfur Substances 0.000 description 9
- 239000002184 metal Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000921 elemental analysis Methods 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- AOPJVJYWEDDOBI-UHFFFAOYSA-N azanylidynephosphane Chemical compound P#N AOPJVJYWEDDOBI-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
- H01L21/02178—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing aluminium, e.g. Al2O3
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28264—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being a III-V compound
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/517—Insulating materials associated therewith the insulating material comprising a metallic compound, e.g. metal oxide, metal silicate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66522—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with an active layer made of a group 13/15 material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02387—Group 13/15 materials
- H01L21/02392—Phosphides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Thin Film Transistor (AREA)
- Recrystallisation Techniques (AREA)
Abstract
【解決手段】エピタキシャル成長により化合物半導体層をベース基板上に形成するステップと、前記化合物半導体層の表面をセレン化合物を含む洗浄液で洗浄するステップと、前記化合物半導体層の上に絶縁層を形成するステップと、を有する半導体基板の製造方法を提供する。前記セレン化合物として、セレン酸化物が挙げられる。前記セレン酸化物として、H2SeO3が挙げられる。前記洗浄液が、水、アンモニアおよびエタノールからなる群から選択された1以上の物質をさらに含んでもよい。前記化合物半導体層の表面がInxGa1−xAs(0≦x≦1)からなる場合、前記絶縁層がAl2O3からなるものであることが好ましく、Al2O3は、ALD法により形成されることが好ましい。
【選択図】図1
Description
前記した電界効果トランジスタ200と同様な電界効果トランジスタを実際に製造し、各種の分析と性能評価を実施した。ベース基板102として、InP(100)基板とInP(111)A基板の二種類の基板を用いた。各々のInP基板上に、化合物半導体層104としてp形InGaAs層をエピタキシャル成長した。p型InGaAs層は、厚さを0.5μmとし、p型不純物原子の濃度を3×1016atoms/cm3とした。ALD法により厚さ6nmのAl2O3保護層を形成した後、ソース・ドレイン領域にn型不純物原子としてSiをイオン注入した。Siのイオン注入量が2×1014atoms/cm2となるようにイオン電流を調整した。窒素雰囲気での600℃、10秒の加熱により不純物原子を活性化し、Al2O3保護層を緩衝フッ酸によるエッチングにより除去した。
Claims (10)
- エピタキシャル成長により化合物半導体層をベース基板上に形成するステップと、
前記化合物半導体層の表面をセレン化合物を含む洗浄液で洗浄するステップと、
前記化合物半導体層の上に絶縁層を形成するステップと、を有する
半導体基板の製造方法。 - 前記セレン化合物が、セレン酸化物である
請求項1に記載の半導体基板の製造方法。 - 前記セレン酸化物が、H2SeO3である
請求項2に記載の半導体基板の製造方法。 - 前記洗浄液が、水、アンモニアおよびエタノールからなる群から選択された1以上の物質をさらに含む
請求項1から請求項3の何れか一項に記載の半導体基板の製造方法。 - 前記洗浄液中のセレン化合物のモル濃度が、7×10―3mol/l以上7×10―1mol/l以下である
請求項1から請求項4の何れか一項に記載の半導体基板の製造方法。 - 前記化合物半導体層の表面がInxGa1−xAs(0≦x≦1)からなり、
前記絶縁層がAl2O3からなる
請求項1から請求項5の何れか一項に記載の半導体基板の製造方法。 - 前記絶縁層を形成するステップが、ALD法により前記絶縁層を形成するステップである
請求項1から請求項6の何れか一項に記載の半導体基板の製造方法。 - 化合物半導体層と、
前記化合物半導体層に接する絶縁層と、を有し、
前記化合物半導体層と前記絶縁層との界面にセレン原子を有する
半導体基板。 - 前記化合物半導体層と前記絶縁層との界面における前記セレン原子の面密度が、1×1014atoms/cm2以下である
請求項8に記載の半導体基板。 - 前記化合物半導体層の表面がInxGa1−xAs(0≦x≦1)からなり、
前記絶縁層がAl2O3からなる
請求項8または請求項9に記載の半導体基板。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011130726A JP2013004545A (ja) | 2011-06-10 | 2011-06-10 | 半導体基板の製造方法および半導体基板 |
CN201280024373.1A CN103548126B (zh) | 2011-06-10 | 2012-06-08 | 半导体基板的制造方法及半导体基板 |
TW101120840A TWI549194B (zh) | 2011-06-10 | 2012-06-08 | 半導體基板之製造方法及半導體基板 |
KR1020137030880A KR20140048122A (ko) | 2011-06-10 | 2012-06-08 | 반도체 기판의 제조 방법 및 반도체 기판 |
PCT/JP2012/003768 WO2012169208A1 (ja) | 2011-06-10 | 2012-06-08 | 半導体基板の製造方法および半導体基板 |
US14/099,425 US9184240B2 (en) | 2011-06-10 | 2013-12-06 | Method of producing semiconductor wafer, and semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011130726A JP2013004545A (ja) | 2011-06-10 | 2011-06-10 | 半導体基板の製造方法および半導体基板 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2013004545A true JP2013004545A (ja) | 2013-01-07 |
Family
ID=47295791
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011130726A Ceased JP2013004545A (ja) | 2011-06-10 | 2011-06-10 | 半導体基板の製造方法および半導体基板 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9184240B2 (ja) |
JP (1) | JP2013004545A (ja) |
KR (1) | KR20140048122A (ja) |
CN (1) | CN103548126B (ja) |
TW (1) | TWI549194B (ja) |
WO (1) | WO2012169208A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014187238A (ja) * | 2013-03-25 | 2014-10-02 | Toyoda Gosei Co Ltd | Mis型半導体装置の製造方法 |
WO2014192311A1 (ja) * | 2013-05-31 | 2014-12-04 | 住友化学株式会社 | 半導体基板、半導体基板の製造方法および電子デバイス |
JP2017501303A (ja) * | 2013-12-18 | 2017-01-12 | エーエスエム アイピー ホールディング ビー.ブイ. | 硫黄含有薄膜 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107706267A (zh) * | 2017-07-24 | 2018-02-16 | 晶科能源有限公司 | 一种硅片表面钝化方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06140375A (ja) * | 1992-10-22 | 1994-05-20 | Nec Corp | 化合物半導体の表面処理方法 |
JPH08250459A (ja) * | 1995-03-08 | 1996-09-27 | Nippon Telegr & Teleph Corp <Ntt> | 半導体のエッチング方法およびそれを用いた薄膜形成方法 |
JP2004342733A (ja) * | 2003-05-14 | 2004-12-02 | Hitachi Ltd | 半導体装置の製造方法及びその製造方法による半導体装置 |
JP2009260325A (ja) * | 2008-03-26 | 2009-11-05 | Univ Of Tokyo | 半導体基板、半導体基板の製造方法および半導体装置 |
US20100261304A1 (en) * | 2009-04-09 | 2010-10-14 | State of Oregon acting by and through the State Board of Higher Education on behalf of Oregon | Solution-based process for making inorganic materials |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3915765A (en) * | 1973-06-25 | 1975-10-28 | Bell Telephone Labor Inc | MBE technique for fabricating semiconductor devices having low series resistance |
US5616947A (en) * | 1994-02-01 | 1997-04-01 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device having an MIS structure |
EP2306497B1 (en) * | 2009-10-02 | 2012-06-06 | Imec | Method for manufacturing a low defect interface between a dielectric and a III/V compound |
-
2011
- 2011-06-10 JP JP2011130726A patent/JP2013004545A/ja not_active Ceased
-
2012
- 2012-06-08 WO PCT/JP2012/003768 patent/WO2012169208A1/ja active Application Filing
- 2012-06-08 CN CN201280024373.1A patent/CN103548126B/zh not_active Expired - Fee Related
- 2012-06-08 TW TW101120840A patent/TWI549194B/zh not_active IP Right Cessation
- 2012-06-08 KR KR1020137030880A patent/KR20140048122A/ko not_active Application Discontinuation
-
2013
- 2013-12-06 US US14/099,425 patent/US9184240B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06140375A (ja) * | 1992-10-22 | 1994-05-20 | Nec Corp | 化合物半導体の表面処理方法 |
JPH08250459A (ja) * | 1995-03-08 | 1996-09-27 | Nippon Telegr & Teleph Corp <Ntt> | 半導体のエッチング方法およびそれを用いた薄膜形成方法 |
JP2004342733A (ja) * | 2003-05-14 | 2004-12-02 | Hitachi Ltd | 半導体装置の製造方法及びその製造方法による半導体装置 |
JP2009260325A (ja) * | 2008-03-26 | 2009-11-05 | Univ Of Tokyo | 半導体基板、半導体基板の製造方法および半導体装置 |
US20100261304A1 (en) * | 2009-04-09 | 2010-10-14 | State of Oregon acting by and through the State Board of Higher Education on behalf of Oregon | Solution-based process for making inorganic materials |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014187238A (ja) * | 2013-03-25 | 2014-10-02 | Toyoda Gosei Co Ltd | Mis型半導体装置の製造方法 |
WO2014192311A1 (ja) * | 2013-05-31 | 2014-12-04 | 住友化学株式会社 | 半導体基板、半導体基板の製造方法および電子デバイス |
JPWO2014192311A1 (ja) * | 2013-05-31 | 2017-02-23 | 住友化学株式会社 | 半導体基板、半導体基板の製造方法および電子デバイス |
US9755040B2 (en) | 2013-05-31 | 2017-09-05 | Sumitomo Chemical Company, Limited | Semiconductor wafer, method of producing semiconductor wafer and electronic device |
JP2017501303A (ja) * | 2013-12-18 | 2017-01-12 | エーエスエム アイピー ホールディング ビー.ブイ. | 硫黄含有薄膜 |
US10199213B2 (en) | 2013-12-18 | 2019-02-05 | Asm Ip Holding B.V. | Sulfur-containing thin films |
US10553424B2 (en) | 2013-12-18 | 2020-02-04 | Asm Ip Holding B.V. | Sulfur-containing thin films |
US10854444B2 (en) | 2013-12-18 | 2020-12-01 | Asm Ip Holding B.V. | Sulfur-containing thin films |
Also Published As
Publication number | Publication date |
---|---|
US20140091433A1 (en) | 2014-04-03 |
TWI549194B (zh) | 2016-09-11 |
TW201306135A (zh) | 2013-02-01 |
CN103548126B (zh) | 2016-06-22 |
US9184240B2 (en) | 2015-11-10 |
CN103548126A (zh) | 2014-01-29 |
KR20140048122A (ko) | 2014-04-23 |
WO2012169208A1 (ja) | 2012-12-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7434679B2 (ja) | ノーマリーオフiii-窒化物トランジスタ | |
JP5545713B2 (ja) | 半導体基板、半導体基板の製造方法および電子デバイス | |
US9130026B2 (en) | Crystalline layer for passivation of III-N surface | |
US7456443B2 (en) | Transistors having buried n-type and p-type regions beneath the source region | |
JP4224737B2 (ja) | 半導体素子 | |
Huang et al. | Low-Leakage-Current AlN/GaN MOSHFETs Using $\hbox {Al} _ {2}\hbox {O} _ {3} $ for Increased 2DEG | |
CN102709321A (zh) | 增强型开关器件及其制造方法 | |
JP6272612B2 (ja) | 半導体基板、半導体基板の製造方法および電子デバイス | |
Huang et al. | Vertically stacked strained 3-GeSn-nanosheet pGAAFETs on Si using GeSn/Ge CVD epitaxial growth and the optimum selective channel release process | |
US9064946B1 (en) | III-V FET device with overlapped extension regions using gate last | |
US10134908B2 (en) | Semiconductor device and manufacturing method thereof | |
KR20140027938A (ko) | 반도체 기판, 전계 효과 트랜지스터, 반도체 기판의 제조 방법, 및 전계 효과 트랜지스터의 제조 방법 | |
US9184240B2 (en) | Method of producing semiconductor wafer, and semiconductor wafer | |
US9553181B2 (en) | Crystalline-amorphous transition material for semiconductor devices and method for formation | |
US8859410B2 (en) | Gate stack of boron semiconductor alloy, polysilicon and high-k gate dielectric for low voltage applications | |
JP2009076673A (ja) | Iii族窒化物半導体を用いた電界効果トランジスタ | |
JP2006060071A (ja) | GaN系電界効果トランジスタ | |
JP2011166005A (ja) | 窒化物半導体を用いた半導体装置およびその製造方法 | |
Huang et al. | Investigation of AlGaN/GaN/AlGaN metal-oxide-semiconductor high electron mobility transistors | |
JP2013084951A (ja) | 半導体装置および半導体装置の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20140324 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150602 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150728 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160301 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160428 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160802 |
|
A045 | Written measure of dismissal of application [lapsed due to lack of payment] |
Free format text: JAPANESE INTERMEDIATE CODE: A045 Effective date: 20161220 |