JPWO2014098013A1 - Transparent electrode for touch panel, touch panel, and display device - Google Patents

Abstract

A transparent electrode for a touch panel comprising an AgAl layer containing 50 atm% or less of aluminum and a conductive layer mainly composed of silver provided adjacent to the AgAl layer is formed.

Description

  The present invention relates to a transparent electrode for a touch panel, a touch panel including the transparent electrode for a touch panel, and a display device.

  There are various types of touch panels arranged on the display surface side of the display panel, such as a resistance film type, a surface type capacitance type, a projection type capacitance type, an optical type, and an ultrasonic type. The projected capacitive type has the feature that it can input multiple points, and is being put to practical use in smartphones and the like.

  In the touch panel in which electrodes are arranged over the entire surface of the panel surface as in the projected capacitive method, the display is arranged via the touch panel by configuring the electrodes using a transparent conductive material. The visibility of the image is secured. As such a transparent electrode for a touch panel, a metal oxide such as indium tin oxide (ITO) has been mainly used. However, although metal oxides such as ITO are excellent in light transmittance, the conductivity is not sufficient, and a voltage drop tends to occur near the center of the panel. In addition, when the resistance value is to be kept low, a certain amount of thickness is required. Therefore, when the electrode has a pattern as in the projected capacitance method, this pattern is easily visible, and as a result, the base and The visibility of the displayed image becomes lower.

  Therefore, in recent years, a configuration using metal nanowires having higher conductivity than ITO has been proposed as a transparent electrode for a touch panel (see, for example, Patent Document 1).

JP 2012-33466 A

  However, in a transparent electrode for a touch panel using metal nanowires, if the amount of metal nanowires added is increased to reduce resistance, the visibility of the underlying display image decreases due to light scattering of the metal nanowires. have.

  Therefore, the present invention provides a transparent electrode for a touch panel that has sufficient conductivity and visibility, a touch panel that is improved in visibility by using this transparent electrode for a touch panel, and a display device. .

The transparent electrode for a touch panel of the present invention includes an AgAl layer containing 50 atm% or less of aluminum, and a conductive layer mainly composed of silver provided adjacent to the AgAl layer.
The touch panel of this invention is equipped with the said transparent electrode for touch panels.
Moreover, the display device of the present invention includes the touch panel and a display panel disposed on the touch panel.

According to the transparent electrode for a touch panel of the present invention, a conductive layer mainly composed of silver is provided adjacent to an AgAl layer containing 50 atm% or less of aluminum. By forming a conductive layer mainly composed of silver on the AgAl layer, interaction between silver atoms and the compound constituting the AgAl layer can be obtained, and aggregation of silver is suppressed, and it is thin but uniform. A thick conductive layer is obtained.
Therefore, in the transparent electrode using silver, it becomes possible to achieve both improved conductivity and improved visibility. Moreover, the touchscreen and display apparatus which are excellent in electroconductivity and visibility can be comprised using this transparent electrode.

  According to the present invention, it is possible to provide a transparent electrode for a touch panel, a touch panel, and a display device that have both conductivity and visibility.

It is a figure which shows schematic structure of the transparent electrode for touchscreens of 1st Embodiment. It is a figure which shows schematic structure of the transparent electrode for touchscreens of 2nd Embodiment. It is a figure which shows schematic structure of the transparent electrode for touchscreens of 3rd Embodiment. It is a perspective view which shows schematic structure of the touchscreen of 4th Embodiment. It is a top view which shows the electrode structure of the transparent electrode for touchscreens used for the touchscreen of 4th Embodiment. It is a schematic diagram which shows the planar arrangement | positioning of the electrode part of the touchscreen of 4th Embodiment. It is a cross-sectional schematic diagram of the touch panel of 4th Embodiment corresponding to the AA cross section shown in FIG. It is a cross-sectional schematic diagram of the modification of the touchscreen of 4th Embodiment corresponding to the AA cross section shown in FIG. It is a cross-sectional schematic diagram of the touch panel of 5th Embodiment corresponding to the AA cross section shown in FIG. It is a cross-sectional schematic diagram of the modification of the touch panel of 5th Embodiment corresponding to the AA cross section shown in FIG. It is a top view which shows the electrode structure of the transparent electrode for touchscreens used for the touchscreen of 6th Embodiment. It is an enlarged view of the electrode structure of the transparent electrode for touchscreens shown in FIG. It is a cross-sectional schematic diagram of the touch panel of 6th Embodiment corresponding to the BB cross section shown in FIG. It is a perspective view which shows the structure of the display apparatus of 7th Embodiment.

Examples of the best mode for carrying out the present invention will be described below, but the present invention is not limited to the following examples.
The description will be given in the following order.
1. Transparent electrode for touch panel (first embodiment)
2. Transparent electrode for touch panel (second embodiment)
3. Transparent electrode for touch panel (third embodiment)
4). Touch panel (fourth embodiment: configuration using two transparent substrates)
5. Touch panel (fifth embodiment: configuration in which conductive layers are provided on both sides of a transparent substrate)
6). Touch panel (sixth embodiment: configuration in which a conductive layer is provided on one side of a transparent substrate)
7). Display device (seventh embodiment: configuration using a touch panel)

<1. Transparent electrode for touch panel (first embodiment)>
A first embodiment of the present invention will be described.
In FIG. 1, the schematic block diagram (sectional drawing) of the transparent electrode for touchscreens of 1st Embodiment is shown. As shown in FIG. 1, the transparent electrode 10 for a touch panel includes an AgAl layer 12 and a conductive layer 13 and is formed on a transparent substrate 11. The transparent electrode 10 for a touch panel has a conductive layer 13 formed adjacent to one surface of an AgAl layer 12 and includes a transparent substrate 11 on the other surface side of the AgAl layer 12.

  Below, a detailed structure is demonstrated in order of the transparent substrate 11, the AgAl layer 12, and the conductive layer 13 about the transparent electrode 10 for touchscreens of this example. In addition, in the transparent electrode 10 for touchscreens of this example, transparent means that the light transmittance in wavelength 550nm is 50% or more.

[Transparent substrate]
The transparent substrate 11 on which the touch panel transparent electrode 10 is formed may also serve as a front panel of the display panel. Examples of such a transparent substrate 11 include glass, quartz, and a transparent resin film.

  Examples of the glass include silica glass, soda-lime silica glass, lead glass, borosilicate glass, and alkali-free glass. The surface of these glass materials is subjected to physical treatment such as polishing as necessary from the viewpoint of adhesion to the transparent electrode 10 for touch panel, durability, and smoothness, or is made of an inorganic or organic material. A film or a hybrid film combining these films is formed.

  Examples of the resin film include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyethylene, polypropylene, cellophane, cellulose diacetate, cellulose triacetate (TAC), cellulose acetate butyrate, cellulose acetate propionate ( CAP), cellulose esters such as cellulose acetate phthalate, cellulose nitrate or derivatives thereof, polyvinylidene chloride, polyvinyl alcohol, polyethylene vinyl alcohol, syndiotactic polystyrene, polycarbonate, norbornene resin, polymethylpentene, polyether ketone, polyimide , Polyethersulfone (PES), polyphenylene sulfide, polysulfones, Cycloolefin resins such as polyether imide, polyether ketone imide, polyamide, fluororesin, nylon, polymethyl methacrylate, acrylic or polyarylate, Arton (trade name, manufactured by JSR) or Apel (trade name, manufactured by Mitsui Chemicals) Is mentioned.

On the surface of the resin film, a film made of an inorganic material or an organic material or a hybrid film combining these films may be formed. Such coatings and hybrid coatings have a water vapor transmission rate (25 ± 0.5 ° C., relative humidity 90 ± 2% RH) measured by a method according to JIS-K-7129-1992 of 0.01 g / ( m ² · 24 hours) or less of a barrier film (also referred to as a barrier film or the like) is preferable. Furthermore, the oxygen permeability measured by a method according to JIS-K-7126-1987 is 10 ⁻³ ml / (m ² · 24 hours · atm) or less, and the water vapor permeability is 10 ⁻⁵ g / (m ² · 24 hours) or less high barrier properties are preferred.

  As a material for forming the barrier film as described above, a material having a function of suppressing intrusion of elements such as moisture and oxygen causing deterioration of the resin film is used. For example, silicon oxide, silicon dioxide, silicon nitride, or the like can be used. Furthermore, in order to improve the brittleness of the barrier film, it is more preferable to have a laminated structure of these inorganic layers and layers (organic layers) made of an organic material. Although there is no restriction | limiting in particular about the lamination | stacking order of an inorganic layer and an organic layer, It is preferable to laminate | stack both alternately several times.

  The method for forming the barrier film is not particularly limited. For example, the vacuum deposition method, the sputtering method, the reactive sputtering method, the molecular beam epitaxy method, the cluster ion beam method, the ion plating method, the plasma polymerization method, the atmospheric pressure plasma weighting. A combination method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used. In particular, the atmospheric pressure plasma polymerization method described in JP-A-2004-68143 can be preferably used.

[AgAl layer]
The AgAl layer 12 includes silver (Ag) and aluminum (Al), and includes 50 atm% or less of Al. The AgAl layer 12 is a layer formed adjacent to the conductive layer 13. By forming the AgAl layer 12 in contact with the conductive layer 13, the diffusion distance of silver atoms on the surface of the AgAl layer 12 due to the interaction between silver, which is the main component of the conductive layer 13, and Al constituting the AgAl layer 12. Decreases and aggregation of silver is suppressed. For this reason, generally, a thin silver layer that tends to be isolated in an island shape due to growth by a nuclear growth type (Volumer-Weber: VW type) is transformed into a single layer growth type (Frank-van der Merwe: FM type). It is formed. Therefore, by forming the conductive layer 13 mainly composed of silver in contact with the AgAl layer 12, the conductive layer 13 having a uniform thickness can be obtained although it is thin.

  In the AgAl layer 12, when the Al content exceeds 50 atm%, the Al content is excessively increased and flatness and uniformity are deteriorated. Since Al easily oxidizes, the influence of Al oxidation becomes dominant on the AgAl layer 12 when the Al content increases. Specifically, when Al is oxidized, the Al oxide grows due to the growth of the Al oxide, and the AgAl layer 12 has protrusions and holes. For this reason, the film uniformity of the AgAl layer 12 is lowered, and light scattering and the like become remarkable. Therefore, when the Al content increases, the optical influence due to the shape change of the AgAl layer 12 due to the oxidation of Al becomes dominant, and the optical characteristics of the AgAl layer 12, particularly the light transmission and visibility are reduced. To do.

  For this reason, the Al content is preferably 50 atm% or less. Further, the content of Al is preferably as small as possible within a range in which the aggregation suppressing effect of the conductive layer 13 containing Ag as a main component can be exhibited. For example, the Al content is preferably 0.5 atm% or more.

  As the AgAl layer 12, a metal other than Al and Ag may be added. As these metals, for example, magnesium (Mg), copper (Cu), indium (In), iridium (Ir), gold (Au), lithium (Li), or the like may be added.

  Further, the AgAl layer 12 has a thickness that does not hinder the light transmittance of the transparent electrode 10 for touch panel, and is preferably 5 nm or less, for example. Further, as the thickness of the AgAl layer 12 is increased, the properties of the conductive layer 13 are improved and the conductivity of the transparent electrode 10 for touch panel is improved. For this reason, the AgAl layer 12 needs to be thick enough to ensure the conductivity of the transparent electrode 10 for a touch panel. For example, the AgAl layer 12 has a thickness of about 0.5 nm and is a continuous film. Is preferred.

  In addition, although the formation method of such an AgAl layer 12 is not specifically limited, For example, a vapor deposition method (EB, resistance heating) and a sputtering method can be used preferably.

[Conductive layer]
The conductive layer 13 is a layer composed mainly of silver, is composed of silver or an alloy composed mainly of silver, and is a layer formed adjacent to the AgAl layer 12. Examples of the method for forming the conductive layer 13 include a method using a wet process such as a coating method, an ink jet method, a coating method, a dip method, a vapor deposition method (resistance heating, EB method, etc.), a sputtering method, a CVD method, and the like. Examples include a method using a dry process. Of these, the vapor deposition method is preferably applied. In addition, the conductive layer 13 is formed on the AgAl layer 12 and is sufficiently conductive even without a high-temperature annealing treatment after the formation. An annealing treatment or the like may be performed.

  As an example, an alloy mainly composed of silver (Ag) constituting the conductive layer 13 is silver magnesium (AgMg), silver copper (AgCu), silver palladium (AgPd), silver palladium copper (AgPdCu), silver indium (AgIn). Etc.

  The conductive layer 13 as described above may have a configuration in which silver or an alloy layer mainly composed of silver is divided into a plurality of layers as necessary.

  Furthermore, it is preferable to set the thickness of the conductive layer 13 so that the total thickness of the conductive layer 13 and the AgAl layer 12 is 15 nm or less in order not to impair the light transmittance of the transparent electrode 10 for a touch panel. In particular, the total thickness is preferably 12 nm or less. When the total thickness of the conductive layer 13 and the AgAl layer 12 is 15 nm or less, the absorption component and the reflection component of the layer are kept low, and the light transmittance of the transparent electrode 10 for a touch panel is maintained, which is preferable. Furthermore, the light transmittance of the transparent electrode 10 for touch panels further improves by making the total thickness of the conductive layer 13 and the AgAl layer 12 12 nm or less. Moreover, if the thickness of the conductive layer 13 is at least 3 nm, the conductivity of the transparent electrode for touch panel 10 is ensured.

  Moreover, it is preferable that the above-mentioned conductive layer 13 and AgAl layer 12 have an electrode pattern. As electrode patterns of the conductive layer 13 and the AgAl layer 12, for example, it is preferable that a plurality of electrode patterns are formed in a matrix. The matrix electrode pattern has a plurality of x electrode patterns or y electrode patterns, and each x electrode pattern or y electrode pattern is spaced from each other with each extending in the x or y direction. Arranged in parallel. Each of these x electrode patterns or y electrode patterns may have a shape in which rhombuses or other pattern portions arranged in the x direction are linearly connected in the x direction or the y direction. Moreover, even if the wiring pattern which consists of the conductive layer 13 and the AgAl layer 12 is connected to the edge part of each x electrode pattern and y electrode pattern, and this wiring pattern is pulled out from the peripheral region on the transparent substrate 11 to an edge, Good.

  Moreover, the transparent electrode 10 for touch panels may be configured to have either the x electrode pattern or the y electrode pattern, or may be configured to include both the x electrode pattern and the y electrode pattern. Furthermore, the electrode pattern is not limited to the matrix shape, and may be other patterns.

[Protective layer]
The transparent electrode 10 for a touch panel having a laminated structure including the AgAl layer 12 and the conductive layer 13 provided adjacent to the AgAl layer 12 includes a protective layer on the side of the conductive layer 13 that is not in contact with the AgAl layer 12. It may be. In this case, it is preferable that the protective film has light transmittance so as not to impair the light transmittance of the transparent electrode 10 for a touch panel.

  The protective layer is configured using a plate-like or film-like member that covers the conductive layer 13 of the transparent electrode 10 for a touch panel, or an inorganic material, an organic material, or a resin material that covers the conductive layer 13. This protective layer is provided so as to cover at least the conductive layer 13 in the transparent electrode 10 for a touch panel.

  As a plate-like or film-like member constituting the protective layer, the same member as the above-described transparent substrate 11 can be used. Especially, since the transparent electrode 10 for touch panels can be reduced in thickness, a thin resin film can be used preferably.

Furthermore, as with the transparent substrate 11, the resin film may be formed with a coating made of an inorganic material or an organic material, or a hybrid coating combining these coatings. The film has an oxygen permeability of 1 × 10 ⁻³ ml / (m ² · 24 h · atm) or less measured by a method according to JIS-K-7126-1987, and a method according to JIS-K-7129-1992. The water vapor permeability (25 ± 0.5 ° C., relative humidity (90 ± 2)% RH) measured in (1) is preferably 1 × 10 ⁻³ g / (m ² · 24 h) or less.

  Moreover, as a protective film comprised using an inorganic material, an organic material, or a resin material, it is a material which has a function which suppresses especially the penetration | invasion of the substance which brings about deterioration of the conductive layer 13 and AgAl layer 12, such as a water | moisture content and oxygen. Preferably, it is configured. As such a material, for example, an inorganic material such as silicon oxide, silicon dioxide, silicon nitride, silicon oxynitride, or silicon oxycarbide is used. Further, in order to improve the brittleness of the sealing film, a laminated structure may be formed using a film made of these inorganic materials or a film made of organic materials. In addition, a preservative that prevents corrosion of the conductive layer 13 may be added to the protective layer 14.

  The method for forming these films is not particularly limited. For example, vacuum deposition, sputtering, reactive sputtering, molecular beam epitaxy, cluster ion beam, ion plating, plasma polymerization, atmospheric pressure plasma A combination method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used.

[Effect of transparent electrode for touch panel]
The touch panel transparent electrode 10 configured as described above has a configuration in which a conductive layer 13 mainly composed of silver is provided adjacent to the AgAl layer 12. Thus, when the conductive layer 13 is formed adjacent to the AgAl layer 12, silver atoms constituting the conductive layer 13 interact with Al constituting the AgAl layer 12, and silver atoms on the surface of the AgAl layer 12. The diffusion distance is reduced and silver aggregation is suppressed. For this reason, in general, a thin silver layer that tends to be isolated in an island shape due to the growth of the nuclear growth type (Volumer-Weber: VW type) is caused by the growth of the single layer growth type (Frank-van der Merwe: FM type). Will be formed. Therefore, although it is thin, the conductive layer 13 having a uniform thickness can be obtained.

  As a result of the above, the conductive layer 13 is obtained which has a thin and uniform thickness on the upper part of the AgAl layer 12 and ensures conductivity while ensuring light transmission. For this reason, the electroconductivity in the transparent electrode 10 for touchscreens using silver can be improved, and also visibility of the display image etc. which become a foundation | substrate can be improved by suppressing light scattering.

<2. Transparent electrode for touch panel (second embodiment)>
Next, a second embodiment of the present invention will be described.
In FIG. 2, the schematic block diagram (sectional drawing) of the transparent electrode for touchscreens of 2nd Embodiment is shown. As shown in FIG. 2, the transparent electrode for touch panel 20 of the second embodiment is different from the transparent electrode for touch panel 10 of the first embodiment shown in FIG. 1 only in that a high refractive index layer 24 is provided. Hereinafter, the detailed description of the same components as those of the first embodiment will be omitted, and the configuration of the transparent electrode for a touch panel of the second embodiment will be described.

  As shown in FIG. 2, the transparent electrode 20 for a touch panel includes a high refractive index layer 24, an AgAl layer 12, and a conductive layer 13 and is formed on the transparent substrate 11. The AgAl layer 12 and the conductive layer 13 have the same configuration as in the first embodiment described above. The transparent electrode 20 for a touch panel includes an AgAl layer 12 formed on one side of the high refractive index layer 24 and a transparent substrate 11 on the other side. The conductive layer 13 is formed adjacent to one surface of the AgAl layer 12.

[High refractive index layer]
The high refractive index layer 24 is a layer having a refractive index (n) of 2.0 or more at a wavelength of 550 nm. The high refractive index layer 24 is a layer made of a metal oxide provided with the AgAl layer 12 sandwiched between the high refractive index layer 24 and the conductive layer 13. A metal oxide is used for such a high refractive index layer 24. For example, titanium dioxide (TiO ₂ : n = 2.3 to 2.4), zirconium oxide (ZrO ₂ : n = 2.4), oxidation Cadmium (CdO: n = 2.49), indium tin oxide (ITO: n = 2.1 to 2.2), hafnium oxide (HfO ₂ : n = 2.1), tantalum pentoxide (Ta ₂ O ₅ : n = 2.16), niobium oxide (Nb ₂ O ₅ : n = 2.2 to 2.4), high refraction generally used for optical films such as cerium oxide (CeO ₂ : n = 2.2) A rate material is used.

[Low refractive index layer]
The touch panel transparent electrode 20 may have a low refractive index layer (not shown) in contact with the high refractive index layer 24. In the configuration shown in FIG. 2, the surface of the high refractive index layer 24 opposite to the surface on which the AgAl layer 12 is formed, that is, the low refractive index layer is provided between the transparent substrate 11 and the high refractive index layer 24. It may be. By having the low refractive index layer in contact with the high refractive index layer 24, the light transmittance of the transparent electrode 20 for a touch panel is further improved.

The low refractive index layer is a layer having a lower refractive index than the high refractive index layer. Furthermore, the refractive index at a wavelength of 550 nm is preferably 0.1 or more lower than the high refractive index layer, and particularly preferably 0.3 or lower than the high refractive index layer. Such a low refractive index layer is made of a material having a low refractive index and light transmittance. For example, a low refractive index material generally used for optical films such as magnesium fluoride (MgF ₂ ), lithium fluoride (LiF), calcium fluoride (CaF ₂ ), and aluminum fluoride (AlF ₃ ) is used.

[Effect of transparent electrode for touch panel]
The touch panel transparent electrode 20 includes a high refractive index layer 24 in addition to the AgAl layer 12 and the conductive layer 13. For this reason, in addition to the effect which the transparent electrode 20 for touchscreens of the above-mentioned 1st Embodiment has, the reflection which arises in the conductive layer 13 which has silver as a main component is suppressed, and the transparent electrode 20 for touchscreens in the transparent electrode 20 for touchscreens Light scattering is further suppressed, and visibility can be further improved.

<3. Transparent electrode for touch panel (third embodiment)>
Next, a third embodiment of the present invention will be described.
In FIG. 3, the schematic block diagram (sectional drawing) of the transparent electrode for touchscreens of 3rd Embodiment is shown. As shown in FIG. 3, the transparent electrode 30 for a touch panel of the third embodiment is only provided with a first high refractive index layer 35 and a second high refractive index layer 34, and the first embodiment shown in FIG. Different from the transparent electrode 10 for touch panel. Hereinafter, the detailed description of the same components as those in the first embodiment and the second embodiment will be omitted, and the configuration of the transparent electrode for a touch panel in the third embodiment will be described.

  As shown in FIG. 3, the transparent electrode 30 for a touch panel includes a second high refractive index layer 34, an AgAl layer 12, a conductive layer 13, and a first high refractive index layer 35 in this order, on the transparent substrate 11. Is formed. The AgAl layer 12 and the conductive layer 13 have the same configuration as in the first embodiment described above.

  The transparent electrode 30 for a touch panel has a conductive layer 13 formed adjacent to one side of the AgAl layer 12 and has a second high refractive index layer 34 on the other side of the AgAl layer 12. Further, the conductive layer 13 includes a first high refractive index layer 35 on the surface side not in contact with the AgAl layer 12. The second high refractive index layer 34 includes the transparent substrate 11 on the surface side not in contact with the AgAl layer 12.

Thus, the transparent electrode 30 for a touch panel has a configuration in which the AgAl layer 12 and the conductive layer 13 are sandwiched between two high refractive index layers including the first high refractive index layer 35 and the second high refractive index layer 34. It is.
Both the first high refractive index layer 35 and the second high refractive index layer 34 are layers having a refractive index of 2.0 or more at a wavelength of 550 nm. As such 1st high refractive index layer 35 and 2nd high refractive index layer 34, the same material as the high refractive index layer in the transparent electrode for touchscreens of the above-mentioned 2nd Embodiment can be used.

  The touch panel transparent electrode 30 may include a low refractive index layer in contact with the first high refractive index layer 35 and the second high refractive index layer 34. The low refractive index layer is preferably formed outside the first high refractive index layer 35 and the second high refractive index layer 34. For example, in the transparent electrode 30 for a touch panel shown in FIG. 3, it is preferable that the touch panel transparent electrode 30 is formed above the first high refractive index layer 35 or between the second high refractive index layer 34 and the transparent substrate 11.

[Effect of transparent electrode for touch panel]
The touch panel transparent electrode 30 has a configuration in which the AgAl layer 12 and the conductive layer 13 are sandwiched between the second high refractive index layer 34 and the first high refractive index layer 35. For this reason, in addition to the effect which the transparent electrode for touchscreens of the above-mentioned 1st Embodiment and 2nd Embodiment has, the transparent electrode 30 for touchscreens is scattering of the light which permeate | transmits the transparent electrode for touchscreens, ie, the transparent electrode for touchscreens Light scattering can be suppressed in both the incident side light and the exit side light. For this reason, the light transmittance of the transparent electrode 30 for touch panels can be improved, and visibility can be improved.

<4. Touch panel (fourth embodiment: configuration using two transparent substrates)>
Next, a fourth embodiment of the present invention will be described. 4th Embodiment demonstrates the touchscreen using the transparent electrode for touchscreens of the above-mentioned 3rd Embodiment. 4 to 7 show a schematic configuration of the touch panel of the present embodiment.

FIG. 4 is a perspective view showing a schematic configuration of the touch panel of the present embodiment. FIG. 5 is a plan view showing an electrode configuration of two transparent electrodes for a touch panel used in the touch panel of the present embodiment. FIG. 6 is a schematic diagram showing a planar arrangement of electrode portions of the touch panel shown in FIGS. 4 and 5. 7 is a schematic cross-sectional view of the touch panel of the present embodiment, corresponding to the AA cross-section shown in FIG.
In addition, the touch panel of this embodiment demonstrates the structure using two transparent electrodes for touch panels, the transparent electrode for 1st touch panels, and the transparent electrode for 2nd touch panels.

[Configuration of touch panel]
A touch panel 40 shown in FIG. 4 is a projected capacitive touch panel. In the touch panel 40, a first substrate 43, a first touch panel transparent electrode 41, a second substrate 45, and a second touch panel transparent electrode 42 are arranged in this order, and the upper portion is covered with a front plate 47. The first touch panel transparent electrode 41 and the second touch panel transparent electrode 42 have the configuration of the touch panel transparent electrode 30 of the third embodiment described with reference to FIG. 3 described above. Therefore, the transparent electrode 41 for the first touch panel and the transparent electrode 42 for the second touch panel have a configuration in which an AgAl layer, a conductive layer, and a high refractive index layer are stacked.

  Hereinafter, details of each main layer constituting the touch panel 40 will be described. In addition, the following description is performed using the schematic plan view of the electrode portion of FIG. 6 together with FIGS. 4-6, the structure of the transparent electrode 41 for the first touch panel and the transparent electrode 42 for the second touch panel shows only the first conductive layer 44 and the second conductive layer 46, and other AgAl layers and high refraction are shown. The illustration of the structure of the rate layer is omitted.

[First substrate, second substrate]
The 1st board | substrate 43 and the 2nd board | substrate 45 are the structures similar to the transparent substrate demonstrated in embodiment of the transparent electrode for touchscreens mentioned above.

[First conductive layer]
The first conductive layer 44 is the conductive layer described in the embodiment of the transparent electrode for a touch panel described above, and is configured as a plurality of x electrode patterns x1, x2,... Patterned on the AgAl layer. Each of the x electrode patterns x1, x2,... Is arranged in parallel with an interval between each other, with each extending in the x direction. Each of these x electrode patterns x1, x2,... Has, for example, a shape in which rhombus pattern portions arranged in the x direction are linearly connected in the x direction in the vicinity of the apex of the rhombus.

  Moreover, x wiring 49x is connected to each x electrode pattern x1, x2,. These x wirings 49 x are wired in the peripheral region on the first substrate 43, and are drawn out to the edge of the first substrate 43. Each of these x wirings 49x may be configured as a first conductive layer 44 mainly composed of silver, similarly to the x electrode patterns x1, x2,. It may be composed of layers.

[Second conductive layer]
The second conductive layer 46 is the conductive layer described in the embodiment of the transparent electrode for touch panel described above, and is configured as a plurality of y electrode patterns y1, y2,... Patterned on the AgAl layer. The y electrode patterns y1, y2,... Are arranged in parallel while being spaced apart from each other in a state of extending in the y direction orthogonal to the x electrode patterns x1, x2,. Each of these y electrode patterns y1, y2,... Has, for example, a shape in which rhombus pattern portions arranged in the y direction are linearly connected in the y direction in the vicinity of the apex of the rhombus.

  Here, as shown in FIG. 6, the rhombus pattern portions constituting the y electrode patterns y1, y2,... Are in contrast to the rhombus pattern portions forming the x electrode patterns x1, x2,. It is arranged at a position that does not overlap in plan view, and has a shape that occupies as large a range as possible without overlapping. Thus, in the central region of the second substrate 45, the x electrode patterns x1, x2,... Constituted by the first conductive layer 44 and the y electrode pattern y1 constituted by the second conductive layer 46. , Y2,... Are hardly visible.

  Each of the y electrode patterns y1, y2,... Is stacked with each of the x electrode patterns x1, x2,. Since the second substrate 45 and the like are sandwiched between these laminated portions, insulation between the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,.

  Moreover, y wiring 49y is connected to each edge part to each y electrode pattern y1, y2, .... These y wirings 49y are wired in the peripheral region on the second substrate 45, and are drawn out to the edge of the second substrate 45 so as to be aligned with the x wirings 49x. Each of these y wirings 49y may be configured as the second conductive layer 46 mainly composed of silver, similarly to the y electrode patterns y1, y2,. It may be composed of layers.

  A flexible printed circuit board or the like is connected to the x wiring 49x and the y wiring 49y drawn to the edge of the first substrate 43 or the second substrate 45.

[Front plate]
The front plate 47 shown in FIG. 4 is a plate material on which the portion corresponding to the input position on the touch panel 40 is pressed. The front plate 47 is made of a light-transmitting plate material like the first substrate 43 and the second substrate 45. Further, the front plate 47 may be used by selecting a material having optical characteristics as required. Such a front plate 47 is bonded to the second touch panel transparent electrode 42 side by an adhesive layer (not shown), for example.

  Further, the front plate 47 is provided with a light-shielding film that covers the peripheral edges of the first substrate 43 and the second substrate 45, and the x wiring 49x drawn from the x electrode patterns x1, x2,. The y wiring 49y drawn from the patterns y1, y2,... Is prevented from being visually recognized from the front plate 47 side.

[Touch panel operation]
When operating the touch panel 40 as described above, the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,... From the flexible printed circuit board connected to the x wiring 49x and the y wiring 49y. In contrast, a voltage is applied. When a finger or a touch pen touches the surface of the front plate 47 with a voltage applied, the capacitance of each part existing in the touch panel 40 changes, and the x electrode patterns x1, x2,... And the y electrode patterns y1, y2 It appears as a change in voltage. This change differs depending on the distance from the position touched by the finger or touch pen, and is greatest at the position touched by the finger or touch pen. For this reason, the position designated by the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,. .

[Transparent electrode for touch panel]
Next, FIG. 7 shows a schematic cross-sectional view corresponding to the cross-sectional configuration of the touch panel 40 shown in FIGS. FIG. 7 shows a configuration of a touch panel to which the configuration of the transparent electrode for a touch panel according to the third embodiment described above is applied. FIG. 8 is a modification of the touch panel shown in FIG.

  As shown in FIG. 7, the touch panel 40 has a configuration in which a first substrate 43, a first touch panel transparent electrode 41, a second substrate 45, a second touch panel transparent electrode 42, and a front plate 47 are laminated in this order. is there. The transparent electrode 41 for the first touch panel has a configuration in which a second high refractive index layer 53, a first AgAl layer 51, a first conductive layer 44, and a fourth high refractive index layer 55 are laminated in this order. The transparent electrode 42 for the second touch panel has a configuration in which a third high refractive index layer 56, a second AgAl layer 52, a second conductive layer 46, and a first high refractive index layer 54 are laminated in this order.

  In the touch panel 40, the first touch panel transparent electrode 41 and the second touch panel transparent electrode 42 have the same first conductive layer 44 and second conductive layer 46 as the first substrate 43 and the second substrate 45. It is laminated so as to be in the surface direction. And it is the structure which laminated | stacked the 2nd board | substrate 45 with which the transparent electrode 42 for 2nd touch panels was provided on the 4th high refractive index layer 55 of the transparent electrode 41 for 1st touch panels.

[First AgAl layer, second AgAl layer]
The first AgAl layer 51 and the second AgAl layer 52 have the same configuration as the AgAl layer described in the embodiment of the transparent electrode for a touch panel described above. FIG. 7 shows an example in which the second AgAl layer 52 is formed in the same electrode pattern as the second conductive layer 46, but the first AgAl layer 51 is also formed in the same electrode pattern as the first conductive layer 44. Has been.

[First to fourth high refractive index layers]
The second high-refractive index layer 53, the first high-refractive index layer 54, the fourth high-refractive index layer 55, and the third high-refractive index layer 56 are the high-refractive index described in the embodiment of the transparent electrode for touch panel described above. The structure is the same as that of the layer.

[Effect of touch panel]
The touch panel 40 as described above includes two layers of the touch panel transparent electrodes described in the third embodiment. Therefore, the first conductive layer 44 or the second conductive layer 46 mainly composed of silver is provided adjacent to the first AgAl layer 51 or the second AgAl layer 52. Accordingly, the diffusion distance of silver is reduced by the interaction between silver atoms and Al atoms, and the first conductive layer 44 and the second conductive layer 46 are grown by single-layer growth type (Frank-van der Merwe: FM type) growth. Is formed.
As a result, on the first AgAl layer 51 or the second AgAl layer 52, the first conductive layer 44 and the second conductive layer 46 that ensure conductivity while securing light transmittance by having a thin and uniform thickness are obtained. It is done. For this reason, in a touch panel, it has sufficient electroconductivity with light transmittance, and the voltage drop at the time of enlarging a conductive film can be suppressed, maintaining the visibility of the display image of a foundation | substrate.

  In particular, the touch panel 40 is a projected capacitive type having x electrode patterns x1, x2,... And y electrode patterns y1, y2,. Therefore, the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,. In the touch panel of this example, the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,... Are transparent conductive layers mainly composed of silver. Is possible. Therefore, the x electrode patterns x 1, x 2,... And the y electrode patterns y 1, y 2,... Themselves are difficult to be visually recognized, and deterioration of the visibility of the display image via the touch panel 40 can be prevented.

[Modification of touch panel]
Next, a modification of the touch panel according to the fourth embodiment will be described. FIG. 8 shows a cross-sectional configuration of a modified example of the touch panel of the fourth embodiment, in particular, a schematic cross-sectional view corresponding to the AA cross section shown in FIG.

The touch panel 40A of the modification shown in FIG. 8 has a configuration in which a first substrate 43, a first touch panel transparent electrode 41A, a second substrate 45, a second touch panel transparent electrode 42A, and a front plate 47 are laminated in this order. is there. The transparent electrode 41A for the first touch panel has a configuration in which the second high refractive index layer 53, the first AgAl layer 51, and the first conductive layer 44 are laminated in this order. Further, the transparent electrode 42A for the second touch panel has a configuration in which the second AgAl layer 52, the second conductive layer 46, and the first high refractive index layer 54 are laminated in this order.
That is, the touch panel 40A of the modification shown in FIG. 8 has a configuration in which the fourth high refractive index layer 55 and the third high refractive index layer 56 are removed from the configuration of the touch panel 40 shown in FIG.

  In the touch panel 40A, the first touch panel transparent electrode 41A and the second touch panel transparent electrode 42A have the same first conductive layer 44 and second conductive layer 46 as the first substrate 43 and the second substrate 45. It is laminated so as to be in the direction. And it is the structure which laminated | stacked the 2nd board | substrate 45 with which the transparent electrode 42 for 2nd touch panels was provided on the 1st conductive layer 44 of 41 A of transparent electrodes for 1st touch panels.

41 A of transparent electrodes for 1st touch panels are the structures similar to the transparent electrode 20 for touch panels shown in FIG. 2 demonstrated as the above-mentioned 2nd Embodiment.
42 A of transparent electrodes for 2nd touch panels are the structures which provided the high refractive index layer on the conductive layer 13 in the transparent electrode 10 for touch panels shown in FIG. 1 demonstrated in the above-mentioned 1st Embodiment. Alternatively, the second touch panel transparent electrode 42A is the second high refractive index formed between the transparent substrate 11 and the AgAl layer 12 in the touch panel transparent electrode 30 shown in FIG. 3 described in the third embodiment. This is a configuration excluding the layer 34.

[Effect of touch panel]
The touch panel 40A according to the modified example as described above is also configured to include two layers of the touch panel transparent electrode described in the above-described embodiment. For this reason, it has sufficient electroconductivity with light transmittance, can suppress the voltage drop at the time of enlarging a conductive film, maintaining the visibility of the display image of a foundation | substrate.

  Further, in the touch panel 40A, the configuration from the first AgAl layer 51 to the second conductive layer 46 is configured to be sandwiched between the first high refractive index layer 54 and the second high refractive index layer 53. For this reason, it becomes the structure by which the high refractive index layer was provided in both the incident surface and exit surface of the light from the display image etc. which become the foundation | substrate of this touch panel 40A. For this reason, the light transmittance of the touch panel 40A can be improved, and the visibility of a display image or the like serving as a base can be improved by suppressing light scattering.

<5. Touch panel (fifth embodiment: configuration in which conductive layers are provided on both surfaces of a transparent substrate)>
Next, a fifth embodiment of the present invention will be described. 5th Embodiment demonstrates the touchscreen using the transparent electrode 30 for touchscreens of the above-mentioned 3rd Embodiment. FIG. 9 shows the configuration of the touch panel of the present embodiment.
FIG. 9 is a schematic cross-sectional view of the touch panel of the present embodiment, corresponding to the AA cross-section shown in FIG. In addition, also in 5th Embodiment, about the schematic structure of a touch panel, the electrode structure of the transparent electrode for touch panels, and the planar arrangement | positioning of the electrode part of a touch panel, it is the same as that of the structure shown to FIGS.

[Configuration of touch panel]
As shown in FIG. 9, the touch panel 50 of the present embodiment has a configuration in which a first touch panel transparent electrode 41 and a second touch panel transparent electrode 42 are provided on both surfaces of a substrate 57, and other configurations are described above. This is the same as the embodiment. For this reason, the same code | symbol is attached | subjected to the structure similar to the touch panel of the above-mentioned embodiment, and the overlapping description is abbreviate | omitted.

The transparent electrode 41 for the first touch panel has a configuration in which the second high refractive index layer 53, the first AgAl layer 51, the first conductive layer 44, and the fourth high refractive index layer 55 are laminated in this order from the substrate 57 side. is there.
The transparent electrode 42 for the second touch panel has a configuration in which the third high refractive index layer 56, the second AgAl layer 52, the second conductive layer 46, and the first high refractive index layer 54 are laminated in this order from the substrate 57 side. is there.
Further, in the touch panel 50, the first touch panel transparent electrode 41 and the second touch panel transparent electrode 42 are arranged such that the first conductive layer 44 and the second conductive layer 46 are in different directions with respect to the substrate 57. Are stacked.

  The board | substrate 57 can be set as the structure similar to the board | substrate demonstrated by embodiment of the transparent electrode for touchscreens mentioned above. Moreover, each said layer which comprises the transparent electrode 41 for 1st touch panels, and the transparent electrode 42 for 2nd touch panels is the structure similar to the touch panel of the above-mentioned 4th Embodiment.

  Further, the configurations of the first conductive layer 44 and the second conductive layer 46 are the same as those of the touch panel of the fourth embodiment described above, and the x electrode patterns x1, x2,. And y electrode pattern y1, y2, ... comprised by the 2nd conductive layer 46 becomes a pattern structure and arrangement | positioning structure which are hard to be visually recognized.

[Effect of touch panel]
The touch panel 50 as described above includes two layers of the touch panel transparent electrodes described in the third embodiment. For this reason, it has the same effect as the touch panel of the above-mentioned fourth embodiment, has sufficient conductivity as well as light transmittance, and increased the size of the conductive film while maintaining good visibility of the underlying display image. The voltage drop at the time can be suppressed.

[Modification of touch panel]
Next, a modification of the touch panel according to the fifth embodiment will be described. FIG. 10 shows a cross-sectional configuration of a modified example of the touch panel of the fifth embodiment, in particular, a schematic cross-sectional view corresponding to the AA cross section shown in FIG.

  The touch panel 50A of the modification shown in FIG. 10 has a configuration in which a first touch panel transparent electrode 41A, a substrate 57, a second touch panel transparent electrode 42A, and a front plate 47 are laminated in this order. In the touch panel 50 </ b> A, the first touch panel transparent electrode 41 </ b> A and the second touch panel transparent electrode 42 </ b> A have a configuration in which the first AgAl layer 51 or the second AgAl layer 52 is formed on each main surface of the substrate 57. . That is, the touch panel 50A of the modification shown in FIG. 10 has a configuration in which the second high refractive index layer 53 and the third high refractive index layer 56 are excluded from the configuration of the touch panel 50 shown in FIG.

  The transparent electrode 41A for the first touch panel has a configuration in which the first AgAl layer 51, the first conductive layer 44, and the fourth high refractive index layer 55 are laminated in this order from the substrate 57 side. Further, the transparent electrode 42A for the second touch panel has a configuration in which the second AgAl layer 52, the second conductive layer 46, and the first high refractive index layer 54 are laminated in this order.

  As described above, the first touch panel transparent electrode 41A and the second touch panel transparent electrode 42A are highly refracted on the conductive layer 13 in the touch panel transparent electrode 10 shown in FIG. 1 described in the first embodiment. It is the structure which provided the rate layer. Or in the transparent electrode 30 for touch panels shown in FIG. 3 demonstrated in the above-mentioned 3rd Embodiment, it is the structure except the 2nd high refractive index layer 34 formed between the transparent substrate 11 and the AgAl layer 12. FIG.

[Effect of touch panel]
The touch panel 50 </ b> A of the modified example as described above is also configured to include two layers of the touch panel transparent electrode described in the above-described embodiment. For this reason, it has sufficient electroconductivity with light transmittance, can suppress the voltage drop at the time of enlarging a conductive film, maintaining the visibility of the display image of a foundation | substrate.

  Further, in the touch panel 50 </ b> A, the configuration from the first conductive layer 44 to the second conductive layer 46 is sandwiched between the first high refractive index layer 54 and the fourth high refractive index layer 55. For this reason, it becomes the structure by which the high refractive index layer was provided in both the incident surface and exit surface of the light from the display image etc. which are the foundations of this touch panel 50A. For this reason, the light transmittance of the touch panel 50 </ b> A can be improved, and the visibility of a display image or the like serving as a base can be improved by suppressing light scattering.

<6. Touch panel (sixth embodiment: configuration in which a conductive layer is provided on one side of a transparent substrate)>
Next, a sixth embodiment of the present invention will be described. 6th Embodiment demonstrates the touchscreen using the transparent electrode 30 for touchscreens of the above-mentioned 3rd Embodiment. 11 to 13 show the configuration of the touch panel of the present embodiment. Note that in the touch panel of this example, a configuration using a single-layer transparent electrode for a touch panel will be described.

[Configuration of touch panel]
FIG. 11 is a plan view showing an electrode configuration of a transparent electrode for a touch panel used in the touch panel of the present embodiment and a planar arrangement of electrode portions. FIG. 12 is an enlarged view of an electrode portion of the transparent electrode for a touch panel. FIG. 13 is a schematic cross-sectional view of the touch panel of the present embodiment, corresponding to the BB cross section shown in FIGS. 11 and 12.
The configuration of the touch panel of the sixth embodiment is the same as that of the touch panel configuration shown in FIG. 4 except that the touch panel transparent electrode to be used is a single layer. For this reason, the same code | symbol is attached | subjected to the structure similar to the touch panel of the above-mentioned embodiment, and the overlapping description is abbreviate | omitted.

  The touch panel 60 shown in FIG. 11 has a first conductive layer 62 having y electrode patterns y1, y2,... And a second conductive having x electrode patterns x1, x2,. A layer 63. In FIG. 11, only the first conductive layer 62 and the second conductive layer 63 formed on the substrate 61 are shown, and illustration of the configurations of other AgAl layers and high refractive index layers is omitted.

That is, as shown in FIG. 13, the touch panel 60 includes a substrate 61, a second high refractive index layer 67, an AgAl layer 66, a first conductive layer 62, a second conductive layer 63, which are sequentially stacked on the substrate 61. An interlayer insulating film 65, connection electrodes 64, a first high refractive index layer 68, and a front plate 47 are provided.
The first conductive layer 62 and the second conductive layer 63 are formed in the same layer. The first conductive layer 62 and the second conductive layer 63 are formed adjacent to the AgAl layer 66 formed in the same pattern as the first conductive layer 62 and the second conductive layer 63.

The first conductive layer 62 and the second conductive layer 63 have x electrode patterns x1, x2,... And y electrode patterns y1, y2,.
The x electrode pattern has a rhombus pattern arranged in a matrix at intervals and a connecting portion that is provided in the x direction linearly from the vicinity of the apex of the rhombus pattern and connects adjacent rhombus patterns in the x direction. doing.

  The y electrode pattern has a rhombus pattern arranged in a matrix and a connecting portion that is provided in the y direction linearly from the vicinity of the apex of the rhombus pattern and connects adjacent rhombus patterns in the y direction. . The connecting portion in the y direction is composed of a connection electrode 64 provided on the connecting portion in the x direction via the interlayer insulating film 65. The interlayer insulating film 65 is provided at a position covering the connecting portion in the x direction of the second conductive layer 63. Then, the end portion of the connection electrode 64 is connected to the vicinity of the apex of the rhombus pattern, and the y electrode pattern by the first conductive layer 62 is configured.

[Substrate]
The substrate 61, the AgAl layer 66, the first high-refractive index layer 68, and the second high-refractive index layer 67 can each have the same configuration as that described in the embodiment of the transparent electrode for touch panel described above. . In addition, the AgAl layer 66 is patterned in the same shape as the first conductive layer 62 and the second conductive layer 63 as an example, but other configurations can be used as long as insulation between the x electrode pattern and the y electrode pattern can be secured. It can also be a pattern.

[First conductive layer, second conductive layer]
The first conductive layer 62 and the second conductive layer 63 are the conductive layers described in the embodiment of the transparent electrode for a touch panel described above, and a plurality of x electrode patterns x1, x2,... Patterned on the AgAl layer 66. And a plurality of y electrode patterns y1, y2,...

  The y electrode patterns are arranged with an interval sufficient to maintain an insulating state without overlapping with the x electrode patterns x1, x2,. Accordingly, the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,. In addition, the y electrode pattern has a shape that occupies as large a range as possible within a range having an interval sufficient to maintain an insulation state with the x electrode patterns x1, x2,. Thus, the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,.

  In addition, each x electrode pattern x1, x2,... And each y electrode pattern y1, y2,... Has an x wiring 69x or y wiring at each end, as in the embodiments of the touch panel described above. 69y is connected.

[Interlayer insulation film, connection electrode]
The connection electrode 64 is linearly connected in the y direction in the vicinity of the apex of the rhombic y electrode pattern that constitutes each y electrode pattern. The connection electrode 64 is disposed at each position where the connection electrode 64 intersects a portion connecting the rhombus patterns of the x electrode patterns x1, x2,. At these intersecting portions, the interlayer insulating film 65 covers the portion connecting the rhombic patterns of the x electrode patterns x1, x2,..., And the connection electrode 64 is interlayer insulating on the x electrode patterns x1, x2,. They are stacked via the film 65. Therefore, the insulation between the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,. Note that the connection electrode 64 may be made of a general electrode material such as silver or a light-transmissive electrode material such as ITO. From the viewpoint of the visibility of the underlying display image via the touch panel 60, an electrode material having light transmissivity and containing Ag as a main component is preferably used, similarly to the first conductive layer 62 and the second conductive layer 63.

  In this example, the example in which the connection electrode 64 is provided above the first conductive layer 62 and the second conductive layer 63 has been described. However, the connection electrode 64 is a layer below the first conductive layer 62 and the second conductive layer 63. May be provided. At this time, the connection electrode 64 is arranged at each position intersecting in plan view with a portion connecting the rhombus patterns of the x electrode patterns x1, x2,. At these intersecting portions, at least an interlayer insulating layer is sandwiched between the connection electrode 64 and a portion connecting the rhombic patterns of the x electrode patterns x1, x2,. Therefore, even in the example in which the connection electrode 64 is provided below the first conductive layer 62 and the second conductive layer 63, the x electrode patterns x1, x2,. Insulation with y2,... is ensured.

[Effect of touch panel]
The touch panel 60 described above can be enlarged in the same manner as the touch panel of the above-described embodiment by using the transparent electrode for a touch panel described in the above-described third embodiment having sufficient conductivity as well as light transmittance. Yes, it is possible to prevent deterioration of the visibility of the display image via the touch panel 60.

  In addition, the touch panel of this invention is not limited to the structure of embodiment mentioned above and a modified example, If it is a structure using the transparent electrode for touch panels, it can apply widely. For example, in the case of a projected capacitive touch panel, the x electrode patterns x1, x2,... And the y electrode patterns y1, y2,. The pattern shape is not limited. In addition, the touch panel may be a resistance film type in which two transparent electrodes for a touch panel having a solid film-like conductive layer are arranged with a spacer interposed therebetween, or may be a surface type capacitive type. Good.

<7. Display Device (Seventh Embodiment: Configuration Using Touch Panel)>
Next, a seventh embodiment of the present invention will be described. 7th Embodiment demonstrates the display apparatus using the touchscreen of the above-mentioned embodiment. FIG. 14 is a perspective view of the configuration of the display device of this embodiment.

[Configuration using touch panel]
A display device 70 shown in FIG. 14 is a display device with an information input function in which a touch panel 71 is provided on the display surface of the display panel 72. The touch panel 71 of the display device 70 can be applied with the touch panel of the above-described embodiment and modification.

  The display panel 72 is not particularly limited. For example, a flat display panel such as a liquid crystal display panel or a display panel using an organic electroluminescent element, or a CRT (Cathode Ray Tube) display can be used. . Further, the display panel 72 is not limited to a display panel that displays a moving image, and may be a display panel for a still image.

  In the display panel 72, a touch panel 71 is disposed so as to cover the display surface on the image display surface. The touch panel 71 and the display panel 72 are further accommodated in a frame-shaped case member 73 as necessary. Further, the case member 73 may be further provided with a front plate made of a transparent plate material.

  Accordingly, the user can input the position information of the contact portion to the touch panel 71 by bringing a finger or a touch pen into contact with a part of the display image displayed on the display panel 72 via the touch panel 71. .

[Effect of display device]
According to the display device 70 of the present embodiment, it is possible to reduce the thickness and increase the size by using the touch panel 71 of the above-described embodiment and each modification.

  EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

[Production of transparent electrode for touch panel]
Transparent electrodes for touch panels (hereinafter referred to as transparent electrodes) of Samples 101 to 143 were produced on a transparent substrate so as to have an area of 5 cm × 5 cm. As the transparent substrate, a polyethylene terephthalate (PET) substrate was prepared. Table 1 below shows the configuration of each layer in each of the transparent electrodes of Samples 101 to 143. Below, the preparation procedure of each transparent electrode of samples 101-143 is demonstrated.

[Preparation of transparent electrode of sample 101]
An ITO film (thickness 100 nm) was formed on one main surface of the transparent substrate by sputtering. Thereby, a transparent electrode having a single layer structure using an ITO film as a conductive layer was produced.

[Preparation of Transparent Electrodes of Samples 102 to 104]
In each of samples 102 to 104, a conductive layer using silver nanowires was formed on one main surface of the transparent substrate by a coating method. This produced the transparent electrode of the single layer structure of only the conductive layer using silver nanowire. At this time, the coating thickness of the silver nanowire dispersion is applied so that the thickness after applying the dispersion of silver nanowire and then drying is 50 nm for sample 102, 100 nm for sample 103, and 150 nm for sample 104. It was adjusted.

[Preparation of Transparent Electrodes of Samples 105 to 107]
In each of Samples 105 to 107, a conductive layer made of silver (Ag) was formed on each main surface of the transparent substrate to a thickness shown in Table 1 by vapor deposition. Thereby, a transparent electrode having a single layer structure using silver as a conductive layer was produced. At this time, the transparent substrate was fixed to a base material holder of a commercially available vacuum deposition apparatus and attached to a vacuum chamber of the vacuum deposition apparatus. Moreover, silver (Ag) was put into the resistance heating boat made from tungsten, and it attached in the said vacuum chamber. Next, after reducing the vacuum chamber to 4 × 10 ⁻⁴ Pa, the resistance heating boat is energized and heated, and the conductive layer made of silver is sampled at a deposition rate of 0.1 nm / second to 0.2 nm / second. The thickness was 6 nm for 105, 8 nm for sample 106, and 15 nm for sample 107.

[Preparation of Transparent Electrodes of Samples 108 to 110]
In each of the samples 108 to 110, a high refractive index layer made of titanium oxide (TiO ₂ ) was formed on one main surface of the transparent substrate with a thickness of 30 nm, and a conductive layer made of silver was formed on the upper layer. Each thickness shown in FIG. Thus, a transparent electrode having a laminated structure of the high refractive index layer and the upper conductive layer was produced.

At this time, the transparent substrate is fixed to a base material holder of a commercially available electron beam evaporation apparatus, titanium oxide (TiO ₂ ) is put into a heating boat, and these substrate holder and heating boat are attached to a vacuum chamber of the electron beam evaporation apparatus. It was. Moreover, silver (Ag) was put into the resistance heating boat made from tungsten, and it attached to the vacuum chamber of the vacuum evaporation system.

Next, after reducing the pressure of the vacuum chamber of the electron beam evaporation apparatus to 4 × 10 ⁻⁴ Pa, the heating boat containing titanium oxide is heated by irradiating the electron beam with a deposition rate of 0.1 nm / second to 0.2 nm. A high refractive index layer made of titanium oxide having a thickness of 30 nm was provided on the transparent substrate at a rate of / sec.

Next, the transparent substrate formed up to the high refractive index layer is transferred to a vacuum chamber of a vacuum deposition apparatus while being vacuumed, and after the pressure in the vacuum chamber is reduced to 4 × 10 ⁻⁴ Pa, a resistance heating boat containing silver is energized. And heated. Thus, a conductive layer made of silver was formed at a deposition rate of 0.1 nm / second to 0.2 nm / second with a thickness of 6 nm for sample 108, 8 nm for sample 109, and 15 nm for sample 110.

[Preparation of transparent electrode of sample 111]
As described below, an AgAl layer (Al content 70 atm%) was formed with a thickness of 5 nm on one main surface of the transparent substrate, and a conductive layer made of silver was formed with a thickness of 10 nm thereon.

  First, the transparent substrate was fixed to a base material holder of a commercially available vacuum deposition apparatus and attached to the first vacuum chamber of the vacuum deposition apparatus. Moreover, AgAl (Al content rate 70atm%) was put into the resistance heating boat made from tungsten, and it attached to the 1st vacuum chamber of the vacuum evaporation system. Moreover, silver (Ag) was put into the resistance heating boat made from tungsten, and it attached to the 2nd vacuum chamber of the vacuum evaporation system.

Next, after reducing the vacuum tank of the vacuum evaporation apparatus to 4 × 10 ⁻⁴ Pa, the resistance heating boat containing AgAl was energized and heated. As a result, an AgAl layer having a thickness of 5 nm was provided on the high refractive index layer at a deposition rate of 0.1 nm / second to 0.2 nm / second.

Next, the substrate formed up to the AgAl layer was transferred to the second vacuum chamber, and after the pressure in the second vacuum chamber was reduced to 4 × 10 ⁻⁴ Pa, the resistance heating boat containing silver was energized and heated. Thus, a conductive layer made of silver having a thickness of 10 nm was formed at a deposition rate of 0.1 nm / second to 0.2 nm / second.

[Preparation of transparent electrode of sample 112]
Each transparent electrode of Sample 112 was obtained in the same procedure as Sample 111 except that the thickness of the conductive layer was 3 nm.

[Preparation of Transparent Electrodes of Samples 113 to 117]
Each of the samples 113 to 117 was transparent in the same manner as the sample 112 except that the AgAl layer was changed to the Al content (50 atm%, 10 atm%, 5 atm%, 1 atm%, 0.5 atm%) shown in Table 1. An electrode was obtained.

[Preparation of Transparent Electrodes of Samples 118 to 123]
The AgAl layer was changed to the Al content shown in Table 1 (70 atm%, 50 atm%, 10 atm%, 5 atm%, 1 atm%, 0.5 atm%), respectively, and the thickness of the conductive layer was changed to 7 nm. The transparent electrodes of Samples 118 to 123 were obtained in the same procedure as Sample 112 above.

[Preparation of Transparent Electrodes of Samples 124 to 129]
The AgAl layer was changed to the Al content shown in Table 1 (70 atm%, 50 atm%, 10 atm%, 5 atm%, 1 atm%, 0.5 atm%), the thickness of the AgAl layer was 0.5 nm, Each transparent electrode of Samples 124 to 129 was obtained in the same procedure as Sample 112 except that the layer thickness was 7.5 nm.

[Preparation of transparent electrode of sample 130]
A high refractive index layer made of titanium dioxide (TiO ₂ ) is formed with a thickness of 30 nm on a transparent substrate in the following manner, and an AgAl layer is formed with a thickness of 5 nm on this, and further made of silver. The conductive layer was formed with a thickness of 3 nm.

First, a transparent substrate was fixed to a base material holder of a commercially available electron beam evaporation apparatus, titanium dioxide (TiO ₂ ) was put into a heating boat, and these substrate holder and heating boat were attached to a vacuum chamber of the electron beam evaporation apparatus. . Next, AgAl (Al content of 10 atm%) was put in a resistance heating boat made of tungsten, and attached to the first vacuum chamber of the vacuum evaporation apparatus. Moreover, silver (Ag) was put into the resistance heating boat made from tungsten, and it attached to the 2nd vacuum chamber of the vacuum evaporation system.

Next, after reducing the vacuum chamber of the electron beam deposition apparatus to 4 × 10 ⁻⁴ Pa, the heating boat containing titanium dioxide is irradiated with an electron beam and heated to deposit a deposition rate of 0.1 nm / second to 0.2 nm. A high refractive index layer made of titanium dioxide having a thickness of 30 nm was provided on the substrate at a rate of / sec.

Subsequently, the substrate formed up to the high refractive index layer was transferred to the first vacuum chamber of the vacuum deposition apparatus while being vacuumed, and after the pressure of the first vacuum chamber was reduced to 4 × 10 ⁻⁴ Pa, a resistance heating boat containing AgAl was added. Heated with electricity. As a result, an AgAl layer having a thickness of 5 nm was provided on the high refractive index layer at a deposition rate of 0.1 nm / second to 0.2 nm / second.

Next, the substrate formed up to the AgAl layer was transferred to the second vacuum chamber, and after the pressure in the second vacuum chamber was reduced to 4 × 10 ⁻⁴ Pa, the resistance heating boat containing silver was energized and heated. Thus, a conductive layer made of silver having a thickness of 3 nm was formed at a deposition rate of 0.1 nm / second to 0.2 nm / second.

[Preparation of Transparent Electrodes of Samples 131 to 133]
Transparent electrodes of Samples 131 to 133 were obtained in the same procedure as Sample 130, except that the AgAl layer was changed to the Al contents (5 atm%, 1 atm%, 0.5 atm%) shown in Table 1, respectively.

[Preparation of Transparent Electrodes of Samples 134 to 137]
The AgAl layer was changed to the Al content shown in Table 1 (10 atm%, 5 atm%, 1 atm%, 0.5 atm%), the thickness of the AgAl layer was 0.5 nm, and the thickness of the conductive layer was 7 Each transparent electrode of Samples 134 to 137 was obtained in the same procedure as Sample 130 except that the thickness was set to 0.5 nm.

[Preparation of transparent electrode of sample 138]
Each transparent electrode of Sample 138 was obtained in the same procedure as Sample 137 except that the material used for the high refractive index layer was niobium oxide (Nb ₂ O ₅ ).

[Preparation of transparent electrode of sample 139]
Each transparent electrode of Sample 139 was obtained in the same procedure as Sample 137 except that the material used for the high refractive index layer was tantalum oxide (Ta ₂ O ₅ ).

[Preparation of transparent electrode of sample 140]
Each transparent electrode of Sample 140 was obtained in the same procedure as Sample 137 except that the material used for the high refractive index layer was cerium oxide (CeO ₂ ).

[Preparation of transparent electrode of sample 141]
Each transparent electrode of Sample 141 was obtained in the same procedure as Sample 129, except that the material used for the conductive layer was AgAu (Au content 5 atm%).

[Preparation of transparent electrode of sample 142]
A second high refractive index layer made of titanium dioxide (TiO ₂ ) is formed with a thickness of 30 nm on a transparent substrate as follows, and an AgAl layer is formed with a thickness of 0.5 nm on top of this, A conductive layer made of silver was formed with a thickness of 7.5 nm on the AgAl layer, and a first high refractive index layer made of titanium dioxide (TiO ₂ ) was formed with a thickness of 30 nm on the conductive layer.

First, a transparent substrate was fixed to a base material holder of a commercially available electron beam evaporation apparatus, titanium dioxide (TiO ₂ ) was put into a heating boat, and these substrate holder and heating boat were attached to a vacuum chamber of the electron beam evaporation apparatus. . Next, AgAl (Al content of 10 atm%) was put in a resistance heating boat made of tungsten, and attached to the first vacuum chamber of the vacuum evaporation apparatus. Moreover, silver (Ag) was put into the resistance heating boat made from tungsten, and it attached to the 2nd vacuum chamber of the vacuum evaporation system.

Next, after reducing the vacuum chamber of the electron beam deposition apparatus to 4 × 10 ⁻⁴ Pa, the heating boat containing titanium dioxide is irradiated with an electron beam and heated to deposit a deposition rate of 0.1 nm / second to 0.2 nm. A second high refractive index layer made of titanium dioxide having a thickness of 30 nm was provided on the substrate at a rate of / sec.

Subsequently, the substrate formed up to the second high refractive index layer is transferred to the first vacuum chamber of the vacuum deposition apparatus while being vacuumed, and the first vacuum chamber is depressurized to 4 × 10 ⁻⁴ Pa, and then resistance heating containing AgAl is performed. The boat was energized and heated. As a result, an AgAl layer having a thickness of 0.5 nm was provided on the second high refractive index layer at a deposition rate of 0.1 nm / second to 0.2 nm / second.

Next, the substrate formed up to the AgAl layer was transferred to the second vacuum chamber, and after the pressure in the second vacuum chamber was reduced to 4 × 10 ⁻⁴ Pa, the resistance heating boat containing silver was energized and heated. As a result, a conductive layer made of silver having a thickness of 7.5 nm was formed at a deposition rate of 0.1 nm / second to 0.2 nm / second.

Next, the substrate formed up to the conductive layer is transferred to a vacuum chamber of an electron beam vapor deposition apparatus, and after the pressure of the vacuum chamber of the electron beam vapor deposition apparatus is reduced to 4 × 10 ⁻⁴ Pa, an electron beam is applied to a heating boat containing titanium dioxide. Irradiation and heating were performed, and a first high refractive index layer made of titanium dioxide having a thickness of 30 nm was provided on the conductive layer at a deposition rate of 0.1 nm / second to 0.2 nm / second.

[Preparation of transparent electrode of sample 143]
Each transparent electrode of Sample 143 was obtained in the same procedure as Sample 142 except that the material used for the high refractive index layer was niobium oxide (Nb ₂ O ₅ ).

[Evaluation of Samples in Examples]
About each transparent electrode of the samples 101-143 produced above, the visibility of a character, sheet resistance (surface resistance), and preservability were measured.
Visibility of characters was evaluated by evaluating the visibility of the characters through five levels by superimposing a transparent substrate on which a transparent electrode was formed on the image representing the characters. The five-level evaluation was performed from two angles of 0 ° and 45 °, where the direction of the direction of the transparent electrode relative to the electrode surface was 0 ° and averaged. These evaluation results are shown in Table 1 below.
The sheet resistance was measured using a resistivity meter (MCP-T610 manufactured by Mitsubishi Chemical Corporation) by a four-terminal four-probe method constant current application method.
In the measurement of storage stability, after each transparent electrode of Samples 101 to 143 was stored for 7 days under a high temperature environment (60 ° C.), a transparent substrate on which the transparent electrode was formed was superimposed on the upper part of the image representing characters, The visibility of characters through these was evaluated on a five-point scale. The five-level evaluation was performed from two angles of 0 ° and 45 °, where the direction of the direction of the transparent electrode relative to the electrode surface was 0 ° and averaged.
The results are shown in Table 1 below.

[Evaluation results of Examples]
From the results shown in Table 1, it can be seen that the transparent electrode of the sample 101 having a single layer structure using ITO without using Ag for the conductive layer has a very high sheet resistance even though it is a thick film of 100 nm. In addition, in the transparent electrodes of the samples 102 to 104 having a single layer structure using silver nanowires, the sheet resistance value with respect to the thickness is high, and in the sample 104 with the lowest sheet resistance, the visibility of characters due to light scattering. Is as low as 1.5.

  Moreover, it turns out that the samples 105-110 which do not have an AgAl layer have low visibility. These are because the AgAl layer is not provided, so that Ag constituting the conductive layer is aggregated and the uniformity of the conductive layer is lowered. In addition, the resistance values of Samples 105 to 110 were large due to Ag aggregation, and the resistance values could not be measured except for Sample 107 and Sample 110 in which the conductive layer was formed as thick as 15 nm. Moreover, in the sample 107 and the sample 110, since the conductive layer is as thick as 15 nm, the visibility is lower than the other samples.

  Further, in the AgAl layer, the preservability is lowered in the sample 111, the sample 112, the sample 118, and the sample 124 whose Al content is as high as 70 atm%. This is because the shape change of the AgAl layer due to the oxidation of Al occurred because the Al content in the AgAl layer was large. It is considered that the visibility of the transparent electrode was lowered due to the progress of oxidation of Al during high-temperature storage, further crystal growth or aggregation of aluminum oxide, and the deterioration of the uniformity of the AgAl layer.

  Further, the visibility of the sample 111 is lower than that of the sample 112, the sample 118, and the sample 124 having the same Al content. This is because the total thickness of the AgAl layer and the conductive layer of the sample 111 is 15 nm, which is larger than the other samples, so that the visibility is lowered. This is the same reason as the sample 107 and the sample 110, and means that the total thickness of the AgAl layer and the conductive layer affects the visibility of the transparent electrode. From this result, it can be seen that the smaller the total thickness of the AgAl layer and the conductive layer, the higher the visibility of the transparent electrode.

In Samples 112 to 117, Samples 118 to 123, and Samples 124 to 129 in which the thicknesses of the conductive layer and the AgAl layer are constant and the Al content of the AgAl layer is changed, the lower the Al content, All values of visibility, surface resistance, and storage stability are improved. From this result, it can be seen that the lower the Al content in the AgAl layer, the better the characteristics of the transparent electrode.
However, in consideration of the results of the samples 105 to 110 in which the AgAl layer is not provided, it is difficult to form a conductive layer made of Ag if the AgAl layer is not provided.
Furthermore, even when the Al content is reduced from 1 atm% to 0.5 atm%, the characteristics of the transparent electrode are improved, so the Al content in the AgAl layer is transparent even if it is less than 0.5 atm%. It is considered that the characteristics of the electrode can be improved. For this reason, it is preferable that the Al content is small as long as the film uniformity of the conductive layer mainly composed of Ag formed on the AgAl layer can be maintained.

In Samples 130 to 133 and Samples 134 to 137 in which TiO ₂ is formed as the high refractive index layer, Samples 114 to 117 and Samples formed under the same conditions except that the high refractive index layer is not formed. Compared with 126-129, although the sheet resistance is hardly changed, the visibility is improved.
Similarly, in the samples 138 to 140 using Nb ₂ O ₅ , Ta ₂ O ₅ , or CeO ₂ as the high refractive index layer, the visibility is improved as compared with the sample 129.
From this result, it can be seen that the visibility of the transparent electrode is improved by having the high refractive index layer.

  Further, the sample 141 uses AgAu as the conductive layer instead of Ag. Also in this sample 141, the transmittance, sheet resistance, and storage stability of the transparent electrode show the same results as other samples in which the conductive layer is formed of Ag alone. For this reason, it can be seen from the results of the sample 141 that the characteristics of the transparent electrode are improved even when the conductive layer is mainly composed of Ag by using Ag as a main component.

  In Sample 142 and Sample 143 having a structure in which two high refractive index layers are formed and a conductive layer and an AgAl layer are sandwiched between high refractive index layers, Sample 137 and Sample 138 having a structure in which one high refractive index layer is provided. In comparison, the surface resistance is almost the same, but the visibility is improved. From this result, it is understood that the visibility of the transparent electrode is improved by providing a high refractive index layer above and below the structure of the conductive layer and the AgAl layer and sandwiching the conductive layer between the high refractive index layers.

  From the above results, according to the transparent electrode for a touch panel of the configuration of the present invention, it was confirmed that an electrode film (that is, a transparent electrode) having a low resistance although being a thin film was obtained in order to obtain light transmittance. Furthermore, it was confirmed that the formation of a uniform conductive layer can suppress light scattering and improve the visibility of a display image or the like as a base. In particular, a structure in which a conductive layer and an AgAl layer are sandwiched between high refractive index layers, that is, a structure in which a high refractive index layer is formed on both sides of the light incident side and the light emitting side with respect to the conductive layer is transparent. It was confirmed that the visibility of the electrode was further improved.

  The present invention is not limited to the configuration described in the above-described embodiment, and various modifications and changes can be made without departing from the configuration of the present invention.

  10, 20, 30 ... transparent electrode for touch panel, 11 ... transparent substrate, 57, 61 ... substrate, 12, 66 ... AgAl layer, 13 ... conductive layer, 24 ... high refraction Index layer, 34, 53, 67 ... second high refractive index layer, 35, 54, 68 ... first high refractive index layer, 40, 40A, 50, 50A, 60, 71 ... touch panel, 41 , 41A ... transparent electrode for first touch panel, 42, 42A ... transparent electrode for second touch panel, 43 ... first substrate, 44, 62 ... first conductive layer, 45 ... second. Substrate, 46, 63 ... second conductive layer, 47 ... front plate, 49x, 69x ... x wiring, 49y, 69y ... y wiring, 51 ... first AgAl layer, 52 ... 2nd AgAl layer, 55 ... 4th high refractive index layer, 56 ... 3rd high refractive index layer, 64 ... Continued electrode, 65 ... interlayer insulation film, 70 ... display, 72 ... display panel, 73 ... case member, x1 ... x electrode pattern, y1 ... y electrode pattern

Claims (10)

An AgAl layer containing 50 atm% or less of aluminum;
A transparent electrode for a touch panel, comprising: a conductive layer mainly composed of silver provided adjacent to the AgAl layer.   The transparent electrode for a touch panel according to claim 1, wherein a total thickness of the AgAl layer and the conductive layer is 15 nm or less.   The transparent electrode for a touch panel according to claim 2, wherein the thickness of the AgAl layer is 5 nm or less.   The transparent electrode for touchscreens of Claim 1 provided with the high refractive index layer provided by pinching | interposing the said AgAl layer between the said conductive layers.   The transparent electrode for a touch panel according to claim 4, wherein the conductive layer and the AgAl layer are sandwiched between high refractive index layers.   The transparent electrode for a touch panel according to claim 4, wherein the high refractive index layer is made of titanium dioxide or niobium oxide.   The transparent electrode for touchscreens of Claim 1 provided with a protective layer on the said conductive layer.   The transparent electrode for a touch panel according to claim 1, wherein the conductive layer is patterned. A touch panel comprising the transparent electrode for a touch panel according to claim 1. A touch panel according to claim 9;
A display panel disposed on the touch panel.

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