JPWO2011010373A1 - 太陽電池セルおよびその製造方法 - Google Patents
太陽電池セルおよびその製造方法 Download PDFInfo
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- 229910052710 silicon Inorganic materials 0.000 claims description 30
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- 239000011133 lead Substances 0.000 claims description 4
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- 239000010949 copper Substances 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
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- 239000012670 alkaline solution Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
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- 229910052739 hydrogen Inorganic materials 0.000 description 1
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- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
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- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
Description
2 p型シリコン基板
3 不純物拡散層(n型不純物拡散層)
4 反射防止膜
5 受光面側電極
6 表グリッド電極
7 表バス電極
8 絶縁膜
9 裏面側電極
10 裏グリッド電極
11 裏バス電極
13 表グリッド電極形成溝
14 裏グリッド電極形成溝
21 表電極印刷ペースト
22 金属粒子間の空隙
23 裏電極印刷ペースト
24 金属粒子間の空隙
WF 表グリッド電極の電極幅
WR 裏グリッド電極の電極幅
DF 表グリッド電極の電極厚
DR 裏グリッド電極の電極厚
WF1 表グリッド電極形成溝の幅、
WR1 裏グリッド電極形成溝の幅、
WF’ 表グリッド電極の印刷ペースト幅、
WR’ 裏グリッド電極の印刷ペースト幅、
DF’ 表グリッド電極の印刷ペースト厚、
DR’ 裏グリッド電極の印刷ペースト厚、
図1−1〜図1−3は、本実施の形態にかかる太陽電池セルの構成を示す図であり、図1−1は、太陽電池セルの断面構造を説明するための要部断面図、図1−2は、受光面側からみた太陽電池セルの上面図、図1−3は、受光面と反対側(裏面側)からみた太陽電池セルの下面図である。図1−1は、図1−2の線分A−Aにおける要部断面図である。
Claims (8)
- 半導体基板の一面側に絶縁膜を形成する第1工程と、
前記絶縁膜における電極形成領域に電極形成溝を形成する第2工程と、
主成分として金属粒子を含有する電極印刷ペーストを、前記電極形成溝上および前記絶縁膜における前記電極形成溝を挟む領域を覆って前記電極形成溝の幅よりも幅広に印刷し、乾燥する第3工程と、
前記金属粒子の融点以上、または共晶温度以上の温度で前記電極ペーストを焼成して、前記電極ペーストを前記電極形成溝上に凝集させて凝固させることにより、前記電極形成溝の幅の電極を形成する第4工程と、
を含むことを特徴とする太陽電池セルの製造方法。 - 前記電極内部に空隙が存在しないこと、
を特徴とする請求項1に記載の太陽電池セルの製造方法。 - 前記半導体基板がシリコン基板であり、前記電極印刷ペーストは前記金属粒子として銀、銅、金、白金、鉛、アルミニウムのうちの何れかの成分単独もしくは複数、またはこれらの成分の合金の金属粒子を含むこと、
を特徴とする請求項1に記載の太陽電池セルの製造方法。 - 前記絶縁膜がシリコン系絶縁膜であること、
を特徴とする請求項1に記載の太陽電池セルの製造方法。 - 前記電極が受光面側電極であり、前記絶縁膜が反射防止膜であること、
を特徴とする請求項1に記載の太陽電池セルの製造方法。 - 半導体基板と、
前記半導体基板の一面側に形成された絶縁膜と、
前記絶縁膜に設けられた溝に埋め込まれるとともに前記絶縁膜の表面から前記溝と同じ幅で突出して設けられて前記半導体基板の一面側に電気的に接続する電極と、
を備えることを特徴とする太陽電池セル。 - 前記電極が受光面側電極であり、前記絶縁膜が反射防止膜であること、
を特徴とする請求項6に記載の太陽電池セル。 - 前記電極内部に空隙が存在しないこと、
を特徴とする請求項6に記載の太陽電池セル。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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PCT/JP2009/063126 WO2011010373A1 (ja) | 2009-07-22 | 2009-07-22 | 太陽電池セルおよびその製造方法 |
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JPWO2011010373A1 true JPWO2011010373A1 (ja) | 2012-12-27 |
JP5410526B2 JP5410526B2 (ja) | 2014-02-05 |
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US (2) | US8975109B2 (ja) |
EP (1) | EP2458641B1 (ja) |
JP (1) | JP5410526B2 (ja) |
CN (1) | CN102576776B (ja) |
WO (1) | WO2011010373A1 (ja) |
Families Citing this family (11)
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CN102856413B (zh) * | 2012-10-10 | 2015-11-25 | 英利能源(中国)有限公司 | 全玻组件 |
CN103489934B (zh) * | 2013-09-25 | 2016-03-02 | 晶澳(扬州)太阳能科技有限公司 | 一种双面透光的局部铝背场太阳能电池及其制备方法 |
KR101861172B1 (ko) * | 2014-07-09 | 2018-05-28 | 엘지전자 주식회사 | 태양 전지 |
JP2017139351A (ja) * | 2016-02-04 | 2017-08-10 | 京都エレックス株式会社 | 太陽電池素子の製造方法および太陽電池素子 |
CN105679845A (zh) * | 2016-02-26 | 2016-06-15 | 上饶光电高科技有限公司 | 一种降低晶硅太阳能电池成本提高效率的方法 |
JP2017162943A (ja) * | 2016-03-08 | 2017-09-14 | 東洋アルミニウム株式会社 | 太陽電池の電極形成方法 |
CN105742378A (zh) * | 2016-04-14 | 2016-07-06 | 泰州中来光电科技有限公司 | 一种n型太阳能电池的金属化方法和电池及组件、系统 |
CN106847943B (zh) * | 2017-03-03 | 2018-10-09 | 广东爱旭科技股份有限公司 | 打孔perc双面太阳能电池及其组件、系统和制备方法 |
KR20210072110A (ko) * | 2018-10-29 | 2021-06-16 | 아토비무 유겐가이샤 | 태양전지 및 태양전지의 제조방법 |
CN111584654A (zh) * | 2020-03-31 | 2020-08-25 | 天津爱旭太阳能科技有限公司 | 一种制备晶硅太阳能电池电极的方法 |
CN112599632A (zh) * | 2020-11-25 | 2021-04-02 | 无锡日托光伏科技有限公司 | 一种mwt电池制备方法及mwt电池 |
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2009
- 2009-07-22 CN CN200980159890.8A patent/CN102576776B/zh not_active Expired - Fee Related
- 2009-07-22 JP JP2011523512A patent/JP5410526B2/ja not_active Expired - Fee Related
- 2009-07-22 WO PCT/JP2009/063126 patent/WO2011010373A1/ja active Application Filing
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Also Published As
Publication number | Publication date |
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WO2011010373A1 (ja) | 2011-01-27 |
CN102576776A (zh) | 2012-07-11 |
CN102576776B (zh) | 2015-07-22 |
JP5410526B2 (ja) | 2014-02-05 |
US9647147B2 (en) | 2017-05-09 |
US20120055548A1 (en) | 2012-03-08 |
EP2458641B1 (en) | 2017-08-23 |
EP2458641A4 (en) | 2014-01-01 |
US8975109B2 (en) | 2015-03-10 |
US20140041724A1 (en) | 2014-02-13 |
EP2458641A1 (en) | 2012-05-30 |
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