JPWO2010110069A1 - ダイボンディング用樹脂ペースト、それを用いた半導体装置の製造方法、及び半導体装置 - Google Patents
ダイボンディング用樹脂ペースト、それを用いた半導体装置の製造方法、及び半導体装置 Download PDFInfo
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- JPWO2010110069A1 JPWO2010110069A1 JP2011505970A JP2011505970A JPWO2010110069A1 JP WO2010110069 A1 JPWO2010110069 A1 JP WO2010110069A1 JP 2011505970 A JP2011505970 A JP 2011505970A JP 2011505970 A JP2011505970 A JP 2011505970A JP WO2010110069 A1 JPWO2010110069 A1 JP WO2010110069A1
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Images
Classifications
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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- C—CHEMISTRY; METALLURGY
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
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- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H01L2924/00011—Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
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- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H01L2924/156—Material
- H01L2924/157—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2924/15738—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
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- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
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- H01L2924/181—Encapsulation
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- Engineering & Computer Science (AREA)
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- Manufacturing & Machinery (AREA)
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- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
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Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2009070531 | 2009-03-23 | ||
JP2009070531 | 2009-03-23 | ||
PCT/JP2010/054027 WO2010110069A1 (ja) | 2009-03-23 | 2010-03-10 | ダイボンディング用樹脂ペースト、それを用いた半導体装置の製造方法、及び半導体装置 |
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JPWO2010110069A1 true JPWO2010110069A1 (ja) | 2012-09-27 |
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JP (1) | JPWO2010110069A1 (zh) |
KR (1) | KR20120010220A (zh) |
CN (1) | CN102272908A (zh) |
TW (1) | TW201038699A (zh) |
WO (1) | WO2010110069A1 (zh) |
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WO2017002315A1 (ja) * | 2015-06-29 | 2017-01-05 | タツタ電線株式会社 | 放熱材料接着用組成物、接着剤付放熱材料、インレイ基板、及びその製造方法 |
US9704820B1 (en) * | 2016-02-26 | 2017-07-11 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor manufacturing method and associated semiconductor manufacturing system |
US10590232B2 (en) * | 2016-06-02 | 2020-03-17 | Hitachi Chemical Company, Ltd. | Resin composition and method of producing laminate |
MY181313A (en) | 2016-08-22 | 2020-12-21 | Senju Metal Industry Co | Metallic sintered bonding body and die bonding method |
CN107541168A (zh) * | 2017-07-31 | 2018-01-05 | 常州聚盛节能工程有限公司 | 一种建筑结构胶及其制备方法 |
KR20210145737A (ko) * | 2019-04-25 | 2021-12-02 | 쇼와덴코머티리얼즈가부시끼가이샤 | 돌멘 구조를 갖는 반도체 장치 및 그 제조 방법 |
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DE19845607A1 (de) * | 1998-10-06 | 2000-04-20 | Henkel Teroson Gmbh | Schlagfeste Epoxidharz-Zusammensetzungen |
KR101032227B1 (ko) * | 2000-02-15 | 2011-05-02 | 히다치 가세고교 가부시끼가이샤 | 접착제 조성물, 그 제조 방법, 이것을 이용한 접착 필름, 반도체 탑재용 기판 및 반도체 장치 |
JP2005281673A (ja) * | 2004-03-02 | 2005-10-13 | Tamura Kaken Co Ltd | 熱硬化性樹脂組成物、樹脂フィルムおよび製品 |
JP2009019171A (ja) * | 2007-07-13 | 2009-01-29 | Kyocera Chemical Corp | ダイボンディングペースト |
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- 2010-03-10 JP JP2011505970A patent/JPWO2010110069A1/ja active Pending
- 2010-03-10 KR KR1020117015583A patent/KR20120010220A/ko not_active Application Discontinuation
- 2010-03-10 CN CN2010800041529A patent/CN102272908A/zh active Pending
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WO2010110069A1 (ja) | 2010-09-30 |
CN102272908A (zh) | 2011-12-07 |
KR20120010220A (ko) | 2012-02-02 |
TW201038699A (en) | 2010-11-01 |
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