JPWO2007129544A1 - 半導体発光素子および波長可変レーザ光源 - Google Patents
半導体発光素子および波長可変レーザ光源 Download PDFInfo
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- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
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- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0612—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by temperature
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- H01S5/00—Semiconductor lasers
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- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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Abstract
Description
2 外部鏡
3 光バンドパスフィルタ
4 外部共振器型レーザ
11、51 半導体基板
12、53 活性層
13a、13b 埋込み層
14a、58a 一方の端面
14b、58b 他方の端面
15、59 部分加熱手段
16、54 クラッド層
17a、57a 第1の電極
17b、57b 第2の電極
18 溝部
19 反射防止膜
56 第1の絶縁膜
151、591 絶縁膜
152、592 薄膜抵抗
153、593 端子部
(第1の実施形態)
本発明に係る半導体発光素子の第1の実施形態を図1に示す。図1(a)は図2におけるX−X断面図、図1(b)は図2におけるY−Y断面図である。
例えば、
L1+L2=1mm、L3=5mm
neq,1=neq,2=3.23、neq,3=1
λ=1.55μm
とすれば、縦モード間隔δλは0.14nm(≒17GHz)となる。
本発明に係る半導体発光素子の第2の実施形態を図4に示す。第2の実施形態の半導体発光素子は、図4(a)の平面図および図4(b)のY−Y断面図に示すように、第1の実施形態の構成に加えて、活性層加熱領域の両側面の結晶層に光の導波方向に沿った溝部18を含む。
本発明に係る半導体発光素子の第3の実施形態を図5に示す。図5(a)は平面図、図5(b)は図5(a)のX−X断面図、図5(c)は図5(b)のY−Y断面図である。
本発明に係る半導体発光素子の第4の実施形態を図6に示す。本実施形態の半導体発光素子は第1の実施形態と同様の埋込み型である。ただし、第1の実施形態とは、劈開による両方の端面の法線に対して活性層12が所定の角度をもって開口している点が異なる。
また、SLDとして使用した場合には、加熱手段を動作させることで、発光スペクトルの半値幅が広くなるという効果を有し、主に計測用光源として有効である。
Claims (6)
- 半導体基板(11)と、
前記半導体基板上にストライプ状に形成され、光を放出および導波する活性層(12)と、
前記活性層の側面に形成された埋込み層(13a、13b)と、
前記活性層および前記埋込み層の上方に形成されたクラッド層(16)と、
前記クラッド層の上方に形成された第1の電極(17a)と、
前記半導体基板の下方に形成された第2の電極(17b)とを含み、
前記活性層が劈開によって形成された両端面の一方の端面(14a)の法線に対して所定の角度を持って開口している半導体発光素子において、
前記活性層の光の導波方向の所定長さ部分を加熱する部分加熱手段(15)が、
前記第1の電極の上方で、前記一方の端面位置から熱的に独立した位置に形成されていることを特徴とする半導体発光素子。 - 半導体基板(51)と、
前記半導体基板上に形成された活性層(53)と、
前記活性層の上方に形成されたクラッド層(54)と、
前記クラッド層の上方に形成された絶縁膜(56)と、
前記絶縁膜の上方に形成された第1の電極(57a)と、
前記半導体基板の下方に形成された第2の電極(57b)とを含み、
前記活性層の上方にリッジ部を有し、かつ前記活性層が劈開によって形成された両端面の一方の端面(58a)の法線に対して所定の角度を持って開口しているリッジ導波路型の半導体発光素子において、
前記活性層の光の導波方向の所定長さ部分を加熱する部分加熱手段(59)が、
前記第1の電極の上方で、前記一方の端面位置から熱的に独立した位置に形成されていることを特徴とする半導体発光素子。 - 前記部分加熱手段が、
絶縁膜(151、591)と、
前記絶縁膜上に形成された薄膜抵抗(152、592)と、
前記薄膜抵抗に電力を供給するための少なくとも2つの端子部(153、593)とを有することを特徴とする請求項1または請求項2に記載の半導体発光素子。 - 前記活性層が、劈開によって形成された他方の端面(14b、58b)に対してほぼ垂直に開口していることを特徴とする請求項1から請求項3のいずれか一項に記載の半導体発光素子。
- 前記活性層が、劈開によって形成された他方の端面(14b、58b)の法線に対して所定の角度を持って開口しており、かつ、前記部分加熱手段が前記他方の端面位置から熱的に独立した位置に形成されていることを特徴とする請求項1から請求項3のいずれか一項に記載の半導体発光素子。
- 請求項1から請求項5のいずれか一項に記載の半導体発光素子(1)と、
前記半導体発光素子の前記一方の端面に形成された反射防止膜(19)と、
前記一方の端面から放出される光の光軸上に配置され、前記一方の端面から放出された光を前記一方の端面に帰還させる出射光帰還手段(2)と、
前記半導体発光素子と前記出射光帰還手段とで構成されるレーザ共振器の発振波長を選択する波長選択手段(3)とを含み、
前記半導体発光素子の前記少なくとも2つの端子部を介して前記薄膜抵抗に供給する電力、および、前記波長選択手段が選択する波長を変化させることにより、前記レーザ共振器の発振波長を変化させることを特徴とする波長可変レーザ光源。
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JP2006127427 | 2006-05-01 | ||
JP2006127427 | 2006-05-01 | ||
PCT/JP2007/058586 WO2007129544A1 (ja) | 2006-05-01 | 2007-04-20 | 半導体発光素子および波長可変レーザ光源 |
JP2008514420A JP4891316B2 (ja) | 2006-05-01 | 2007-04-20 | 半導体発光素子および波長可変レーザ光源 |
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EP (1) | EP2015410B1 (ja) |
JP (1) | JP4891316B2 (ja) |
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CN101640962A (zh) * | 2009-09-14 | 2010-02-03 | 烽火通信科技股份有限公司 | 具有保护功能的种子光源装置及实现方法 |
CN104412148B (zh) | 2012-05-17 | 2017-10-10 | 菲尼萨公司 | 用于无源光网络(pon)应用的直接调制激光器 |
CN103259187B (zh) * | 2013-05-20 | 2016-01-13 | 浙江大学 | 基于片上加热电阻波长调谐的v型耦合腔半导体激光器 |
US10069277B2 (en) | 2014-12-12 | 2018-09-04 | Nec Corporation | Variable wavelength laser device |
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JP3152424B2 (ja) | 1990-07-13 | 2001-04-03 | 株式会社日立製作所 | 波長可変半導体レーザ |
JP3247431B2 (ja) | 1992-06-17 | 2002-01-15 | アンリツ株式会社 | 分布反射型半導体レーザ |
JP3247450B2 (ja) * | 1992-09-14 | 2002-01-15 | アンリツ株式会社 | 半導体発光素子および外部共振器型半導体光装置 |
FR2706079B1 (fr) * | 1993-06-02 | 1995-07-21 | France Telecom | Composant intégré monolithique laser-modulateur à structure multi-puits quantiques. |
JPH07335965A (ja) | 1994-06-06 | 1995-12-22 | Anritsu Corp | 可変波長光源装置 |
CA2212736C (en) * | 1995-03-07 | 2001-05-29 | British Telecommunications Public Limited Company | A laser |
US5870417A (en) * | 1996-12-20 | 1999-02-09 | Sdl, Inc. | Thermal compensators for waveguide DBR laser sources |
US6091755A (en) * | 1997-11-21 | 2000-07-18 | Sdl, Inc. | Optically amplifying semiconductor diodes with curved waveguides for external cavities |
JP4074724B2 (ja) * | 1999-04-07 | 2008-04-09 | 日本オプネクスト株式会社 | 波長可変光源及びそれを用いた光学装置 |
WO2001004999A1 (en) * | 1999-07-07 | 2001-01-18 | Cyoptics Ltd. | Laser wavelength stabilization |
JP2004518287A (ja) * | 2000-10-30 | 2004-06-17 | サンター コーポレイション | 熱によるレーザ素子のチューニング |
JP4106210B2 (ja) * | 2001-11-02 | 2008-06-25 | 三菱電機株式会社 | 光半導体素子 |
US20050111512A1 (en) * | 2003-09-17 | 2005-05-26 | Martina Krieg | Apparatus for generating and transmitting laser light |
JP4634081B2 (ja) * | 2004-03-04 | 2011-02-16 | 浜松ホトニクス株式会社 | 半導体レーザ素子及び半導体レーザ素子アレイ |
JP2005260023A (ja) * | 2004-03-12 | 2005-09-22 | Fuji Photo Film Co Ltd | 半導体レーザ素子 |
US7257142B2 (en) * | 2004-03-29 | 2007-08-14 | Intel Corporation | Semi-integrated designs for external cavity tunable lasers |
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- 2007-04-20 EP EP07742022.2A patent/EP2015410B1/en not_active Expired - Fee Related
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CN101479897A (zh) | 2009-07-08 |
CN101479897B (zh) | 2011-05-25 |
EP2015410A1 (en) | 2009-01-14 |
WO2007129544A1 (ja) | 2007-11-15 |
US8351472B2 (en) | 2013-01-08 |
JP4891316B2 (ja) | 2012-03-07 |
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EP2015410A4 (en) | 2012-01-04 |
US20110096799A1 (en) | 2011-04-28 |
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