JPWO2007066501A1 - Xyテーブルアクチュエータ - Google Patents
Xyテーブルアクチュエータ Download PDFInfo
- Publication number
- JPWO2007066501A1 JPWO2007066501A1 JP2007549060A JP2007549060A JPWO2007066501A1 JP WO2007066501 A1 JPWO2007066501 A1 JP WO2007066501A1 JP 2007549060 A JP2007549060 A JP 2007549060A JP 2007549060 A JP2007549060 A JP 2007549060A JP WO2007066501 A1 JPWO2007066501 A1 JP WO2007066501A1
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- Prior art keywords
- plate
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- moving
- fixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005096 rolling process Methods 0.000 claims abstract description 57
- 238000003860 storage Methods 0.000 claims abstract description 29
- 230000004308 accommodation Effects 0.000 claims abstract description 14
- 239000007787 solid Substances 0.000 claims description 5
- 230000001050 lubricating effect Effects 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000314 lubricant Substances 0.000 description 4
- 238000001746 injection moulding Methods 0.000 description 3
- 230000005291 magnetic effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G12—INSTRUMENT DETAILS
- G12B—CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
- G12B5/00—Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof; Compensating for the effects of tilting or acceleration, e.g. for optical apparatus
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C29/00—Bearings for parts moving only linearly
- F16C29/008—Systems with a plurality of bearings, e.g. four carriages supporting a slide on two parallel rails
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C29/00—Bearings for parts moving only linearly
- F16C29/04—Ball or roller bearings
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C41/00—Other accessories, e.g. devices integrated in the bearing not relating to the bearing function as such
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T74/00—Machine element or mechanism
- Y10T74/20—Control lever and linkage systems
- Y10T74/20207—Multiple controlling elements for single controlled element
- Y10T74/20341—Power elements as controlling elements
- Y10T74/20354—Planar surface with orthogonal movement only
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bearings For Parts Moving Linearly (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Linear Motors (AREA)
- Machine Tool Units (AREA)
- Control Of Position Or Direction (AREA)
Abstract
Description
Claims (9)
- X方向に沿う収容溝(20)を有して略チャネル状に形成された固定プレート(2)と、Y方向に沿う収容溝を有して略チャネル状に形成された移動プレート(5)と、下半体が転動体(3)を介して前記固定プレートの収容溝内に組み付けられる一方、上半体が転動体(3)を介して前記移動プレートの収容溝内に組み付けられ、前記固定プレートに対してはX方向に、前記移動プレートに対してはY方向へ移動自在な中間プレート(4)と、前記固定プレートに対して中間プレートをX方向へ推進するX駆動手段(6)と、前記中間プレートに対して移動プレートをY方向へ推進するY駆動手段(7)と、から構成され、
前記中間プレートには前記X駆動手段及びY駆動手段の収容室(40,41)を夫々設けたことを特徴とするXYテーブルアクチュエータ。 - 前記X駆動手段(6)及びY駆動手段(7)を中間プレート(4)に搭載したことを特徴とする請求項1記載のXYテーブルアクチュエータ。
- 前記X駆動手段(6)の収容室とY駆動手段(7)の収容室はXY平面内で隣接していることを特徴とする請求項1記載のXYテーブルアクチュエータ。
- 前記中間プレート(4)には、当該中間プレートの固定プレート(2)に対する移動量を検出するX方向センサ(90)と、当該中間プレート(4)の移動プレート(5)に対する移動量を検出するY方向センサ(91)とが搭載され、
これらX方向センサ(90)及びY方向センサ(91)の信号線を前記X駆動手段(6)及びY駆動手段(7)の信号線と一纏めにして前記中間プレート(4)から引き出したことを特徴とする請求項1記載のXYテーブルアクチュエータ。 - 前記X方向センサ(90)、Y方向センサ(91)、前記X駆動手段(6)及びY駆動手段(7)の信号線は1枚のフレキシブルプリント配線板(92)に収容されて前記中間プレート(4)から引き出されていることを特徴とする請求項4記載のXYテーブルアクチュエータ。
- 前記中間プレート(4)から引き出されたフレキシブルプリント配線板(92)は、その面がX方向又はY方向に向いていることを特徴とする請求項5記載のXYテーブルアクチュエータ。
- 前記X駆動手段(6)を固定プレート(2)に、前記Y駆動手段(7)を移動プレート(5)に搭載したことを特徴とする請求項1記載のXYテーブルアクチュエータ。
- 前記中間プレート(4)には、前記固定プレート(2)との間でボール(3)が荷重を負荷しながら転動するボール転走溝(232)がX方向に沿って形成される一方、前記移動プレート(5)との間でボール(3)が荷重を負荷しながら転動するボール転走溝(232)がY方向に沿って形成され、更に前記ボールが循環する無限軌道(203)が具備され、
前記中間プレート(4)に形成されたX方向のボール転走溝は固定プレート(2)のX方向長さよりも短く形成される一方、前記中間プレート(4)に形成されたY方向のボール転走溝は移動プレート(5)のY方向長さよりも短く形成されていることを特徴とする請求項1記載のXYテーブルアクチュエータ。 - 前記無限軌道(203)を循環するボール(3)の表面は固体潤滑膜によって覆われていることを特徴とする請求項8記載のXYテーブルアクチュエータ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007549060A JP4969455B2 (ja) | 2005-12-06 | 2006-11-20 | Xyテーブルアクチュエータ |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005352378 | 2005-12-06 | ||
JP2005352378 | 2005-12-06 | ||
JP2006181682 | 2006-06-30 | ||
JP2006181682 | 2006-06-30 | ||
PCT/JP2006/323116 WO2007066501A1 (ja) | 2005-12-06 | 2006-11-20 | Xyテーブルアクチュエータ |
JP2007549060A JP4969455B2 (ja) | 2005-12-06 | 2006-11-20 | Xyテーブルアクチュエータ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2007066501A1 true JPWO2007066501A1 (ja) | 2009-05-14 |
JP4969455B2 JP4969455B2 (ja) | 2012-07-04 |
Family
ID=38122650
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007549060A Active JP4969455B2 (ja) | 2005-12-06 | 2006-11-20 | Xyテーブルアクチュエータ |
Country Status (6)
Country | Link |
---|---|
US (1) | US8047095B2 (ja) |
JP (1) | JP4969455B2 (ja) |
KR (1) | KR101275978B1 (ja) |
CN (1) | CN101326588B (ja) |
DE (1) | DE112006003352B4 (ja) |
WO (1) | WO2007066501A1 (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008149718A1 (ja) * | 2007-05-30 | 2008-12-11 | Thk Co., Ltd. | Xyテーブルアクチュエータ |
KR100935150B1 (ko) * | 2008-02-26 | 2010-01-06 | 챔프다이아(주) | 다이아몬드 바이트 연마장치 |
JP4381468B1 (ja) * | 2009-01-06 | 2009-12-09 | 株式会社新川 | 2方向移動テーブル |
CN102969030B (zh) * | 2012-12-03 | 2014-07-30 | 哈尔滨工业大学 | 平面型精密二维微位移台 |
CN103010484B (zh) * | 2012-12-10 | 2016-09-14 | 中国飞机强度研究所 | 一种随动支持装置 |
DE102012224075A1 (de) | 2012-12-20 | 2014-06-26 | Continental Teves Ag & Co. Ohg | Sensor zum Erfassen einer Position eines Geberelements |
CN103617812B (zh) * | 2013-11-20 | 2015-10-14 | 贵州航天南海科技有限责任公司 | 一种平移器 |
CN103617813B (zh) * | 2013-11-22 | 2016-07-06 | 贵州航天南海科技有限责任公司 | 一种组合式五维调整器 |
KR101520401B1 (ko) | 2015-01-13 | 2015-05-15 | 재단법인차세대융합기술연구원 | 이동 가능한 테이블 시스템 |
CN104985432A (zh) * | 2015-06-29 | 2015-10-21 | 电子科技大学 | 平面三自由度运动平台 |
CN105500145A (zh) * | 2016-01-05 | 2016-04-20 | 江苏贝特管件有限公司 | 面向柱形或球形零件的加工系统 |
WO2018067567A1 (en) * | 2016-10-05 | 2018-04-12 | Laitram, Llc | Linear-motor conveyor system |
KR101989120B1 (ko) | 2017-08-04 | 2019-06-13 | 이노6 주식회사 | 이동 가능한 테이블 시스템 |
US10837540B2 (en) * | 2017-09-19 | 2020-11-17 | Applied Materials Israel Ltd. | Lubrication system and a method for lubricating a transmission system component |
KR102337154B1 (ko) * | 2017-12-07 | 2021-12-09 | 재단법인대구경북과학기술원 | 2축 슬라이딩장치 |
KR20190083193A (ko) | 2018-01-03 | 2019-07-11 | 이노6 주식회사 | 이동 가능한 반발력 저감 테이블 시스템 |
KR102070756B1 (ko) | 2018-03-15 | 2020-01-29 | 이노6 주식회사 | 다축 구조 스테이지 |
CN111954906A (zh) * | 2019-03-15 | 2020-11-17 | 富善科技有限公司 | 测微头和使用该测微头的工作台机构 |
KR102407790B1 (ko) | 2020-11-05 | 2022-06-13 | 이노6 주식회사 | 반발력 저감 테이블 시스템 |
KR102602634B1 (ko) | 2021-02-25 | 2023-11-16 | 이노6 주식회사 | 힌지구조를 갖는 스테이지 |
WO2024111713A1 (ko) | 2022-11-25 | 2024-05-30 | 이노로보틱스 주식회사 | 베이스 평탄 조절 조립체 |
KR20240099580A (ko) | 2022-12-22 | 2024-07-01 | 이노로보틱스 주식회사 | Uvw 스테이지 |
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-
2006
- 2006-11-20 WO PCT/JP2006/323116 patent/WO2007066501A1/ja active Application Filing
- 2006-11-20 JP JP2007549060A patent/JP4969455B2/ja active Active
- 2006-11-20 CN CN2006800459590A patent/CN101326588B/zh active Active
- 2006-11-20 US US12/095,971 patent/US8047095B2/en active Active
- 2006-11-20 DE DE112006003352.2T patent/DE112006003352B4/de active Active
-
2008
- 2008-07-04 KR KR1020087016289A patent/KR101275978B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
CN101326588A (zh) | 2008-12-17 |
KR20080083297A (ko) | 2008-09-17 |
WO2007066501A1 (ja) | 2007-06-14 |
DE112006003352B4 (de) | 2017-05-11 |
US20100024587A1 (en) | 2010-02-04 |
CN101326588B (zh) | 2010-11-17 |
DE112006003352T5 (de) | 2008-10-09 |
US8047095B2 (en) | 2011-11-01 |
KR101275978B1 (ko) | 2013-06-14 |
JP4969455B2 (ja) | 2012-07-04 |
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