JPWO2004081999A1 - 光学装置、露光装置、並びにデバイス製造方法 - Google Patents

光学装置、露光装置、並びにデバイス製造方法 Download PDF

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Publication number
JPWO2004081999A1
JPWO2004081999A1 JP2005503568A JP2005503568A JPWO2004081999A1 JP WO2004081999 A1 JPWO2004081999 A1 JP WO2004081999A1 JP 2005503568 A JP2005503568 A JP 2005503568A JP 2005503568 A JP2005503568 A JP 2005503568A JP WO2004081999 A1 JPWO2004081999 A1 JP WO2004081999A1
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JP
Japan
Prior art keywords
optical
space
optical member
gas
magnetic fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005503568A
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English (en)
Japanese (ja)
Inventor
仁 西川
仁 西川
青木　貴史
貴史 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPWO2004081999A1 publication Critical patent/JPWO2004081999A1/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/006—Filter holders
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/007—Pressure-resistant sight glasses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005503568A 2003-03-12 2004-03-11 光学装置、露光装置、並びにデバイス製造方法 Pending JPWO2004081999A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003067143 2003-03-12
JP2003067143 2003-03-12
PCT/JP2004/003190 WO2004081999A1 (fr) 2003-03-12 2004-03-11 Dispositif optique, appareil d'exposition et procede de fabrication du dispositif

Publications (1)

Publication Number Publication Date
JPWO2004081999A1 true JPWO2004081999A1 (ja) 2006-06-15

Family

ID=32984556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005503568A Pending JPWO2004081999A1 (ja) 2003-03-12 2004-03-11 光学装置、露光装置、並びにデバイス製造方法

Country Status (3)

Country Link
JP (1) JPWO2004081999A1 (fr)
TW (1) TW200500815A (fr)
WO (1) WO2004081999A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2172809B1 (fr) * 2003-04-11 2018-11-07 Nikon Corporation Méthode de nettoyage pour des optiques dans un appareil de lithographie par immersion, et appareil de lithographie par immersion correspondant
JP2006173295A (ja) * 2004-12-15 2006-06-29 Jsr Corp 液浸型露光装置及び液浸型露光方法
JP5183955B2 (ja) * 2006-04-07 2013-04-17 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学エレメントのための保持デバイス
JP5778093B2 (ja) * 2011-08-10 2015-09-16 エーエスエムエル ネザーランズ ビー．ブイ． 基板テーブルアセンブリ、液浸リソグラフィ装置及びデバイス製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0221074A (ja) * 1988-07-07 1990-01-24 Fujitsu Ltd 気密防振接続機構
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JPH10144602A (ja) * 1996-11-14 1998-05-29 Nikon Corp 反射ミラー保持装置及び投影露光装置
JP2001035773A (ja) * 1999-07-19 2001-02-09 Nikon Corp 照明光学装置及び露光装置
JP4403611B2 (ja) * 1999-08-24 2010-01-27 Ｎｏｋ株式会社 軸シール

Also Published As

Publication number Publication date
WO2004081999A1 (fr) 2004-09-23
TW200500815A (en) 2005-01-01

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