TW200500815A - Optical device, exposure apparatus and method for manufacturing device - Google Patents

Optical device, exposure apparatus and method for manufacturing device

Info

Publication number
TW200500815A
TW200500815A TW093106570A TW93106570A TW200500815A TW 200500815 A TW200500815 A TW 200500815A TW 093106570 A TW093106570 A TW 093106570A TW 93106570 A TW93106570 A TW 93106570A TW 200500815 A TW200500815 A TW 200500815A
Authority
TW
Taiwan
Prior art keywords
space
optical
optical device
exposure apparatus
gas
Prior art date
Application number
TW093106570A
Other languages
English (en)
Inventor
Jin Nishikawa
Takashi Aoki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200500815A publication Critical patent/TW200500815A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/006—Filter holders
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/007—Pressure-resistant sight glasses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093106570A 2003-03-12 2004-03-12 Optical device, exposure apparatus and method for manufacturing device TW200500815A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003067143 2003-03-12

Publications (1)

Publication Number Publication Date
TW200500815A true TW200500815A (en) 2005-01-01

Family

ID=32984556

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093106570A TW200500815A (en) 2003-03-12 2004-03-12 Optical device, exposure apparatus and method for manufacturing device

Country Status (3)

Country Link
JP (1) JPWO2004081999A1 (zh)
TW (1) TW200500815A (zh)
WO (1) WO2004081999A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2166413A1 (en) * 2003-04-11 2010-03-24 Nikon Corporation Cleanup method for optics in immersion lithography
JP2006173295A (ja) * 2004-12-15 2006-06-29 Jsr Corp 液浸型露光装置及び液浸型露光方法
JP5183955B2 (ja) * 2006-04-07 2013-04-17 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学エレメントのための保持デバイス
JP5778093B2 (ja) 2011-08-10 2015-09-16 エーエスエムエル ネザーランズ ビー．ブイ． 基板テーブルアセンブリ、液浸リソグラフィ装置及びデバイス製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0221074A (ja) * 1988-07-07 1990-01-24 Fujitsu Ltd 気密防振接続機構
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JPH10144602A (ja) * 1996-11-14 1998-05-29 Nikon Corp 反射ミラー保持装置及び投影露光装置
JP2001035773A (ja) * 1999-07-19 2001-02-09 Nikon Corp 照明光学装置及び露光装置
JP4403611B2 (ja) * 1999-08-24 2010-01-27 Ｎｏｋ株式会社 軸シール

Also Published As

Publication number Publication date
JPWO2004081999A1 (ja) 2006-06-15
WO2004081999A1 (ja) 2004-09-23

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