JPS649824A - Method for thermally treating quartz glass - Google Patents

Method for thermally treating quartz glass

Info

Publication number
JPS649824A
JPS649824A JP16390987A JP16390987A JPS649824A JP S649824 A JPS649824 A JP S649824A JP 16390987 A JP16390987 A JP 16390987A JP 16390987 A JP16390987 A JP 16390987A JP S649824 A JPS649824 A JP S649824A
Authority
JP
Japan
Prior art keywords
quartz glass
washed
hydrofluoric acid
carbon powder
heated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16390987A
Other languages
Japanese (ja)
Inventor
Hideaki Segawa
Shinichi Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Priority to JP16390987A priority Critical patent/JPS649824A/en
Publication of JPS649824A publication Critical patent/JPS649824A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Glass Compositions (AREA)

Abstract

PURPOSE:To enable to prevent crystallization of a quartz glass, by heating the quartz glass washed with hydrofluoric acid to a specific temperature or above in a carbon powder and inert atmosphere. CONSTITUTION:A quartz glass 3 is washed with hydrofluoric acid to remove impurity of surface thereof. Then the treated quartz glass 3 is set in a crucible 5 and a carbon powder 4 is packed around the quartz glass 3 and the quartz glass is heated to >=1,000 deg.C at inert gas atmosphere. Although the crystallization area of quartz glass exists at about >=1,000 deg.C, crystal phase is not produced even when the quartz glass is heated treated at >=1,000 deg.C, according the above- mentioned method. Consequently the method can be utilized in heat treatment of the quartz glass as an optical component or as a window material for clock, airplane, high pressure vessel, etc.
JP16390987A 1987-07-02 1987-07-02 Method for thermally treating quartz glass Pending JPS649824A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16390987A JPS649824A (en) 1987-07-02 1987-07-02 Method for thermally treating quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16390987A JPS649824A (en) 1987-07-02 1987-07-02 Method for thermally treating quartz glass

Publications (1)

Publication Number Publication Date
JPS649824A true JPS649824A (en) 1989-01-13

Family

ID=15783129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16390987A Pending JPS649824A (en) 1987-07-02 1987-07-02 Method for thermally treating quartz glass

Country Status (1)

Country Link
JP (1) JPS649824A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115259640A (en) * 2022-04-15 2022-11-01 常熟佳合显示科技有限公司 Heat treatment method and device for special-shaped curved surface cover plate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599502A (en) * 1982-07-08 1984-01-18 Sumitomo Light Metal Ind Ltd Method for inspecting pipe whose inner surface is painted
JPS5935037A (en) * 1982-08-20 1984-02-25 Shin Etsu Chem Co Ltd Method for molding quartz glass
JPS6230632A (en) * 1985-08-01 1987-02-09 Shinetsu Sekiei Kk Production of high-purity quartz glass

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599502A (en) * 1982-07-08 1984-01-18 Sumitomo Light Metal Ind Ltd Method for inspecting pipe whose inner surface is painted
JPS5935037A (en) * 1982-08-20 1984-02-25 Shin Etsu Chem Co Ltd Method for molding quartz glass
JPS6230632A (en) * 1985-08-01 1987-02-09 Shinetsu Sekiei Kk Production of high-purity quartz glass

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115259640A (en) * 2022-04-15 2022-11-01 常熟佳合显示科技有限公司 Heat treatment method and device for special-shaped curved surface cover plate
CN115259640B (en) * 2022-04-15 2024-05-14 常熟佳合显示科技有限公司 Heat treatment method and device for special-shaped curved surface cover plate

Similar Documents

Publication Publication Date Title
KR890003675B1 (en) Melt consolidation of silicon powder
EP0384284A3 (en) Process for preparing silica having a low silanol content
TW355820B (en) Heat treatment method for a silicon wafer and a silicon wafer heat-treated by the method
JPS649824A (en) Method for thermally treating quartz glass
KR920007942A (en) Dark blue transparent glass-ceramic products
GB923241A (en) A method of and an apparatus for growing crystals in a vessel of vitreous material
DE3067104D1 (en) Process for controlling the temperature of the glass in a thermal treating furnace and thermal glass-treatment furnace for carrying out this process
AU538502B2 (en) Purification of silicon
JPS6424098A (en) Heat treatment of compound semiconductor single crystal
JPS57156342A (en) Purification of raw material powder for quartz glass
JPS5567600A (en) Seed crystal treating method
JPS6445799A (en) Production of cadmium telluride based crystal
Kortovich Jr et al. Method of producing a single crystal article
Joshima et al. Electrolysis Apparatus for Treating Glass Components to Remove Impurities
JPS57167637A (en) Manufacture of semiconductor device
Prokoshkin et al. Dilatometric Effects and Structural Changes During Tempering of Tempered Carbon Steel
JPS5767018A (en) Formation of film
JPS6473000A (en) Heat treatment of gallium arsenide single crystal
JPS6441210A (en) Manufacture of sic thin-film
JPS5717496A (en) Liquid phase growing method for single crystal of compound semiconductor
JPS55144437A (en) Producing optical fiber matrix
Yashiro et al. Effect of Heating Cycles on the Crystal Structure of Oxide Films Formed on the Surface of 18 Cr--Fe Alloy
JPS6487598A (en) Treatment of raw material for compound semiconductor polycrystal
JPS54141389A (en) Crucible used in crystal growing device, manufacture of said crucible and crystal growing method using said crucible
JPS5591116A (en) Method for growing crystal of chemical compound semiconductor