JPS649659A - Semiconductor element - Google Patents

Semiconductor element

Info

Publication number
JPS649659A
JPS649659A JP62164006A JP16400687A JPS649659A JP S649659 A JPS649659 A JP S649659A JP 62164006 A JP62164006 A JP 62164006A JP 16400687 A JP16400687 A JP 16400687A JP S649659 A JPS649659 A JP S649659A
Authority
JP
Japan
Prior art keywords
gate layer
semiconductor element
schottky
schottky electrode
semiconductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62164006A
Other languages
Japanese (ja)
Other versions
JPH0620128B2 (en
Inventor
Kenichi Kasahara
Yoshiharu Tashiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62164006A priority Critical patent/JPH0620128B2/en
Publication of JPS649659A publication Critical patent/JPS649659A/en
Publication of JPH0620128B2 publication Critical patent/JPH0620128B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Thyristors (AREA)

Abstract

PURPOSE:To cut down the turn off time as in GTO for accelerating the response speed by a method wherein a Schottky electrode is formed on a semiconductor layer in a PNPN semiconductor element to be connected to another electrode formed in another semiconductor layer inside a semiconductor element. CONSTITUTION:A Schottky electrode 10 is formed on an N type gate layer 12 comprising a semiconductor layer while the Schottky electrode 10 is connected to a cathode 14 formed into the semiconductor layer inside a semiconductor element. The electrons in the gate layer 12 are attracted to the cathode side through the Schottky electrode 10 formed on the gate layer 12. When the electrons are attracted to the cathode side, holes in a P type gate layer 13 are dragged into the N type gate layer 13 to maintain the electric neutrarity later to be diminished forthwith as minor carriers. Thus, the turn off time can be cut down. The reasons why the Schottky diode is adopted are as follows, i.e., 1) the Schottky diode itself can be operated at higher speed than that of PN diode 2) it can be manufactured easily and 3) building up voltage in the normal direction is low.
JP62164006A 1987-07-02 1987-07-02 Semiconductor element Expired - Lifetime JPH0620128B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62164006A JPH0620128B2 (en) 1987-07-02 1987-07-02 Semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62164006A JPH0620128B2 (en) 1987-07-02 1987-07-02 Semiconductor element

Publications (2)

Publication Number Publication Date
JPS649659A true JPS649659A (en) 1989-01-12
JPH0620128B2 JPH0620128B2 (en) 1994-03-16

Family

ID=15784972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62164006A Expired - Lifetime JPH0620128B2 (en) 1987-07-02 1987-07-02 Semiconductor element

Country Status (1)

Country Link
JP (1) JPH0620128B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005503024A (en) * 2001-09-12 2005-01-27 クリー インコーポレイテッド Large silicon carbide device and manufacturing method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101646438B1 (en) * 2015-01-26 2016-08-12 현대자동차주식회사 Method for controlling temperature of urea-tank and control apparatus thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005503024A (en) * 2001-09-12 2005-01-27 クリー インコーポレイテッド Large silicon carbide device and manufacturing method thereof

Also Published As

Publication number Publication date
JPH0620128B2 (en) 1994-03-16

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