JPS649659A - Semiconductor element - Google Patents
Semiconductor elementInfo
- Publication number
- JPS649659A JPS649659A JP62164006A JP16400687A JPS649659A JP S649659 A JPS649659 A JP S649659A JP 62164006 A JP62164006 A JP 62164006A JP 16400687 A JP16400687 A JP 16400687A JP S649659 A JPS649659 A JP S649659A
- Authority
- JP
- Japan
- Prior art keywords
- gate layer
- semiconductor element
- schottky
- schottky electrode
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Thyristors (AREA)
Abstract
PURPOSE:To cut down the turn off time as in GTO for accelerating the response speed by a method wherein a Schottky electrode is formed on a semiconductor layer in a PNPN semiconductor element to be connected to another electrode formed in another semiconductor layer inside a semiconductor element. CONSTITUTION:A Schottky electrode 10 is formed on an N type gate layer 12 comprising a semiconductor layer while the Schottky electrode 10 is connected to a cathode 14 formed into the semiconductor layer inside a semiconductor element. The electrons in the gate layer 12 are attracted to the cathode side through the Schottky electrode 10 formed on the gate layer 12. When the electrons are attracted to the cathode side, holes in a P type gate layer 13 are dragged into the N type gate layer 13 to maintain the electric neutrarity later to be diminished forthwith as minor carriers. Thus, the turn off time can be cut down. The reasons why the Schottky diode is adopted are as follows, i.e., 1) the Schottky diode itself can be operated at higher speed than that of PN diode 2) it can be manufactured easily and 3) building up voltage in the normal direction is low.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62164006A JPH0620128B2 (en) | 1987-07-02 | 1987-07-02 | Semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62164006A JPH0620128B2 (en) | 1987-07-02 | 1987-07-02 | Semiconductor element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS649659A true JPS649659A (en) | 1989-01-12 |
JPH0620128B2 JPH0620128B2 (en) | 1994-03-16 |
Family
ID=15784972
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62164006A Expired - Lifetime JPH0620128B2 (en) | 1987-07-02 | 1987-07-02 | Semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0620128B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005503024A (en) * | 2001-09-12 | 2005-01-27 | クリー インコーポレイテッド | Large silicon carbide device and manufacturing method thereof |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101646438B1 (en) * | 2015-01-26 | 2016-08-12 | 현대자동차주식회사 | Method for controlling temperature of urea-tank and control apparatus thereof |
-
1987
- 1987-07-02 JP JP62164006A patent/JPH0620128B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005503024A (en) * | 2001-09-12 | 2005-01-27 | クリー インコーポレイテッド | Large silicon carbide device and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
JPH0620128B2 (en) | 1994-03-16 |
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