JPS647651B2 - - Google Patents

Info

Publication number
JPS647651B2
JPS647651B2 JP18458880A JP18458880A JPS647651B2 JP S647651 B2 JPS647651 B2 JP S647651B2 JP 18458880 A JP18458880 A JP 18458880A JP 18458880 A JP18458880 A JP 18458880A JP S647651 B2 JPS647651 B2 JP S647651B2
Authority
JP
Japan
Prior art keywords
resist
benzyl acetate
image
beams
ultraviolet rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18458880A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57108851A (en
Inventor
Yoshitake Oonishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP18458880A priority Critical patent/JPS57108851A/ja
Publication of JPS57108851A publication Critical patent/JPS57108851A/ja
Publication of JPS647651B2 publication Critical patent/JPS647651B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP18458880A 1980-12-25 1980-12-25 Formation of resist image Granted JPS57108851A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18458880A JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18458880A JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Publications (2)

Publication Number Publication Date
JPS57108851A JPS57108851A (en) 1982-07-07
JPS647651B2 true JPS647651B2 (cs) 1989-02-09

Family

ID=16155827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18458880A Granted JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Country Status (1)

Country Link
JP (1) JPS57108851A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055630A (ja) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
PT2309331E (pt) 2009-10-09 2012-02-23 Flexoclean Engineering B V Solvente de lavagem de polímero e sua utilização para revelação de uma placa de impressão flexográfica
US8632961B2 (en) * 2010-01-28 2014-01-21 Eastman Kodak Company Flexographic processing solution and use

Also Published As

Publication number Publication date
JPS57108851A (en) 1982-07-07

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