JPS6472998A - Heat treatment of compound semiconductor single crystal - Google Patents

Heat treatment of compound semiconductor single crystal

Info

Publication number
JPS6472998A
JPS6472998A JP23150487A JP23150487A JPS6472998A JP S6472998 A JPS6472998 A JP S6472998A JP 23150487 A JP23150487 A JP 23150487A JP 23150487 A JP23150487 A JP 23150487A JP S6472998 A JPS6472998 A JP S6472998A
Authority
JP
Japan
Prior art keywords
crystal
vapor pressure
semiconductor single
single crystal
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23150487A
Other languages
Japanese (ja)
Other versions
JPH07115999B2 (en
Inventor
Junzo Takahashi
Kenji Sato
Takehiko Kameyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP62231504A priority Critical patent/JPH07115999B2/en
Publication of JPS6472998A publication Critical patent/JPS6472998A/en
Publication of JPH07115999B2 publication Critical patent/JPH07115999B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To uniformize the electrical characteristics and optical characteristics of a crystal ingot while preventing the decrease in the resistance thereof by putting a grown compd. semiconductor single crystal into a specific vapor pressure atmosphere maintained at a specified temp. CONSTITUTION:The compd. semiconductor single crystal is maintained at the specified temp. in the temp. range of 700 deg.C-m.p. after the growth and the grown crystal body is placed in the atmosphere applied with the vapor pressure in a 10-60 times range of the equiv. vapor pressure of the high vapor pressure component elements at the specified temp. The heat treatment is executed while the excess vapor pressure is exerted to the crystal according to this method and, therefore, the evaporation of the high vapor pressure component elements from the crystal surface is prevented. The impurity atoms and intrinsic defects sticking to the dislocation in the crystal are redistributed while the decrease in the resistance by the stoichiometry collapsing particularly at the end part of the wafer and the increase of the fluctuation in the resistivity are prevented. The electrical characteristics and optical characteristics are thereby uniformized over the entire part of the crystal.
JP62231504A 1987-09-14 1987-09-14 Heat treatment method for compound semiconductor single crystal Expired - Lifetime JPH07115999B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62231504A JPH07115999B2 (en) 1987-09-14 1987-09-14 Heat treatment method for compound semiconductor single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62231504A JPH07115999B2 (en) 1987-09-14 1987-09-14 Heat treatment method for compound semiconductor single crystal

Publications (2)

Publication Number Publication Date
JPS6472998A true JPS6472998A (en) 1989-03-17
JPH07115999B2 JPH07115999B2 (en) 1995-12-13

Family

ID=16924529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62231504A Expired - Lifetime JPH07115999B2 (en) 1987-09-14 1987-09-14 Heat treatment method for compound semiconductor single crystal

Country Status (1)

Country Link
JP (1) JPH07115999B2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522375A (en) * 1975-06-20 1977-01-10 Cominco Ltd Crystal of aluminum arsenide and method of making the same
JPS61106500A (en) * 1984-10-30 1986-05-24 Sumitomo Electric Ind Ltd Method for annealing compound semiconductor substrate
JPS6270300A (en) * 1985-09-19 1987-03-31 Toshiba Corp Semi-insulating gaas single crystal

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522375A (en) * 1975-06-20 1977-01-10 Cominco Ltd Crystal of aluminum arsenide and method of making the same
JPS61106500A (en) * 1984-10-30 1986-05-24 Sumitomo Electric Ind Ltd Method for annealing compound semiconductor substrate
JPS6270300A (en) * 1985-09-19 1987-03-31 Toshiba Corp Semi-insulating gaas single crystal

Also Published As

Publication number Publication date
JPH07115999B2 (en) 1995-12-13

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