JPS6472997A - Heat treatment of compound semiconductor single crystal - Google Patents

Heat treatment of compound semiconductor single crystal

Info

Publication number
JPS6472997A
JPS6472997A JP23150387A JP23150387A JPS6472997A JP S6472997 A JPS6472997 A JP S6472997A JP 23150387 A JP23150387 A JP 23150387A JP 23150387 A JP23150387 A JP 23150387A JP S6472997 A JPS6472997 A JP S6472997A
Authority
JP
Japan
Prior art keywords
temp
single crystal
semiconductor single
heat treatment
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23150387A
Other languages
Japanese (ja)
Other versions
JPH0411520B2 (en
Inventor
Takehiko Kameyama
Junzo Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP23150387A priority Critical patent/JPS6472997A/en
Publication of JPS6472997A publication Critical patent/JPS6472997A/en
Publication of JPH0411520B2 publication Critical patent/JPH0411520B2/ja
Granted legal-status Critical Current

Links

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To increase the resistivity of a low-resistance compd. semiconductor single crystal and to decrease the concn. of EL2 by maintaining the compd. semiconductor single crystal at a specified temp. after the growth thereof and further lowering the temp. of the crystal at a specified rate. CONSTITUTION:The compd. semiconductor single crystal is maintained at the specified temp. in the temp. range of 1,000 deg.C-m.p. after the growth thereof and thereafter, the temp. of the crystal is lowered at 20-250 deg.C rate per minute. Since the heat treatment is executed at a relatively high temp. of >=1,000 deg.C according to this heat treatment method, the resistivity is increased and the concn. of EL2 is decreased; in addition, the temp. falling speed is not excessively high and, therefore, there is no possibility of increasing the dislocation density. The fluctuation in the resistivity, movibility and concn. of EL2 is decreased and the electrical characteristics and optical characteristics over the entire part of the crystal are uniformized.
JP23150387A 1987-09-14 1987-09-14 Heat treatment of compound semiconductor single crystal Granted JPS6472997A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23150387A JPS6472997A (en) 1987-09-14 1987-09-14 Heat treatment of compound semiconductor single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23150387A JPS6472997A (en) 1987-09-14 1987-09-14 Heat treatment of compound semiconductor single crystal

Publications (2)

Publication Number Publication Date
JPS6472997A true JPS6472997A (en) 1989-03-17
JPH0411520B2 JPH0411520B2 (en) 1992-02-28

Family

ID=16924514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23150387A Granted JPS6472997A (en) 1987-09-14 1987-09-14 Heat treatment of compound semiconductor single crystal

Country Status (1)

Country Link
JP (1) JPS6472997A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59190300A (en) * 1983-04-08 1984-10-29 Hitachi Ltd Method and apparatus for production of semiconductor
JPS60210591A (en) * 1984-04-05 1985-10-23 Hitachi Cable Ltd Production of semiinsulating gaas single crystal
JPS62162700A (en) * 1986-01-09 1987-07-18 Furukawa Electric Co Ltd:The Production of compound semiconductor ingot

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59190300A (en) * 1983-04-08 1984-10-29 Hitachi Ltd Method and apparatus for production of semiconductor
JPS60210591A (en) * 1984-04-05 1985-10-23 Hitachi Cable Ltd Production of semiinsulating gaas single crystal
JPS62162700A (en) * 1986-01-09 1987-07-18 Furukawa Electric Co Ltd:The Production of compound semiconductor ingot

Also Published As

Publication number Publication date
JPH0411520B2 (en) 1992-02-28

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