JPS6468948A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6468948A JPS6468948A JP22741087A JP22741087A JPS6468948A JP S6468948 A JPS6468948 A JP S6468948A JP 22741087 A JP22741087 A JP 22741087A JP 22741087 A JP22741087 A JP 22741087A JP S6468948 A JPS6468948 A JP S6468948A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mask
- semiconductor device
- silicon
- conductor part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22741087A JPS6468948A (en) | 1987-09-09 | 1987-09-09 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22741087A JPS6468948A (en) | 1987-09-09 | 1987-09-09 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6468948A true JPS6468948A (en) | 1989-03-15 |
Family
ID=16860400
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22741087A Pending JPS6468948A (en) | 1987-09-09 | 1987-09-09 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6468948A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07176611A (ja) * | 1993-09-15 | 1995-07-14 | Hyundai Electron Ind Co Ltd | 半導体装置の配線製造方法 |
JP2013048274A (ja) * | 2006-01-13 | 2013-03-07 | Internatl Business Mach Corp <Ibm> | 低抵抗及び低インダクタンスの裏面貫通ビア及びその製造方法 |
CN104882369A (zh) * | 2014-02-28 | 2015-09-02 | 株洲南车时代电气股份有限公司 | 碳化硅离子注入掺杂掩膜结构及其制备方法 |
-
1987
- 1987-09-09 JP JP22741087A patent/JPS6468948A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07176611A (ja) * | 1993-09-15 | 1995-07-14 | Hyundai Electron Ind Co Ltd | 半導体装置の配線製造方法 |
JP2013048274A (ja) * | 2006-01-13 | 2013-03-07 | Internatl Business Mach Corp <Ibm> | 低抵抗及び低インダクタンスの裏面貫通ビア及びその製造方法 |
CN104882369A (zh) * | 2014-02-28 | 2015-09-02 | 株洲南车时代电气股份有限公司 | 碳化硅离子注入掺杂掩膜结构及其制备方法 |
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