JPS6467915A - Coating device of resist - Google Patents

Coating device of resist

Info

Publication number
JPS6467915A
JPS6467915A JP22387187A JP22387187A JPS6467915A JP S6467915 A JPS6467915 A JP S6467915A JP 22387187 A JP22387187 A JP 22387187A JP 22387187 A JP22387187 A JP 22387187A JP S6467915 A JPS6467915 A JP S6467915A
Authority
JP
Japan
Prior art keywords
substrate
resist
circular plate
resist solution
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22387187A
Other languages
Japanese (ja)
Inventor
Fumio Otomo
Yoshitaka Fukuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP22387187A priority Critical patent/JPS6467915A/en
Publication of JPS6467915A publication Critical patent/JPS6467915A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To form uniform resist films through all the area of a substrate, by mounting plate materials so that the solvent of a thinner which is evaporated from a resist solution is filled in surroundings on the substrate where the resist solution is added dropwise. CONSTITUTION:A circular plate 10 which is vertically, freely movable and can be rotated is mounted almost parallel to a substrate 3 at the upper part of the substrate 3 which is supported by a spinner 4. The circular plate 10 allows A space between a resist film 5 and the circular plate 10 to be filled with the solvent of a thinner which is evaporated from a resist solution and then, the state of an atmosphere around the substrate 3 to be uniform by rotating the circular plate 10 and further, the time required for forming the resist film 5 to be longer. The time required for forming the resist film 5 can be controlled by moving the circular plate 10 up and down, thereby adjusting a gap between the substrate 3 and the above plate 10. Moreover, when the resist solution is added dropwise from a supply port 1, the upper structure from the surface of the substrate 3 is made up so that it can be slided horizontally.
JP22387187A 1987-09-09 1987-09-09 Coating device of resist Pending JPS6467915A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22387187A JPS6467915A (en) 1987-09-09 1987-09-09 Coating device of resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22387187A JPS6467915A (en) 1987-09-09 1987-09-09 Coating device of resist

Publications (1)

Publication Number Publication Date
JPS6467915A true JPS6467915A (en) 1989-03-14

Family

ID=16805012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22387187A Pending JPS6467915A (en) 1987-09-09 1987-09-09 Coating device of resist

Country Status (1)

Country Link
JP (1) JPS6467915A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100282658B1 (en) * 1992-02-04 2001-03-02 이데이 노부유끼 Rotary coating method and apparatus for film formation on substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100282658B1 (en) * 1992-02-04 2001-03-02 이데이 노부유끼 Rotary coating method and apparatus for film formation on substrate

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