JPS6467915A - Coating device of resist - Google Patents
Coating device of resistInfo
- Publication number
- JPS6467915A JPS6467915A JP22387187A JP22387187A JPS6467915A JP S6467915 A JPS6467915 A JP S6467915A JP 22387187 A JP22387187 A JP 22387187A JP 22387187 A JP22387187 A JP 22387187A JP S6467915 A JPS6467915 A JP S6467915A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- resist
- circular plate
- resist solution
- resist film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To form uniform resist films through all the area of a substrate, by mounting plate materials so that the solvent of a thinner which is evaporated from a resist solution is filled in surroundings on the substrate where the resist solution is added dropwise. CONSTITUTION:A circular plate 10 which is vertically, freely movable and can be rotated is mounted almost parallel to a substrate 3 at the upper part of the substrate 3 which is supported by a spinner 4. The circular plate 10 allows A space between a resist film 5 and the circular plate 10 to be filled with the solvent of a thinner which is evaporated from a resist solution and then, the state of an atmosphere around the substrate 3 to be uniform by rotating the circular plate 10 and further, the time required for forming the resist film 5 to be longer. The time required for forming the resist film 5 can be controlled by moving the circular plate 10 up and down, thereby adjusting a gap between the substrate 3 and the above plate 10. Moreover, when the resist solution is added dropwise from a supply port 1, the upper structure from the surface of the substrate 3 is made up so that it can be slided horizontally.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22387187A JPS6467915A (en) | 1987-09-09 | 1987-09-09 | Coating device of resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22387187A JPS6467915A (en) | 1987-09-09 | 1987-09-09 | Coating device of resist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6467915A true JPS6467915A (en) | 1989-03-14 |
Family
ID=16805012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22387187A Pending JPS6467915A (en) | 1987-09-09 | 1987-09-09 | Coating device of resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6467915A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100282658B1 (en) * | 1992-02-04 | 2001-03-02 | 이데이 노부유끼 | Rotary coating method and apparatus for film formation on substrate |
-
1987
- 1987-09-09 JP JP22387187A patent/JPS6467915A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100282658B1 (en) * | 1992-02-04 | 2001-03-02 | 이데이 노부유끼 | Rotary coating method and apparatus for film formation on substrate |
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