JPS6467824A - Forming device for oxide superconducting material - Google Patents
Forming device for oxide superconducting materialInfo
- Publication number
- JPS6467824A JPS6467824A JP62223674A JP22367487A JPS6467824A JP S6467824 A JPS6467824 A JP S6467824A JP 62223674 A JP62223674 A JP 62223674A JP 22367487 A JP22367487 A JP 22367487A JP S6467824 A JPS6467824 A JP S6467824A
- Authority
- JP
- Japan
- Prior art keywords
- space
- thin film
- oxide superconducting
- gas
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 3
- 239000010409 thin film Substances 0.000 abstract 3
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- 238000001816 cooling Methods 0.000 abstract 1
- 230000006837 decompression Effects 0.000 abstract 1
- 230000005684 electric field Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 230000003993 interaction Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
PURPOSE:To form a thin film at a low temperature by providing a means to feed a reactive gas and an oxide gas to a space with an interaction between the electric field and magnetic field and a means with a plane on which an oxide superconducting material is formed. CONSTITUTION:A plasma generating space 31 kept at the atmospheric temperature or the decompression state, an auxiliary space 12, electromagnets 15, 15' generating the magnetic field, their power source 35, a microwave oscillator 14, and a vacuum pump 26 constituting an exhaust channel are provided. This device is further constituted of a rotary pump 24, a pressure adjusting valve 19, a substrate holder 10', an object for film formation 10, a microwave guide window 39, gas channels 16, 17, water cooling channels 28, 28', a halogen lamp 20, a reflecting mirror 21, and a heating space 13. The object for thin film formation 10 is installed on the substrate holder 10' and arranged in the plasma generating space 31 from a gate valve 11. A polycrystalline oxide superconducting thin film can be thereby formed at the low substrate temperature of 200-500 deg.C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62223674A JPS6467824A (en) | 1987-09-07 | 1987-09-07 | Forming device for oxide superconducting material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62223674A JPS6467824A (en) | 1987-09-07 | 1987-09-07 | Forming device for oxide superconducting material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6467824A true JPS6467824A (en) | 1989-03-14 |
JPH0556282B2 JPH0556282B2 (en) | 1993-08-19 |
Family
ID=16801869
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62223674A Granted JPS6467824A (en) | 1987-09-07 | 1987-09-07 | Forming device for oxide superconducting material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6467824A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0288408A (en) * | 1988-05-31 | 1990-03-28 | Mitsubishi Metal Corp | Production of superconducting ceramic film |
JPH0288763A (en) * | 1988-09-26 | 1990-03-28 | Matsushita Electric Ind Co Ltd | Thin film superconductor, method and apparatus for producing same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI388078B (en) * | 2008-01-30 | 2013-03-01 | Osram Opto Semiconductors Gmbh | Method for manufacturing electronic components and electronic components |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56109824A (en) * | 1980-02-05 | 1981-08-31 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of oxide superconductive thin film |
JPS5963732A (en) * | 1982-10-04 | 1984-04-11 | Hitachi Ltd | Thin film forming device |
JPS59219461A (en) * | 1983-05-24 | 1984-12-10 | Toshiba Corp | Amorphous silicon film forming device |
JPS60117711A (en) * | 1983-11-30 | 1985-06-25 | Toshiba Corp | Forming apparatus of thin film |
JPS61109036A (en) * | 1984-11-01 | 1986-05-27 | Canon Inc | Display device of television lens |
JPS61125133A (en) * | 1984-11-22 | 1986-06-12 | Hitachi Ltd | Low temperature plasma electromagnetic field control structure |
JPS61267324A (en) * | 1985-05-21 | 1986-11-26 | Fuji Electric Co Ltd | Dry thin film processing device |
JPS62150726A (en) * | 1985-12-24 | 1987-07-04 | Fuji Electric Co Ltd | Manufacture of semiconductor device |
-
1987
- 1987-09-07 JP JP62223674A patent/JPS6467824A/en active Granted
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56109824A (en) * | 1980-02-05 | 1981-08-31 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of oxide superconductive thin film |
JPS5963732A (en) * | 1982-10-04 | 1984-04-11 | Hitachi Ltd | Thin film forming device |
JPS59219461A (en) * | 1983-05-24 | 1984-12-10 | Toshiba Corp | Amorphous silicon film forming device |
JPS60117711A (en) * | 1983-11-30 | 1985-06-25 | Toshiba Corp | Forming apparatus of thin film |
JPS61109036A (en) * | 1984-11-01 | 1986-05-27 | Canon Inc | Display device of television lens |
JPS61125133A (en) * | 1984-11-22 | 1986-06-12 | Hitachi Ltd | Low temperature plasma electromagnetic field control structure |
JPS61267324A (en) * | 1985-05-21 | 1986-11-26 | Fuji Electric Co Ltd | Dry thin film processing device |
JPS62150726A (en) * | 1985-12-24 | 1987-07-04 | Fuji Electric Co Ltd | Manufacture of semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0288408A (en) * | 1988-05-31 | 1990-03-28 | Mitsubishi Metal Corp | Production of superconducting ceramic film |
JPH0288763A (en) * | 1988-09-26 | 1990-03-28 | Matsushita Electric Ind Co Ltd | Thin film superconductor, method and apparatus for producing same |
Also Published As
Publication number | Publication date |
---|---|
JPH0556282B2 (en) | 1993-08-19 |
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