JPS63114119A - Plasma processing apparatus - Google Patents

Plasma processing apparatus

Info

Publication number
JPS63114119A
JPS63114119A JP25978186A JP25978186A JPS63114119A JP S63114119 A JPS63114119 A JP S63114119A JP 25978186 A JP25978186 A JP 25978186A JP 25978186 A JP25978186 A JP 25978186A JP S63114119 A JPS63114119 A JP S63114119A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
sample
microwave
plasma
chamber
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25978186A
Inventor
Seiichi Nakamura
Satoru Nakayama
Original Assignee
Sumitomo Metal Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To efficiently heat a sample by utilizing a microwave using a plasma generation by so disposing a placing base near the hole of a plasma generating chamber so that moving means for avoiding a plasma drawing window from the base and the sample are opposed to the chamber.
CONSTITUTION: Since a plasma drawing window 5 is normally set in a diameter not to pass a microwave, a handle operation or a motor is first driven to rotate a shaft 5b, the window 5 is avoided from a position A to a position B to set a hole 1d in an open state. Then, a cylinder is operated to raise a placing base 6 for placing a sample S, and so disposed as to oppose the sample S to a plasma generating chamber 1 through a hole 1d. The chamber 1 and a reaction chamber 3 are set to 10-3 Torr or less in this state, the microwave is introduced from a magnetron in this state to heat the sample S. Since the microwave utilizing the plasma generation for heating the sample is used, a high speed heat treatment is possible after and before the process of the sample' and the construction of the base can be simplified.
COPYRIGHT: (C)1988,JPO&Japio
JP25978186A 1986-10-30 1986-10-30 Plasma processing apparatus Pending JPS63114119A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25978186A JPS63114119A (en) 1986-10-30 1986-10-30 Plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25978186A JPS63114119A (en) 1986-10-30 1986-10-30 Plasma processing apparatus

Publications (1)

Publication Number Publication Date
JPS63114119A true true JPS63114119A (en) 1988-05-19

Family

ID=17338887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25978186A Pending JPS63114119A (en) 1986-10-30 1986-10-30 Plasma processing apparatus

Country Status (1)

Country Link
JP (1) JPS63114119A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02207529A (en) * 1989-02-07 1990-08-17 Fuji Electric Co Ltd Dry thin film processing equipment
WO1999024637A1 (en) * 1997-11-07 1999-05-20 Applied Komatsu Technology, Inc. Method for annealing an amorphous film using microwave energy

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02207529A (en) * 1989-02-07 1990-08-17 Fuji Electric Co Ltd Dry thin film processing equipment
WO1999024637A1 (en) * 1997-11-07 1999-05-20 Applied Komatsu Technology, Inc. Method for annealing an amorphous film using microwave energy

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