JPS6465023A - Collection of gallium from liquid liquid extraction - Google Patents

Collection of gallium from liquid liquid extraction

Info

Publication number
JPS6465023A
JPS6465023A JP63109295A JP10929588A JPS6465023A JP S6465023 A JPS6465023 A JP S6465023A JP 63109295 A JP63109295 A JP 63109295A JP 10929588 A JP10929588 A JP 10929588A JP S6465023 A JPS6465023 A JP S6465023A
Authority
JP
Japan
Prior art keywords
liquid
gallium
extraction
solution
collection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63109295A
Other languages
English (en)
Other versions
JPH0463811B2 (ja
Inventor
Sabo Jiyanrui
Fuitouushi Rishiyaaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhone Poulenc Chimie SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhone Poulenc Chimie SA filed Critical Rhone Poulenc Chimie SA
Publication of JPS6465023A publication Critical patent/JPS6465023A/ja
Publication of JPH0463811B2 publication Critical patent/JPH0463811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00Compounds of gallium, indium or thallium
    • C01G15/003Preparation involving a liquid-liquid extraction, an adsorption or an ion-exchange
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B58/00Obtaining gallium or indium
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00Compounds of gallium, indium or thallium
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/20Treatment or purification of solutions, e.g. obtained by leaching
    • C22B3/26Treatment or purification of solutions, e.g. obtained by leaching by liquid-liquid extraction using organic compounds
    • C22B3/36Heterocyclic compounds
    • C22B3/362Heterocyclic compounds of a single type
    • C22B3/364Quinoline
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/20Treatment or purification of solutions, e.g. obtained by leaching
    • C22B3/42Treatment or purification of solutions, e.g. obtained by leaching by ion-exchange extraction
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling
JP63109295A 1987-05-06 1988-05-06 Collection of gallium from liquid liquid extraction Granted JPS6465023A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8706370A FR2614887B1 (fr) 1987-05-06 1987-05-06 Procede de recuperation de gallium par extraction liquide-liquide

Publications (2)

Publication Number Publication Date
JPS6465023A true JPS6465023A (en) 1989-03-10
JPH0463811B2 JPH0463811B2 (ja) 1992-10-13

Family

ID=9350825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63109295A Granted JPS6465023A (en) 1987-05-06 1988-05-06 Collection of gallium from liquid liquid extraction

Country Status (15)

Country Link
EP (1) EP0290318B1 (ja)
JP (1) JPS6465023A (ja)
KR (1) KR930003637B1 (ja)
CN (1) CN1017215B (ja)
AT (1) ATE85035T1 (ja)
AU (1) AU606153B2 (ja)
BR (1) BR8802170A (ja)
CA (1) CA1334891C (ja)
DE (1) DE3877813T2 (ja)
ES (1) ES2043864T3 (ja)
FR (1) FR2614887B1 (ja)
IE (1) IE59640B1 (ja)
IN (1) IN170892B (ja)
NO (1) NO881951L (ja)
PT (1) PT87418B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0682999U (ja) * 1993-01-07 1994-11-29 良默 林 ロール掛け
WO2012157161A1 (ja) * 2011-05-19 2012-11-22 古河機械金属株式会社 半導体製造装置部品の洗浄方法、半導体製造装置部品の洗浄装置および気相成長装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2620695B1 (fr) * 1987-09-21 1990-01-05 Rhone Poulenc Chimie Procede de recuperation de gallium par extraction liquide-liquide
CN100418884C (zh) * 2006-01-16 2008-09-17 中国铝业股份有限公司 一种提高拜耳法生产氧化铝循环效率的方法
CN101492777B (zh) * 2008-10-29 2010-06-23 南京金美镓业有限公司 一种制取分子束外延级高纯度金属镓的方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2307882A2 (fr) * 1975-04-16 1976-11-12 Rhone Poulenc Ind Procede de recuperation du gallium de solutions tres basiques par extraction liquide/liquide
FR2277897A1 (fr) * 1974-07-12 1976-02-06 Rhone Poulenc Ind Procede de recuperation du gallium de solutions tres basiques par extraction liquide/liquide
FR2307047A2 (fr) * 1975-04-10 1976-11-05 Rhone Poulenc Ind Procede de recuperation du gallium de solutions tres basiques par extraction liquide/liquide
FR2365641A2 (fr) * 1976-09-27 1978-04-21 Rhone Poulenc Ind Procede de recuperation du gallium de solutions tres basiques par extraction liquide/liquide
FI70693C (fi) * 1980-12-05 1986-10-06 Rhone Poulenc Ind Foerfarande foer rening av en galliumloesning
FR2495601A1 (fr) * 1980-12-05 1982-06-11 Rhone Poulenc Ind Procede de purification de solutions de gallium
FR2495599A1 (fr) * 1980-12-05 1982-06-11 Rhone Poulenc Ind Procede de purification d'une solution de gallium par extraction liquide-liquide a l'aide d'alcools
FR2495600A1 (fr) * 1980-12-05 1982-06-11 Rhone Poulenc Ind Procede de purification d'une solution de gallium par extraction liquide-liquide a l'aide de sels d'ammonium quaternaires
FR2532295A1 (fr) * 1982-08-26 1984-03-02 Rhone Poulenc Spec Chim Procede d'extraction du gallium a l'aide d'hydroxyquinoleines substituees et de sulfates ou sulfonates substitues
FR2532296B1 (fr) * 1982-08-26 1985-06-07 Rhone Poulenc Spec Chim Procede d'extraction du gallium a l'aide d'hydroxyquinoleines substituees et de composes organophosphores
CH655710A5 (de) * 1983-11-17 1986-05-15 Sulzer Ag Verfahren zur fluessig-fluessig-extraktion von gallium aus natriumaluminatloesung mit hilfe eines organischen extraktionsmittels.
DE3508041A1 (de) * 1985-03-07 1986-09-11 Preussag Ag Metall, 3380 Goslar Verfahren zur fluessig-fluessig-extraktion von gallium, germanium oder indium aus waessrigen loesungen

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0682999U (ja) * 1993-01-07 1994-11-29 良默 林 ロール掛け
WO2012157161A1 (ja) * 2011-05-19 2012-11-22 古河機械金属株式会社 半導体製造装置部品の洗浄方法、半導体製造装置部品の洗浄装置および気相成長装置
JPWO2012157161A1 (ja) * 2011-05-19 2014-07-31 古河機械金属株式会社 半導体製造装置部品の洗浄方法、半導体製造装置部品の洗浄装置および気相成長装置
JP5715245B2 (ja) * 2011-05-19 2015-05-07 古河機械金属株式会社 半導体製造装置部品の洗浄装置および気相成長装置
US10741380B2 (en) 2011-05-19 2020-08-11 Furukawa Co., Ltd. Method for washing semiconductor manufacturing apparatus component, apparatus for washing semiconductor manufacturing apparatus component, and vapor phase growth apparatus

Also Published As

Publication number Publication date
JPH0463811B2 (ja) 1992-10-13
EP0290318B1 (fr) 1993-01-27
BR8802170A (pt) 1988-12-06
IN170892B (ja) 1992-06-13
ES2043864T3 (es) 1994-01-01
AU606153B2 (en) 1991-01-31
CA1334891C (fr) 1995-03-28
NO881951L (no) 1988-11-07
IE872332L (en) 1988-11-06
ATE85035T1 (de) 1993-02-15
KR880014123A (ko) 1988-12-22
NO881951D0 (no) 1988-05-04
IE59640B1 (en) 1994-03-09
EP0290318A1 (fr) 1988-11-09
PT87418A (pt) 1989-05-31
FR2614887B1 (fr) 1990-11-30
CN1017215B (zh) 1992-07-01
AU1561588A (en) 1988-11-10
FR2614887A1 (fr) 1988-11-10
PT87418B (pt) 1992-08-31
KR930003637B1 (ko) 1993-05-08
DE3877813T2 (de) 1993-06-17
CN88102672A (zh) 1988-11-30
DE3877813D1 (de) 1993-03-11

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